KR102204105B1 - 임프린트 시스템 및 물품 제조 방법 - Google Patents

임프린트 시스템 및 물품 제조 방법 Download PDF

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Publication number
KR102204105B1
KR102204105B1 KR1020197019699A KR20197019699A KR102204105B1 KR 102204105 B1 KR102204105 B1 KR 102204105B1 KR 1020197019699 A KR1020197019699 A KR 1020197019699A KR 20197019699 A KR20197019699 A KR 20197019699A KR 102204105 B1 KR102204105 B1 KR 102204105B1
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KR
South Korea
Prior art keywords
imprint
replica
mold
substrate
data
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KR1020197019699A
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English (en)
Korean (ko)
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KR20190089213A (ko
Inventor
기요히토 야마모토
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캐논 가부시끼가이샤
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Publication of KR20190089213A publication Critical patent/KR20190089213A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H01L21/027—
    • H01L21/67294—
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0618—Apparatus for monitoring, sorting, marking, testing or measuring using identification means, e.g. labels on substrates or labels on containers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020197019699A 2016-12-09 2017-11-27 임프린트 시스템 및 물품 제조 방법 Active KR102204105B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2016239776A JP6755168B2 (ja) 2016-12-09 2016-12-09 インプリントシステム、レプリカ製造装置、管理装置、インプリント装置、および物品製造方法
JPJP-P-2016-239776 2016-12-09
PCT/JP2017/042311 WO2018105418A1 (ja) 2016-12-09 2017-11-27 インプリントシステム、および物品製造方法

Publications (2)

Publication Number Publication Date
KR20190089213A KR20190089213A (ko) 2019-07-30
KR102204105B1 true KR102204105B1 (ko) 2021-01-18

Family

ID=62491148

Family Applications (1)

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KR1020197019699A Active KR102204105B1 (ko) 2016-12-09 2017-11-27 임프린트 시스템 및 물품 제조 방법

Country Status (5)

Country Link
US (1) US11235495B2 (https=)
JP (1) JP6755168B2 (https=)
KR (1) KR102204105B1 (https=)
TW (1) TWI641027B (https=)
WO (1) WO2018105418A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3650224T3 (pl) * 2018-11-09 2023-09-18 Phoenix Contact Gmbh & Co. Kg Urządzenie i sposób zadrukowywania artykułu
JP7190942B2 (ja) * 2019-03-08 2022-12-16 キヤノン株式会社 インプリントシステム、管理装置、および物品製造方法
JP2022142518A (ja) 2021-03-16 2022-09-30 キオクシア株式会社 テンプレート、マーク、及びテンプレートの製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010052175A (ja) 2008-08-26 2010-03-11 Fuji Electric Device Technology Co Ltd ナノインプリント用マスターモールドの製造方法およびレプリカモールドの製造方法
JP2010274650A (ja) 2009-05-29 2010-12-09 Obducat Ab 複製技術のための金属製スタンプの製造
JP2012234901A (ja) 2011-04-28 2012-11-29 Toshiba Corp インプリント装置の動作方法及びインプリント用テンプレートの管理装置の動作方法
JP2013214627A (ja) 2012-04-03 2013-10-17 Dainippon Printing Co Ltd ナノインプリント用マスターテンプレート及びレプリカテンプレートの製造方法
JP2016092270A (ja) 2014-11-06 2016-05-23 キヤノン株式会社 インプリントシステム及び物品の製造方法
JP2016178127A (ja) 2015-03-18 2016-10-06 キヤノン株式会社 インプリントシステム、および物品の製造方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US736085A (en) 1902-10-15 1903-08-11 Carroll W Kjelgaard Combination shade and curtain bracket.
US7360851B1 (en) 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
JP2012190877A (ja) 2011-03-09 2012-10-04 Fujifilm Corp ナノインプリント方法およびそれに用いられるナノインプリント装置
JP6053266B2 (ja) * 2011-09-01 2016-12-27 キヤノン株式会社 インプリント装置、物品の製造方法及びインプリント方法
JP2013074115A (ja) 2011-09-28 2013-04-22 Fujifilm Corp ナノインプリント装置およびナノインプリント方法、並びに、歪み付与デバイスおよび歪み付与方法
JP5935385B2 (ja) 2012-02-27 2016-06-15 大日本印刷株式会社 ナノインプリント用レプリカテンプレートの製造方法及びレプリカテンプレート
JP6138189B2 (ja) * 2015-04-08 2017-05-31 キヤノン株式会社 インプリント装置および物品の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010052175A (ja) 2008-08-26 2010-03-11 Fuji Electric Device Technology Co Ltd ナノインプリント用マスターモールドの製造方法およびレプリカモールドの製造方法
JP2010274650A (ja) 2009-05-29 2010-12-09 Obducat Ab 複製技術のための金属製スタンプの製造
JP2012234901A (ja) 2011-04-28 2012-11-29 Toshiba Corp インプリント装置の動作方法及びインプリント用テンプレートの管理装置の動作方法
JP2013214627A (ja) 2012-04-03 2013-10-17 Dainippon Printing Co Ltd ナノインプリント用マスターテンプレート及びレプリカテンプレートの製造方法
JP2016092270A (ja) 2014-11-06 2016-05-23 キヤノン株式会社 インプリントシステム及び物品の製造方法
JP2016178127A (ja) 2015-03-18 2016-10-06 キヤノン株式会社 インプリントシステム、および物品の製造方法

Also Published As

Publication number Publication date
JP2018098306A (ja) 2018-06-21
KR20190089213A (ko) 2019-07-30
US20190283281A1 (en) 2019-09-19
JP6755168B2 (ja) 2020-09-16
WO2018105418A1 (ja) 2018-06-14
TW201822251A (zh) 2018-06-16
TWI641027B (zh) 2018-11-11
US11235495B2 (en) 2022-02-01

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