KR101927542B1 - 정전기 방지 코팅을 갖는 광학 디바이스 - Google Patents

정전기 방지 코팅을 갖는 광학 디바이스 Download PDF

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Publication number
KR101927542B1
KR101927542B1 KR1020127007826A KR20127007826A KR101927542B1 KR 101927542 B1 KR101927542 B1 KR 101927542B1 KR 1020127007826 A KR1020127007826 A KR 1020127007826A KR 20127007826 A KR20127007826 A KR 20127007826A KR 101927542 B1 KR101927542 B1 KR 101927542B1
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South Korea
Prior art keywords
optical
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film
layer
antistatic
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Expired - Fee Related
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KR1020127007826A
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Korean (ko)
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KR20120058578A (ko
Inventor
브라이언 브이 헌트
브란트 케이 카터
모린 씨 넬슨
토마스 피 클룬
제이슨 에스 페타자
이종 왕
조엘 디 옥스만
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쓰리엠 이노베이티브 프로퍼티즈 컴파니
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Publication of KR20120058578A publication Critical patent/KR20120058578A/ko
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/16—Optical coatings produced by application to, or surface treatment of, optical elements having an anti-static effect, e.g. electrically conducting coatings
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/16—Anti-static materials
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
    • C09D133/04—Homopolymers or copolymers of esters
    • C09D133/14—Homopolymers or copolymers of esters of esters containing halogen, nitrogen, sulfur or oxygen atoms in addition to the carboxy oxygen
    • C09D133/16—Homopolymers or copolymers of esters containing halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/34—Esters containing nitrogen, e.g. N,N-dimethylaminoethyl (meth)acrylate
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
    • C08F222/10—Esters
    • C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
    • C08F222/104—Esters of polyhydric alcohols or polyhydric phenols of tetraalcohols, e.g. pentaerythritol tetra(meth)acrylate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/3154—Of fluorinated addition polymer from unsaturated monomers
    • Y10T428/31544—Addition polymer is perhalogenated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Paints Or Removers (AREA)
  • Polarising Elements (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
KR1020127007826A 2009-08-28 2010-08-27 정전기 방지 코팅을 갖는 광학 디바이스 Expired - Fee Related KR101927542B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US23799209P 2009-08-28 2009-08-28
US61/237,992 2009-08-28
PCT/US2010/047005 WO2011025963A1 (en) 2009-08-28 2010-08-27 Optical device with antistatic coating

Publications (2)

Publication Number Publication Date
KR20120058578A KR20120058578A (ko) 2012-06-07
KR101927542B1 true KR101927542B1 (ko) 2018-12-10

Family

ID=43628405

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KR1020127007826A Expired - Fee Related KR101927542B1 (ko) 2009-08-28 2010-08-27 정전기 방지 코팅을 갖는 광학 디바이스

Country Status (7)

Country Link
US (2) US20120225301A1 (https=)
EP (1) EP2470929B1 (https=)
JP (1) JP6030449B2 (https=)
KR (1) KR101927542B1 (https=)
CN (1) CN102483468B (https=)
SG (1) SG178598A1 (https=)
WO (1) WO2011025963A1 (https=)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103168026B (zh) 2009-08-28 2016-06-29 3M创新有限公司 包含多官能阳离子的可聚合离子液体及抗静电涂料
EP2470509A2 (en) 2009-08-28 2012-07-04 3M Innovative Properties Company Compositions and articles comprising polymerizable ionic liquid mixture, and methods of curing
EP2515827A2 (en) 2009-12-22 2012-10-31 3M Innovative Properties Company Curable dental compositions and articles comprising polymerizable ionic liquids
JP5818879B2 (ja) 2010-05-18 2015-11-18 スリーエム イノベイティブ プロパティズ カンパニー 芳香族カルボキシレートアニオンを含む重合性イオン液体
JP6165621B2 (ja) * 2013-03-29 2017-07-19 住友理工株式会社 電子写真機器用導電性組成物およびこれを用いた電子写真機器用導電性ロール
TWI576112B (zh) * 2014-10-24 2017-04-01 國立陽明大學 巨噬細胞發炎蛋白－１β（ＭＩＰ－１β）抑制劑用以保護胰臟及防止血糖升高的用途
KR102639383B1 (ko) * 2014-12-26 2024-02-21 스미또모 가가꾸 가부시키가이샤 대전방지성 편광판, 점착제층을 구비한 대전방지성 편광판 및 광학 적층체
WO2019069758A1 (ja) * 2017-10-03 2019-04-11 東レ株式会社 積層フィルム
JP7057879B2 (ja) * 2018-02-08 2022-04-21 株式会社スリーボンド コーティング剤組成物
CN113966357B (zh) 2019-05-08 2023-12-22 3M创新有限公司 纳米结构化制品

