TWI641027B - 壓印系統及物品製造方法 - Google Patents

壓印系統及物品製造方法 Download PDF

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Publication number
TWI641027B
TWI641027B TW106142506A TW106142506A TWI641027B TW I641027 B TWI641027 B TW I641027B TW 106142506 A TW106142506 A TW 106142506A TW 106142506 A TW106142506 A TW 106142506A TW I641027 B TWI641027 B TW I641027B
Authority
TW
Taiwan
Prior art keywords
imprint
mold
substrate
aforementioned
pattern
Prior art date
Application number
TW106142506A
Other languages
English (en)
Chinese (zh)
Other versions
TW201822251A (zh
Inventor
Kiyohito Yamamoto
山本磨人
Original Assignee
Canon Kabushiki Kaisha
日商佳能股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Kabushiki Kaisha, 日商佳能股份有限公司 filed Critical Canon Kabushiki Kaisha
Publication of TW201822251A publication Critical patent/TW201822251A/zh
Application granted granted Critical
Publication of TWI641027B publication Critical patent/TWI641027B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • B29C59/026—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing of layered or coated substantially flat surfaces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/06—Apparatus for monitoring, sorting, marking, testing or measuring
    • H10P72/0618—Apparatus for monitoring, sorting, marking, testing or measuring using identification means, e.g. labels on substrates or labels on containers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW106142506A 2016-12-09 2017-12-05 壓印系統及物品製造方法 TWI641027B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016-239776 2016-12-09
JP2016239776A JP6755168B2 (ja) 2016-12-09 2016-12-09 インプリントシステム、レプリカ製造装置、管理装置、インプリント装置、および物品製造方法

Publications (2)

Publication Number Publication Date
TW201822251A TW201822251A (zh) 2018-06-16
TWI641027B true TWI641027B (zh) 2018-11-11

Family

ID=62491148

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106142506A TWI641027B (zh) 2016-12-09 2017-12-05 壓印系統及物品製造方法

Country Status (5)

Country Link
US (1) US11235495B2 (https=)
JP (1) JP6755168B2 (https=)
KR (1) KR102204105B1 (https=)
TW (1) TWI641027B (https=)
WO (1) WO2018105418A1 (https=)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
PL3650224T3 (pl) * 2018-11-09 2023-09-18 Phoenix Contact Gmbh & Co. Kg Urządzenie i sposób zadrukowywania artykułu
JP7190942B2 (ja) * 2019-03-08 2022-12-16 キヤノン株式会社 インプリントシステム、管理装置、および物品製造方法
JP2022142518A (ja) 2021-03-16 2022-09-30 キオクシア株式会社 テンプレート、マーク、及びテンプレートの製造方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201247394A (en) * 2011-03-09 2012-12-01 Fujifilm Corp Nanoimprinting method and nanoimprinting apparatus for executing the nanoimprinting method
TW201332747A (zh) * 2011-09-28 2013-08-16 富士軟片股份有限公司 奈米壓印設備及奈米壓印方法、以及變形賦予裝置及變形賦予方法
JP2013175671A (ja) * 2012-02-27 2013-09-05 Dainippon Printing Co Ltd ナノインプリント用レプリカテンプレートの製造方法及びレプリカテンプレート
TW201642315A (zh) * 2015-04-08 2016-12-01 佳能股份有限公司 壓印設備及物品製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US736085A (en) 1902-10-15 1903-08-11 Carroll W Kjelgaard Combination shade and curtain bracket.
US7360851B1 (en) 2006-02-15 2008-04-22 Kla-Tencor Technologies Corporation Automated pattern recognition of imprint technology
JP2010052175A (ja) 2008-08-26 2010-03-11 Fuji Electric Device Technology Co Ltd ナノインプリント用マスターモールドの製造方法およびレプリカモールドの製造方法
EP2256549A1 (en) 2009-05-29 2010-12-01 Obducat AB Fabrication of Metallic Stamps for Replication Technology
JP2012234901A (ja) * 2011-04-28 2012-11-29 Toshiba Corp インプリント装置の動作方法及びインプリント用テンプレートの管理装置の動作方法
JP6053266B2 (ja) * 2011-09-01 2016-12-27 キヤノン株式会社 インプリント装置、物品の製造方法及びインプリント方法
JP5942551B2 (ja) 2012-04-03 2016-06-29 大日本印刷株式会社 ナノインプリント用マスターテンプレート及びレプリカテンプレートの製造方法
JP6478565B2 (ja) * 2014-11-06 2019-03-06 キヤノン株式会社 インプリントシステム及び物品の製造方法
JP6438332B2 (ja) * 2015-03-18 2018-12-12 キヤノン株式会社 インプリントシステム、および物品の製造方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201247394A (en) * 2011-03-09 2012-12-01 Fujifilm Corp Nanoimprinting method and nanoimprinting apparatus for executing the nanoimprinting method
TW201332747A (zh) * 2011-09-28 2013-08-16 富士軟片股份有限公司 奈米壓印設備及奈米壓印方法、以及變形賦予裝置及變形賦予方法
JP2013175671A (ja) * 2012-02-27 2013-09-05 Dainippon Printing Co Ltd ナノインプリント用レプリカテンプレートの製造方法及びレプリカテンプレート
TW201642315A (zh) * 2015-04-08 2016-12-01 佳能股份有限公司 壓印設備及物品製造方法

Also Published As

Publication number Publication date
JP2018098306A (ja) 2018-06-21
KR102204105B1 (ko) 2021-01-18
KR20190089213A (ko) 2019-07-30
US20190283281A1 (en) 2019-09-19
JP6755168B2 (ja) 2020-09-16
WO2018105418A1 (ja) 2018-06-14
TW201822251A (zh) 2018-06-16
US11235495B2 (en) 2022-02-01

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