KR102062593B1 - 프로세스 챔버에 커플링된 유동 제어기를 모니터링하기 위한 방법들 - Google Patents
프로세스 챔버에 커플링된 유동 제어기를 모니터링하기 위한 방법들 Download PDFInfo
- Publication number
- KR102062593B1 KR102062593B1 KR1020147011427A KR20147011427A KR102062593B1 KR 102062593 B1 KR102062593 B1 KR 102062593B1 KR 1020147011427 A KR1020147011427 A KR 1020147011427A KR 20147011427 A KR20147011427 A KR 20147011427A KR 102062593 B1 KR102062593 B1 KR 102062593B1
- Authority
- KR
- South Korea
- Prior art keywords
- flow controller
- flow
- controller
- gas
- process chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
- G01F25/00—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume
- G01F25/10—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters
- G01F25/15—Testing or calibration of apparatus for measuring volume, volume flow or liquid level or for metering by volume of flowmeters specially adapted for gas meters
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D7/00—Control of flow
- G05D7/06—Control of flow characterised by the use of electric means
- G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
- G05D7/0623—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the set value given to the control element
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T137/00—Fluid handling
- Y10T137/0318—Processes
- Y10T137/0324—With control of flow by a condition or characteristic of a fluid
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Fluid Mechanics (AREA)
- Flow Control (AREA)
- Physical Vapour Deposition (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161540817P | 2011-09-29 | 2011-09-29 | |
| US61/540,817 | 2011-09-29 | ||
| US13/627,659 | 2012-09-26 | ||
| US13/627,659 US9772629B2 (en) | 2011-09-29 | 2012-09-26 | Methods for monitoring a flow controller coupled to a process chamber |
| PCT/US2012/057830 WO2013049512A2 (en) | 2011-09-29 | 2012-09-28 | Methods for monitoring a flow controller coupled to a process chamber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20140069305A KR20140069305A (ko) | 2014-06-09 |
| KR102062593B1 true KR102062593B1 (ko) | 2020-01-06 |
Family
ID=47996756
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020147011427A Active KR102062593B1 (ko) | 2011-09-29 | 2012-09-28 | 프로세스 챔버에 커플링된 유동 제어기를 모니터링하기 위한 방법들 |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US9772629B2 (https=) |
| JP (3) | JP6328556B2 (https=) |
| KR (1) | KR102062593B1 (https=) |
| CN (1) | CN103930972B (https=) |
| TW (1) | TWI583927B (https=) |
| WO (1) | WO2013049512A2 (https=) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
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| JP5346628B2 (ja) * | 2009-03-11 | 2013-11-20 | 株式会社堀場エステック | マスフローコントローラの検定システム、検定方法、検定用プログラム |
| US8707754B2 (en) * | 2010-04-30 | 2014-04-29 | Applied Materials, Inc. | Methods and apparatus for calibrating flow controllers in substrate processing systems |
| US9091397B2 (en) * | 2012-03-27 | 2015-07-28 | Lam Research Corporation | Shared gas panels in plasma processing chambers employing multi-zone gas feeds |
| US20140271243A1 (en) * | 2013-03-14 | 2014-09-18 | Usc, L.L.C. | Pump stand with improved pump control |
| DE102013106155A1 (de) * | 2013-06-13 | 2014-12-18 | Endress + Hauser Flowtec Ag | Meßsystem mit einem Druckgerät sowie Verfahren zur Überwachung und/oder Überprüfung eines solchen Druckgeräts |
| EP3211289B1 (en) * | 2016-02-26 | 2021-12-15 | Nel Hydrogen A/S | Communication/control system for a hydrogen refuelling system |
| EP3211288B1 (en) | 2016-02-26 | 2023-10-25 | Nel Hydrogen A/S | A control system for a hydrogen refuelling station |
| JP6541596B2 (ja) * | 2016-03-22 | 2019-07-10 | 東京エレクトロン株式会社 | プラズマ処理方法 |