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020137825A1 (en) * 1999-10-06 2002-09-26 3M Innovative Properties Company Antistatic composition
JP2007320093A (ja) * 2006-05-31 2007-12-13 Dainichiseika Color & Chem Mfg Co Ltd 帯電防止フィルムおよび帯電防止層形成用塗料

Family Cites Families (88)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3250808A (en) 1963-10-31 1966-05-10 Du Pont Fluorocarbon ethers derived from hexafluoropropylene epoxide
JPS5098049A (https=) 1974-01-09 1975-08-04
JPS5163317A (en) 1974-04-09 1976-06-01 Eekee Sangyo Kk Yokogatadaikasutoki ni okeru seihintoridashisochi
JPS53282A (en) 1976-06-24 1978-01-05 Nippon Paint Co Ltd Thermosetting resin, method of preparing same, and coating composition containing same as main component
US4262072A (en) 1979-06-25 1981-04-14 Minnesota Mining And Manufacturing Company Poly(ethylenically unsaturated alkoxy) heterocyclic protective coatings
EP0170619B1 (de) 1984-07-16 1989-06-21 Ciba-Geigy Ag Biozide Zusammensetzungen
JPS6180859A (ja) 1984-09-28 1986-04-24 Hitachi Ltd パワ−ｍｏｓｆｅｔ
JPS6128501A (ja) 1985-04-06 1986-02-08 Nippon Zoki Pharmaceut Co Ltd デキストリン・ヒドロキシカルボン酸・第二鉄多核複合体の製造法
DE3822043A1 (de) * 1988-06-30 1990-01-11 Hoechst Ag Grenzflaechenaktive verbindungen auf basis von oxynaphthoesaeureestern, ihre herstellung und verwendung
US5183597A (en) 1989-02-10 1993-02-02 Minnesota Mining And Manufacturing Company Method of molding microstructure bearing composite plastic articles
US5175030A (en) 1989-02-10 1992-12-29 Minnesota Mining And Manufacturing Company Microstructure-bearing composite plastic articles and method of making
US5161041A (en) 1990-04-26 1992-11-03 Ois Optical Imaging Systems, Inc. Lighting assembly for a backlit electronic display including an integral image splitting and collimating means
JP3068284B2 (ja) 1991-10-04 2000-07-24 帝人株式会社 帯電防止性合成樹脂成形品
JPH05163317A (ja) 1991-12-17 1993-06-29 Nippon Kayaku Co Ltd 樹脂組成物、光ディスク用材料及びその硬化物
JP3296371B2 (ja) * 1992-02-18 2002-06-24 三井武田ケミカル株式会社 ポリウレタンエラストマー及びその製造法
TW264487B (https=) * 1992-02-18 1995-12-01 Takeda Pharm Industry Co Ltd
US5427835A (en) 1992-06-04 1995-06-27 Minnesota Mining And Manufacturing Company Sulfopolymer/vanadium oxide antistatic compositions
JPH06128501A (ja) 1992-10-20 1994-05-10 Nippon Kayaku Co Ltd 樹脂組成物、光ディスク用材料及びその硬化物
JPH06136355A (ja) * 1992-10-27 1994-05-17 Kao Corp 帯電防止材料
JPH06180859A (ja) 1992-12-11 1994-06-28 Mitsubishi Rayon Co Ltd 耐擦傷性および帯電防止性に優れた光ディスク用コーティング材および光ディスク
US5534322A (en) 1993-06-29 1996-07-09 Kao Corporation Recording medium
