KR102170063B1 - 무기 산화물 피막 형성용 도포액, 무기 산화물 피막, 및 표시 디바이스 - Google Patents

무기 산화물 피막 형성용 도포액, 무기 산화물 피막, 및 표시 디바이스 Download PDF

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Publication number
KR102170063B1
KR102170063B1 KR1020157011666A KR20157011666A KR102170063B1 KR 102170063 B1 KR102170063 B1 KR 102170063B1 KR 1020157011666 A KR1020157011666 A KR 1020157011666A KR 20157011666 A KR20157011666 A KR 20157011666A KR 102170063 B1 KR102170063 B1 KR 102170063B1
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KR
South Korea
Prior art keywords
metal
oxide film
metal oxide
group
coating liquid
Prior art date
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KR1020157011666A
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English (en)
Korean (ko)
Other versions
KR20150070215A (ko
Inventor
가즈키 에구치
게이타 무라카지
겐이치 모토야마
Original Assignee
닛산 가가쿠 가부시키가이샤
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Publication of KR20150070215A publication Critical patent/KR20150070215A/ko
Application granted granted Critical
Publication of KR102170063B1 publication Critical patent/KR102170063B1/ko

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D185/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing atoms other than silicon, sulfur, nitrogen, oxygen, and carbon; Coating compositions based on derivatives of such polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Ceramic Engineering (AREA)
  • Paints Or Removers (AREA)
  • Materials Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • General Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Human Computer Interaction (AREA)
  • Materials For Photolithography (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
KR1020157011666A 2012-10-11 2013-10-10 무기 산화물 피막 형성용 도포액, 무기 산화물 피막, 및 표시 디바이스 KR102170063B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2012-226156 2012-10-11
JP2012226156 2012-10-11
PCT/JP2013/077603 WO2014058018A1 (ja) 2012-10-11 2013-10-10 無機酸化物被膜形成用塗布液、無機酸化物被膜、及び表示デバイス

Publications (2)

Publication Number Publication Date
KR20150070215A KR20150070215A (ko) 2015-06-24
KR102170063B1 true KR102170063B1 (ko) 2020-10-26

Family

ID=50477484

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020157011666A KR102170063B1 (ko) 2012-10-11 2013-10-10 무기 산화물 피막 형성용 도포액, 무기 산화물 피막, 및 표시 디바이스

Country Status (5)

Country Link
JP (1) JP6287846B2 (ja)
KR (1) KR102170063B1 (ja)
CN (1) CN104854509B (ja)
TW (1) TWI637235B (ja)
WO (1) WO2014058018A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI566036B (zh) * 2015-03-31 2017-01-11 奇美實業股份有限公司 感光性聚矽氧烷組成物、保護膜以及具有保護膜的元件
WO2018235783A1 (ja) * 2017-06-20 2018-12-27 日産化学株式会社 非水系インク組成物
US11024593B2 (en) * 2018-09-28 2021-06-01 Taiwan Semiconductor Manufacturing Co., Ltd. Metal bumps and method forming same

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002187906A (ja) * 2000-12-21 2002-07-05 Lintec Corp 高分子量光重合開始剤及びそれを用いた光硬化性材料
WO2012057165A1 (ja) 2010-10-26 2012-05-03 日産化学工業株式会社 タッチパネル
JP2012088575A (ja) * 2010-10-20 2012-05-10 Jsr Corp 感放射線性組成物、硬化膜、及びそれらの形成方法
WO2012099253A1 (ja) * 2011-01-20 2012-07-26 日産化学工業株式会社 タッチパネル用コーティング組成物、コート膜およびタッチパネル

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6037457B2 (ja) * 1977-08-12 1985-08-26 東芝シリコ−ン株式会社 感光性組成物
JP2881847B2 (ja) 1988-12-15 1999-04-12 日産化学工業株式会社 コーティング用組成物及びその製造法
JP3542156B2 (ja) * 1994-02-25 2004-07-14 ダウ コーニング アジア株式会社 有機溶媒に可溶なポリチタノシロキサンの製造方法
CN101535430B (zh) * 2006-11-14 2012-02-08 日产化学工业株式会社 低折射率被膜形成用涂布液及其制造方法以及防反射材料
JP5576622B2 (ja) * 2008-07-01 2014-08-20 旭化成イーマテリアルズ株式会社 感光性樹脂組成物
JP5606868B2 (ja) * 2010-10-22 2014-10-15 富士フイルム株式会社 光重合性組成物、カラーフィルタ、その製造方法、及び、固体撮像素子

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002187906A (ja) * 2000-12-21 2002-07-05 Lintec Corp 高分子量光重合開始剤及びそれを用いた光硬化性材料
JP2012088575A (ja) * 2010-10-20 2012-05-10 Jsr Corp 感放射線性組成物、硬化膜、及びそれらの形成方法
WO2012057165A1 (ja) 2010-10-26 2012-05-03 日産化学工業株式会社 タッチパネル
WO2012099253A1 (ja) * 2011-01-20 2012-07-26 日産化学工業株式会社 タッチパネル用コーティング組成物、コート膜およびタッチパネル

Also Published As

Publication number Publication date
KR20150070215A (ko) 2015-06-24
JP6287846B2 (ja) 2018-03-07
JPWO2014058018A1 (ja) 2016-09-05
TWI637235B (zh) 2018-10-01
TW201435488A (zh) 2014-09-16
CN104854509B (zh) 2021-04-13
WO2014058018A1 (ja) 2014-04-17
CN104854509A (zh) 2015-08-19

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