| JP6767232B2 (ja) * | 2016-10-14 | 2020-10-14 | 東京エレクトロン株式会社 | 基板処理装置の流量制御器によって出力されるガスの出力流量を求める方法 |
| JP6996289B2 (ja) * | 2016-12-26 | 2022-01-17 | 株式会社島津製作所 | バルブ装置 |
| US10663337B2 (en) | 2016-12-30 | 2020-05-26 | Ichor Systems, Inc. | Apparatus for controlling flow and method of calibrating same |
| CA3007375A1 (en) * | 2017-06-15 | 2018-12-15 | Kevin Kornelsen | Calibration-less micro-fabricated vacuum gauge devices and method for measuring pressure |
| US11327510B2 (en) * | 2018-05-23 | 2022-05-10 | Hitachi Metals, Ltd. | Multi-chamber rate-of-change system for gas flow verification |
| US10760944B2 (en) * | 2018-08-07 | 2020-09-01 | Lam Research Corporation | Hybrid flow metrology for improved chamber matching |
| JP2020086936A (ja) * | 2018-11-26 | 2020-06-04 | 株式会社フジキン | 流量変化の評価装置、方法、及びコンピュータプログラム |
| US11817297B2 (en) * | 2020-03-06 | 2023-11-14 | Applied Materials, Inc. | System and method for managing substrate outgassing |
| US11486927B2 (en) | 2020-04-02 | 2022-11-01 | Applied Materials, Inc. | Bode fingerprinting for characterizations and failure detections in processing chamber |
| US11693435B2 (en) * | 2020-06-25 | 2023-07-04 | Applied Materials, Inc. | Ethercat liquid flow controller communication for substrate processing systems |
| CN111968901B (zh) * | 2020-08-25 | 2022-08-16 | 北京北方华创微电子装备有限公司 | 半导体反应腔室及半导体加工设备 |
| US20220084842A1 (en) * | 2020-09-11 | 2022-03-17 | Applied Materials, Inc. | Antifragile systems for semiconductor processing equipment using multiple special sensors and algorithms |
| DE102020124936B4 (de) * | 2020-09-24 | 2024-11-28 | VON ARDENNE Asset GmbH & Co. KG | Verfahren, sowie Steuervorrichtung und nichtflüchtiger Datenspeicher, aufweisend Codesegmente, zum Durchführen desselbigen |
| US12191214B2 (en) * | 2021-03-05 | 2025-01-07 | Taiwan Semiconductor Manufacturing Company Limited | System and methods for controlling an amount of primer in a primer application gas |
| WO2023043526A1 (en) * | 2021-09-17 | 2023-03-23 | Applied Materials, Inc. | Energy efficiency improvement with continuous flow modulation in cluster tool |
| US12518989B2 (en) | 2021-09-23 | 2026-01-06 | Applied Materials Inc. | In-situ calibration/optimization of emissivity settings in vacuum for temperature measurement |
| CN117707100B (zh) * | 2024-02-06 | 2024-04-19 | 深圳市杰美康机电有限公司 | EtherCAT总线驱动控制器及其同步控制方法 |
| US20250347579A1 (en) * | 2024-05-13 | 2025-11-13 | Applied Materials, Inc. | Method of in situ leak monitoring in fluid circuits |
Family Cites Families (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2829532B2 (ja) * | 1989-10-12 | 1998-11-25 | 株式会社ユーシン | 多機能電子水栓 |
| JP2949521B2 (ja) * | 1990-10-13 | 1999-09-13 | 株式会社エステック | 排気装置用制御装置 |
| JPH0559502U (ja) | 1992-01-22 | 1993-08-06 | 日立金属株式会社 | 異常温度に対する警報機能を備えたマスフローコントローラ |
| JPH06102068A (ja) * | 1992-09-18 | 1994-04-12 | Hitachi Ltd | 流量異常チェックシステム |
| JPH06194203A (ja) | 1992-12-25 | 1994-07-15 | Hitachi Metals Ltd | 異常診断機能付マスフローコントローラ及びその異常診断方法 |
| JPH06275562A (ja) | 1993-03-24 | 1994-09-30 | Toshiba Emi Ltd | プラズマ処理装置 |
| JPH07325625A (ja) * | 1994-05-31 | 1995-12-12 | Nec Kansai Ltd | マスフローコントローラ |
| JPH08335118A (ja) | 1995-06-06 | 1996-12-17 | Hitachi Metals Ltd | 流量制御方法 |
| JPH09305202A (ja) * | 1996-05-16 | 1997-11-28 | Kokusai Electric Co Ltd | ガス流量の監視制御装置 |
| US5944048A (en) | 1996-10-04 | 1999-08-31 | Emerson Electric Co. | Method and apparatus for detecting and controlling mass flow |
| JPH10232714A (ja) * | 1997-02-18 | 1998-09-02 | Kokusai Electric Co Ltd | 流量制御装置の診断装置 |
| JPH11296233A (ja) * | 1998-04-09 | 1999-10-29 | Kokusai Electric Co Ltd | 半導体製造装置における流量制御装置の異常検出方法 |