JPH0741528A (ja) 1993-08-02 1995-02-10 Nippon Kayaku Co Ltd 放射線硬化性樹脂組成物およびその硬化物
US5882774A (en) 1993-12-21 1999-03-16 Minnesota Mining And Manufacturing Company Optical film
US5828488A (en) 1993-12-21 1998-10-27 Minnesota Mining And Manufacturing Co. Reflective polarizer display
JP3729528B2 (ja) * 1995-01-25 2005-12-21 触媒化成工業株式会社 着色膜形成用塗布液、着色膜及び着色膜を形成したガラス物品
WO1996027757A1 (en) 1995-03-03 1996-09-12 Minnesota Mining And Manufacturing Company Light directing film having variable height structured surface and light directing article constructed therefrom
GB9515720D0 (en) 1995-08-01 1995-10-04 Zeneca Ltd Bacterial coating compositions
US5626654A (en) 1995-12-05 1997-05-06 Xerox Corporation Ink compositions containing liposomes
US5783120A (en) 1996-02-29 1998-07-21 Minnesota Mining And Manufacturing Company Method for making an optical film
US5825543A (en) 1996-02-29 1998-10-20 Minnesota Mining And Manufacturing Company Diffusely reflecting polarizing element including a first birefringent phase and a second phase
JP3092511B2 (ja) 1996-03-29 2000-09-25 荒川化学工業株式会社 活性エネルギー線硬化型プラスチック用コーティング剤および該コーティング剤で表面処理してなるプラスチック成形物
US5919551A (en) 1996-04-12 1999-07-06 3M Innovative Properties Company Variable pitch structured optical film
US5788749A (en) 1997-02-14 1998-08-04 Xerox Corporation Pigmented ink compositions containing liposomes
JP3792339B2 (ja) * 1997-04-03 2006-07-05 三菱化学株式会社 活性エネルギー線硬化性被覆組成物
US6280063B1 (en) 1997-05-09 2001-08-28 3M Innovative Properties Company Brightness enhancement article
US6577358B1 (en) 1997-06-25 2003-06-10 Dai Nippon Printing Co., Ltd. Lens film with conductive lens layer or conductive layer
KR100235229B1 (ko) 1997-11-26 1999-12-15 이행우 광경화형 방무성 조성물용 4급 암모늄염, 이의 제법 및 이를 포함하는 광경화형 방무성 조성물
EP1975649A1 (en) 1998-02-18 2008-10-01 Minnesota Mining And Manufacturing Company Optical film
JP4055918B2 (ja) * 1998-03-27 2008-03-05 大日本印刷株式会社 透明導電性カバーテープ
JP2000080169A (ja) * 1998-06-26 2000-03-21 Mitsubishi Chemicals Corp 活性エネルギ―線硬化性被覆組成物
US6277471B1 (en) 1999-06-18 2001-08-21 Shih Chieh Tang Brightness enhancement film
JP4636644B2 (ja) 2000-01-17 2011-02-23 富士フイルム株式会社 電解質組成物、電気化学電池およびイオン性液晶モノマー
JP2001199961A (ja) 2000-01-21 2001-07-24 Fuji Photo Film Co Ltd 重合性溶融塩モノマー、電解質組成物および電気化学電池
US6581286B2 (en) 2000-04-05 2003-06-24 3M Innovative Properties Company Method of making tool to produce optical film
JP4667575B2 (ja) 2000-09-27 2011-04-13 富士フイルム株式会社 １，３−ジアルキルイミダゾリウムヨウ素塩の製造方法
IL156901A0 (en) 2001-01-16 2004-02-08 Univ Ben Gurion Amphiphilic derivatives for the production of vesicles, micelles and complexants, and precursors thereof
