KR102170818B1 - 열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 - Google Patents
열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 Download PDFInfo
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
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- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
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- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
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- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
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- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
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- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
- C08J2483/06—Polysiloxanes containing silicon bound to oxygen-containing groups
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Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020130163607A KR102170818B1 (ko) | 2013-12-26 | 2013-12-26 | 열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 |
CN201480071015.5A CN105873983B (zh) | 2013-12-26 | 2014-12-24 | 能够热熔融挤压成型的倍半硅氧烷、利用其的高透明及高耐热塑料透明基板及其制造方法 |
JP2016542763A JP6659550B2 (ja) | 2013-12-26 | 2014-12-24 | 熱溶融−押出成形が可能なシルセスキオキサン、これを用いた高透明および高耐熱プラスチック透明基板およびその製造方法 |
PCT/KR2014/012790 WO2015099443A1 (ko) | 2013-12-26 | 2014-12-24 | 열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 |
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KR1020130163607A KR102170818B1 (ko) | 2013-12-26 | 2013-12-26 | 열 용융-압출 성형이 가능한 실세스퀴옥산, 이를 이용한 고투명 및 고내열 플라스틱 투명기판 및 이의 제조방법 |
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KR20150075549A KR20150075549A (ko) | 2015-07-06 |
KR102170818B1 true KR102170818B1 (ko) | 2020-10-28 |
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JP (1) | JP6659550B2 (zh) |
KR (1) | KR102170818B1 (zh) |
CN (1) | CN105873983B (zh) |
WO (1) | WO2015099443A1 (zh) |
Families Citing this family (8)
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US10570311B2 (en) | 2015-08-25 | 2020-02-25 | Dongjin Semichem Co., Ltd. | Laminate and method for producing same |
KR101751904B1 (ko) * | 2015-12-31 | 2017-07-12 | 엘티씨 (주) | 유연기판용 폴리실세스퀴옥산 수지 조성물 |
KR102012543B1 (ko) * | 2016-05-11 | 2019-08-20 | 삼성에스디아이 주식회사 | 윈도우 필름 및 이를 포함하는 디스플레이 장치 |
CN107057517B (zh) * | 2016-12-22 | 2019-11-05 | 广东一通科技股份有限公司 | 一种倍半硅氧烷交联的硅氮磷协同阻燃水性环氧树脂及其制备方法 |
JP2020514465A (ja) * | 2016-12-30 | 2020-05-21 | ドンジン セミケム カンパニー リミテッドDongjin Semichem Co., Ltd. | コーティング組成物およびこれから製造されるフィルム |
JP2018188563A (ja) * | 2017-05-09 | 2018-11-29 | 株式会社ダイセル | 絶縁膜形成用組成物、絶縁膜、及び絶縁膜を備えた半導体デバイス |
KR102158820B1 (ko) * | 2019-03-18 | 2020-09-22 | 인하대학교 산학협력단 | 투명 하이브리드 필름 제조용 조성물 및 투명 하이브리드 필름과 그 제조방법 |
CN116082639A (zh) * | 2022-12-19 | 2023-05-09 | 广州一新科技有限公司 | 一种含两种活性官能团的梯形聚倍半硅氧烷及其制备方法 |
Citations (2)
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JP2012116989A (ja) * | 2010-12-02 | 2012-06-21 | Nagase Chemtex Corp | 樹脂レンズ及び光学樹脂組成物 |
JP2012214564A (ja) * | 2011-03-31 | 2012-11-08 | Nippon Steel Chem Co Ltd | かご型シルセスキオキサン樹脂及びその製造方法 |
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TWI278473B (en) * | 2003-03-12 | 2007-04-11 | Chisso Corp | Polymer with the silsesquioxane skeleton in its main chain, method of forming the same, and coating film and membrane of preventing metal ion elution |
KR101067011B1 (ko) * | 2003-03-27 | 2011-09-22 | 신닛테츠가가쿠 가부시키가이샤 | 실리콘 수지 조성물 및 그 성형체 |
WO2008065862A1 (fr) * | 2006-12-01 | 2008-06-05 | Konica Minolta Opto, Inc. | Matériau de dispositif optique en matière plastique, dispositif optique en matière plastique fait à partir de celui-ci et dispositif de capture optique |
JP5275589B2 (ja) * | 2007-08-02 | 2013-08-28 | 日本曹達株式会社 | シルセスキオキサンを含有する組成物及びシルセスキオキサン含有ヒドロキシアルキルセルロース樹脂組成物 |
CN103459468B (zh) * | 2011-03-31 | 2015-06-24 | 新日铁住金化学株式会社 | 笼状硅倍半氧烷树脂和笼状硅倍半氧烷共聚物及其制造方法 |
KR101937140B1 (ko) * | 2011-08-03 | 2019-04-09 | 주식회사 동진쎄미켐 | 광경화형 유-무기 하이브리드 수지 조성물 |
WO2013019040A2 (ko) * | 2011-08-03 | 2013-02-07 | 주식회사 동진쎄미켐 | 광경화형 유-무기 하이브리드 수지 조성물 |
JP2013091703A (ja) * | 2011-10-25 | 2013-05-16 | Nippon Steel & Sumikin Chemical Co Ltd | 樹脂組成物、それを用いた樹脂成形体、及び樹脂成形体の製造方法 |
JP5569703B2 (ja) * | 2012-02-02 | 2014-08-13 | 荒川化学工業株式会社 | エポキシ基含有シルセスキオキサン変性エポキシ樹脂、硬化性樹脂組成物、硬化物およびコーティング剤 |
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2014
- 2014-12-24 WO PCT/KR2014/012790 patent/WO2015099443A1/ko active Application Filing
- 2014-12-24 CN CN201480071015.5A patent/CN105873983B/zh active Active
- 2014-12-24 JP JP2016542763A patent/JP6659550B2/ja active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2012116989A (ja) * | 2010-12-02 | 2012-06-21 | Nagase Chemtex Corp | 樹脂レンズ及び光学樹脂組成物 |
JP2012214564A (ja) * | 2011-03-31 | 2012-11-08 | Nippon Steel Chem Co Ltd | かご型シルセスキオキサン樹脂及びその製造方法 |
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Publication number | Publication date |
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CN105873983A (zh) | 2016-08-17 |
CN105873983B (zh) | 2019-08-16 |
JP2017512215A (ja) | 2017-05-18 |
KR20150075549A (ko) | 2015-07-06 |
JP6659550B2 (ja) | 2020-03-04 |
WO2015099443A1 (ko) | 2015-07-02 |
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AMND | Amendment | ||
E601 | Decision to refuse application | ||
X091 | Application refused [patent] | ||
AMND | Amendment | ||
X701 | Decision to grant (after re-examination) | ||
GRNT | Written decision to grant |