| KR100427563B1 (ko) | 1999-04-16 | 2004-04-27 | 가부시키가이샤 후지킨 | 병렬분류형 유체공급장치와, 이것에 사용하는 유체가변형압력식 유량제어방법 및 유체가변형 압력식 유량제어장치 |
| JP4332986B2 (ja) | 2000-04-24 | 2009-09-16 | 日立金属株式会社 | 質量流量制御装置 |
| US6439253B1 (en) | 2000-12-28 | 2002-08-27 | International Business Machines Corporation | System for and method of monitoring the flow of semiconductor process gases from a gas delivery system |
| JP3809146B2 (ja) * | 2002-12-17 | 2006-08-16 | シーケーディ株式会社 | 流量制御方法および流量制御装置 |
| JP2004319857A (ja) | 2003-04-18 | 2004-11-11 | Matsushita Electric Ind Co Ltd | 半導体製造装置のモニタリングシステム |
| US6955072B2 (en) * | 2003-06-25 | 2005-10-18 | Mks Instruments, Inc. | System and method for in-situ flow verification and calibration |
| US6973375B2 (en) * | 2004-02-12 | 2005-12-06 | Mykrolis Corporation | System and method for flow monitoring and control |
| JP4572139B2 (ja) | 2005-05-23 | 2010-10-27 | 株式会社フジキン | 改良型圧力式流量制御装置 |
| JP4866682B2 (ja) * | 2005-09-01 | 2012-02-01 | 株式会社フジキン | 圧力センサを保有する流量制御装置を用いた流体供給系の異常検出方法 |
| CN100498626C (zh) | 2005-12-09 | 2009-06-10 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种半导体设备中气体校准的方法 |
| JP2008039513A (ja) | 2006-08-03 | 2008-02-21 | Hitachi Metals Ltd | 質量流量制御装置の流量制御補正方法 |
| US7743670B2 (en) | 2006-08-14 | 2010-06-29 | Applied Materials, Inc. | Method and apparatus for gas flow measurement |
| KR20080085967A (ko) * | 2007-03-21 | 2008-09-25 | 삼성전자주식회사 | 유량제어 모니터링장치 및 그 방법 |
| JP5054500B2 (ja) | 2007-12-11 | 2012-10-24 | 株式会社フジキン | 圧力制御式流量基準器 |
| JP5082832B2 (ja) * | 2007-12-26 | 2012-11-28 | 日立金属株式会社 | 流量制御装置、流量制御方法及び流量制御装置の検定方法 |
| KR100969990B1 (ko) | 2008-03-21 | 2010-07-15 | 주식회사 아토 | 질량 유량 조절기의 점검 방법 및 장치 |
| US8089046B2 (en) | 2008-09-19 | 2012-01-03 | Applied Materials, Inc. | Method and apparatus for calibrating mass flow controllers |
| CN101436069B (zh) | 2008-11-25 | 2010-09-15 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 质量流量控制器的在线校验方法 |
| JP5337542B2 (ja) | 2009-03-12 | 2013-11-06 | 株式会社堀場エステック | マスフローメータ、マスフローコントローラ、それらを含むマスフローメータシステムおよびマスフローコントローラシステム |
| JP5195553B2 (ja) | 2009-03-18 | 2013-05-08 | パナソニック株式会社 | 流量計測装置 |
| JP5442413B2 (ja) * | 2009-12-03 | 2014-03-12 | ルネサスエレクトロニクス株式会社 | 半導体製造装置および流量制御装置 |
| US9223318B2 (en) * | 2009-12-25 | 2015-12-29 | Horiba Stec, Co., Ltd. | Mass flow controller system |
-
2012
- 2012-09-26 US US13/627,659 patent/US9772629B2/en active Active
- 2012-09-28 TW TW101135955A patent/TWI583927B/zh active
- 2012-09-28 KR KR1020147011427A patent/KR102062593B1/ko active Active
- 2012-09-28 JP JP2014533371A patent/JP6328556B2/ja active Active
- 2012-09-28 WO PCT/US2012/057830 patent/WO2013049512A2/en not_active Ceased
- 2012-09-28 CN CN201280055872.7A patent/CN103930972B/zh active Active
-
2017
- 2017-08-28 US US15/687,573 patent/US10222810B2/en active Active
- 2017-10-13 JP JP2017199297A patent/JP6789909B2/ja active Active
-
2019
- 2019-10-10 JP JP2019186493A patent/JP6912540B2/ja active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP6789909B2 (ja) | 2020-11-25 |
| US9772629B2 (en) | 2017-09-26 |
| WO2013049512A2 (en) | 2013-04-04 |
| TW201331558A (zh) | 2013-08-01 |
| CN103930972B (zh) | 2017-01-18 |
| JP2020038678A (ja) | 2020-03-12 |
| TWI583927B (zh) | 2017-05-21 |
| JP6912540B2 (ja) | 2021-08-04 |
| CN103930972A (zh) | 2014-07-16 |
| JP6328556B2 (ja) | 2018-05-23 |
| JP2018037091A (ja) | 2018-03-08 |
| JP2014528606A (ja) | 2014-10-27 |
| US10222810B2 (en) | 2019-03-05 |
| US20130092243A1 (en) | 2013-04-18 |
| KR20140069305A (ko) | 2014-06-09 |
| WO2013049512A3 (en) | 2013-05-23 |
| US20180024573A1 (en) | 2018-01-25 |
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