DE60232942D1 (de) * 2001-10-09 2009-08-27 Mitsubishi Chem Corp Strahlungshärtbare Beschichtungszusammensetzung
US6740413B2 (en) 2001-11-05 2004-05-25 3M Innovative Properties Company Antistatic compositions
JP3631992B2 (ja) 2001-11-13 2005-03-23 日東電工株式会社 配線回路基板
JP2004006232A (ja) 2001-12-27 2004-01-08 Sanyo Chem Ind Ltd 高分子電解質
KR100500191B1 (ko) * 2002-09-10 2005-07-14 에스에스씨피 주식회사 자외선 경화성 광섬유 클래딩용 수지 조성물
US20040185013A1 (en) 2003-01-30 2004-09-23 Burgio Paul A. Dental whitening compositions and methods
TW582552U (en) 2003-03-24 2004-04-01 Shih-Chieh Tang Brightness unit structure for a brightness enhancement film
JP4044485B2 (ja) 2003-05-02 2008-02-06 日東電工株式会社 光学フィルム、その製造方法、およびそれを用いた偏光板
US7074463B2 (en) 2003-09-12 2006-07-11 3M Innovative Properties Company Durable optical element
US7345137B2 (en) 2004-10-18 2008-03-18 3M Innovative Properties Company Modified copolyesters and optical films including modified copolyesters
US8703902B2 (en) 2004-11-10 2014-04-22 University Of Wyoming Polymers and copolymers of ionic liquids as radio frequency absorbing materials
JP4830314B2 (ja) 2005-02-28 2011-12-07 住友ベークライト株式会社 イオン伝導性電解質用組成物、イオン伝導性電解質、及び該イオン伝導性電解質を用いた二次電池
US20060216524A1 (en) 2005-03-23 2006-09-28 3M Innovative Properties Company Perfluoropolyether urethane additives having (meth)acryl groups and hard coats
JP2006282877A (ja) 2005-03-31 2006-10-19 Fuji Photo Film Co Ltd インク組成物、並びに、これを用いた画像形成方法および記録物
JP4598598B2 (ja) * 2005-05-26 2010-12-15 大日本印刷株式会社 カバーテープおよびその製造方法
TWI274896B (en) 2005-06-30 2007-03-01 Efun Technology Co Ltd Brightness enhancement film having reinforcing layer
JP4642572B2 (ja) * 2005-07-06 2011-03-02 大日精化工業株式会社 光学用保護フィルム
TWI391711B (zh) 2005-09-13 2013-04-01 迎輝科技股份有限公司 具有導光構造之聚光片
JP5145938B2 (ja) 2005-09-16 2013-02-20 大日本印刷株式会社 帯電防止防眩フィルム
JP4848512B2 (ja) 2005-10-18 2011-12-28 国立大学法人北海道大学 Ｄ４０或いはｃａｓｃ５、又は、該癌・精巣抗原タンパク質のスプライシングアイソフォームタンパク質をコードする遺伝子、及び、該遺伝子産物をターゲットとした癌細胞の増殖・分裂阻止及び細胞死の誘導方法、及び、該増殖・分裂阻止及び細胞死を誘導する物質のスクリーニング方法
JPWO2007105394A1 (ja) * 2006-02-22 2009-07-30 株式会社きもと 帯電防止性ハードコートフィルム
TWI418463B (zh) * 2006-06-02 2013-12-11 Dainippon Printing Co Ltd An optical laminate, a polarizing plate, and an image display device
JP5600863B2 (ja) * 2006-09-29 2014-10-08 東レ株式会社 シリコーンポリマー、眼用レンズおよびコンタクトレンズ
US20080124555A1 (en) 2006-11-29 2008-05-29 3M Innovative Properties Company Polymerizable composition comprising perfluoropolyether urethane having ethylene oxide repeat units
