KR102134487B1 - 위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 - Google Patents
위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 Download PDFInfo
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- KR102134487B1 KR102134487B1 KR1020140031753A KR20140031753A KR102134487B1 KR 102134487 B1 KR102134487 B1 KR 102134487B1 KR 1020140031753 A KR1020140031753 A KR 1020140031753A KR 20140031753 A KR20140031753 A KR 20140031753A KR 102134487 B1 KR102134487 B1 KR 102134487B1
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- phase shift
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- gas
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- 229910052804 chromium Inorganic materials 0.000 claims abstract description 104
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- XMPZTFVPEKAKFH-UHFFFAOYSA-P ceric ammonium nitrate Chemical compound [NH4+].[NH4+].[Ce+4].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O XMPZTFVPEKAKFH-UHFFFAOYSA-P 0.000 description 1
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- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
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- FTBATIJJKIIOTP-UHFFFAOYSA-K trifluorochromium Chemical compound F[Cr](F)F FTBATIJJKIIOTP-UHFFFAOYSA-K 0.000 description 1
- ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2013-056295 | 2013-03-19 | ||
| JP2013056295 | 2013-03-19 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020200084084A Division KR102246114B1 (ko) | 2013-03-19 | 2020-07-08 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140114797A KR20140114797A (ko) | 2014-09-29 |
| KR102134487B1 true KR102134487B1 (ko) | 2020-07-16 |
Family
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Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020140031753A Active KR102134487B1 (ko) | 2013-03-19 | 2014-03-18 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 |
| KR1020200084084A Active KR102246114B1 (ko) | 2013-03-19 | 2020-07-08 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020200084084A Active KR102246114B1 (ko) | 2013-03-19 | 2020-07-08 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 위상 시프트 마스크의 제조 방법, 및 표시 장치의 제조 방법 |
Country Status (3)
| Country | Link |
|---|---|
| JP (2) | JP6324756B2 (enExample) |
| KR (2) | KR102134487B1 (enExample) |
| TW (2) | TWI707053B (enExample) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6324756B2 (ja) * | 2013-03-19 | 2018-05-16 | Hoya株式会社 | 位相シフトマスクブランク及びその製造方法、位相シフトマスクの製造方法、並びに表示装置の製造方法 |
| JP6661262B2 (ja) * | 2014-05-29 | 2020-03-11 | Hoya株式会社 | 位相シフトマスクブランク及びその製造方法、並びに位相シフトマスクの製造方法 |
| JP6391495B2 (ja) * | 2015-02-23 | 2018-09-19 | Hoya株式会社 | フォトマスク、フォトマスクセット、フォトマスクの製造方法、及び表示装置の製造方法 |
| JP6502143B2 (ja) * | 2015-03-27 | 2019-04-17 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
| WO2016162157A1 (en) * | 2015-04-07 | 2016-10-13 | Asml Netherlands B.V. | Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devices |
| JP6726553B2 (ja) * | 2015-09-26 | 2020-07-22 | Hoya株式会社 | フォトマスクの製造方法、及び表示装置の製造方法 |
| JP2017182052A (ja) * | 2016-03-24 | 2017-10-05 | Hoya株式会社 | 位相シフトマスクブランク、位相シフトマスク及び表示装置の製造方法 |
| TWI615668B (zh) * | 2016-11-18 | 2018-02-21 | 台灣積體電路製造股份有限公司 | 相位移光罩的形成方法 |
| JP2018106022A (ja) * | 2016-12-27 | 2018-07-05 | Hoya株式会社 | 表示装置製造用フォトマスクの製造方法および表示装置の製造方法 |
| SG11201907771TA (en) * | 2017-02-27 | 2019-09-27 | Hoya Corp | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device |
| CN110770652B (zh) * | 2017-06-14 | 2023-03-21 | Hoya株式会社 | 掩模坯料、相移掩模及半导体器件的制造方法 |
| CN110196530B (zh) * | 2018-02-27 | 2024-05-14 | Hoya株式会社 | 相移掩模坯料、相移掩模的制造方法、及显示装置的制造方法 |
| JP7073246B2 (ja) * | 2018-02-27 | 2022-05-23 | Hoya株式会社 | 位相シフトマスクブランク、位相シフトマスクの製造方法、及び表示装置の製造方法 |
| JP7151774B2 (ja) * | 2018-09-14 | 2022-10-12 | 株式会社ニコン | 位相シフトマスクブランクス、位相シフトマスク、露光方法、デバイスの製造方法、位相シフトマスクブランクスの製造方法、位相シフトマスクの製造方法、露光方法、及び、デバイスの製造方法 |
| JP7217620B2 (ja) * | 2018-11-22 | 2023-02-03 | アルバック成膜株式会社 | マスクブランクスおよびマスク |
| JP7059234B2 (ja) * | 2018-11-30 | 2022-04-25 | Hoya株式会社 | フォトマスクブランク、フォトマスクの製造方法及び表示装置の製造方法 |
| JP7303077B2 (ja) * | 2019-09-10 | 2023-07-04 | アルバック成膜株式会社 | マスクブランクスの製造方法及びフォトマスクの製造方法、マスクブランクス及びフォトマスク |
| TWI886224B (zh) * | 2020-03-17 | 2025-06-11 | 日商Ｈｏｙａ股份有限公司 | 光罩基底、光罩之製造方法及顯示裝置之製造方法 |
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| KR100295385B1 (ko) * | 1993-04-09 | 2001-09-17 | 기타지마 요시토시 | 하프톤위상쉬프트포토마스크,하프톤위상쉬프트포토마스크용블랭크스및이들의제조방법 |
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| JP3256345B2 (ja) * | 1993-07-26 | 2002-02-12 | アルバック成膜株式会社 | フォトマスクブランクスおよびフォトマスク |
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| JPH08123010A (ja) * | 1994-10-28 | 1996-05-17 | Toppan Printing Co Ltd | 位相シフトマスクおよびそれに用いるマスクブランク |
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| JP4919259B2 (ja) * | 2006-03-30 | 2012-04-18 | Ｈｏｙａ株式会社 | マスクブランク及びフォトマスク |
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| KR102071721B1 (ko) * | 2010-04-09 | 2020-01-30 | 호야 가부시키가이샤 | 위상 시프트 마스크 블랭크 및 그 제조 방법, 및 위상 시프트 마스크 |
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