JP5041518B2 (ja) 2007-04-05 2012-10-03 日本カーリット株式会社 帯電防止用組成物および帯電防止ハードコート形成物
JP5248181B2 (ja) 2007-04-20 2013-07-31 日本合成化学工業株式会社 アクリル系樹脂の製造方法、アクリル系樹脂を用いた粘着剤組成物、ならびに粘着剤、粘着シート
US8986812B2 (en) 2007-07-09 2015-03-24 3M Innovative Properties Company Thin microstructured optical films
US8449970B2 (en) * 2007-07-23 2013-05-28 3M Innovative Properties Company Antistatic article, method of making the same, and display device having the same
WO2009029438A1 (en) 2007-08-31 2009-03-05 3M Innovative Properties Company Hardcoats
JP2009066986A (ja) * 2007-09-14 2009-04-02 Fujifilm Corp 表面機能性材料及びその製造方法
WO2009075201A1 (ja) * 2007-12-11 2009-06-18 Konica Minolta Opto, Inc. 防眩性フィルム、偏光板及び液晶表示装置
JP5260273B2 (ja) * 2007-12-27 2013-08-14 三洋化成工業株式会社 活性エネルギー線硬化型帯電防止性樹脂組成物
JP2009179671A (ja) * 2008-01-30 2009-08-13 Toyo Ink Mfg Co Ltd 難水溶性帯電防止性重合性化合物、及び該化合物を含有する帯電防止性重合性組成物、並びに帯電防止性を有する重合体
JP2009227949A (ja) 2008-02-28 2009-10-08 Sanyo Chem Ind Ltd マイクロ波硬化性組成物
JP4964806B2 (ja) 2008-02-29 2012-07-04 三洋化成工業株式会社 導電性樹脂組成物および帯電防止性樹脂組成物
JP5214490B2 (ja) * 2008-03-31 2013-06-19 三洋化成工業株式会社 活性エネルギー線硬化型帯電防止性樹脂組成物
MY158742A (en) 2008-12-19 2016-11-15 Sanyo Chemical Ind Ltd Cleaning agent for electronic materials
TW201103885A (en) 2009-07-22 2011-02-01 Daxon Technology Inc Antistatic ionic compound, oligomer thereof, copolymer thereof, and pressure-sensitive adhesive composition
EP2470509A2 (en) 2009-08-28 2012-07-04 3M Innovative Properties Company Compositions and articles comprising polymerizable ionic liquid mixture, and methods of curing
CN103168026B (zh) 2009-08-28 2016-06-29 3M创新有限公司 包含多官能阳离子的可聚合离子液体及抗静电涂料
EP2493001A4 (en) * 2009-10-21 2018-04-04 Kyoto University Electrochemical device using solid polymer electrolyte using fine polymer composite particles
EP2515827A2 (en) 2009-12-22 2012-10-31 3M Innovative Properties Company Curable dental compositions and articles comprising polymerizable ionic liquids

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020137825A1 (en) * 1999-10-06 2002-09-26 3M Innovative Properties Company Antistatic composition
JP2007320093A (ja) * 2006-05-31 2007-12-13 Dainichiseika Color & Chem Mfg Co Ltd 帯電防止フィルムおよび帯電防止層形成用塗料

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US20220290022A1 (en) 2022-09-15
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EP2470929A4 (en) 2015-08-19
WO2011025963A1 (en) 2011-03-03
JP2013503369A (ja) 2013-01-31
SG178598A1 (en) 2012-04-27
EP2470929A1 (en) 2012-07-04
US11807795B2 (en) 2023-11-07
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