KR101766399B1 - 다이싱 시트 - Google Patents

다이싱 시트 Download PDF

Info

Publication number
KR101766399B1
KR101766399B1 KR1020110009068A KR20110009068A KR101766399B1 KR 101766399 B1 KR101766399 B1 KR 101766399B1 KR 1020110009068 A KR1020110009068 A KR 1020110009068A KR 20110009068 A KR20110009068 A KR 20110009068A KR 101766399 B1 KR101766399 B1 KR 101766399B1
Authority
KR
South Korea
Prior art keywords
sensitive adhesive
pressure
meth
acrylate
adhesive layer
Prior art date
Application number
KR1020110009068A
Other languages
English (en)
Korean (ko)
Other versions
KR20110090799A (ko
Inventor
케니치 무라야마
미치오 카나이
요지 와카야마
Original Assignee
린텍 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 린텍 코포레이션 filed Critical 린텍 코포레이션
Publication of KR20110090799A publication Critical patent/KR20110090799A/ko
Application granted granted Critical
Publication of KR101766399B1 publication Critical patent/KR101766399B1/ko

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J4/00Adhesives based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; adhesives, based on monomers of macromolecular compounds of groups C09J183/00 - C09J183/16
    • C09J4/06Organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond in combination with a macromolecular compound other than an unsaturated polymer of groups C09J159/00 - C09J187/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J133/00Adhesives based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Adhesives based on derivatives of such polymers
    • C09J133/04Homopolymers or copolymers of esters
    • C09J133/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
    • C09J133/062Copolymers with monomers not covered by C09J133/06
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J7/00Adhesives in the form of films or foils
    • C09J7/20Adhesives in the form of films or foils characterised by their carriers
    • C09J7/22Plastics; Metallised plastics
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Dicing (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Adhesive Tapes (AREA)
KR1020110009068A 2010-02-02 2011-01-28 다이싱 시트 KR101766399B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2010-021458 2010-02-02
JP2010021458 2010-02-02
JP2011001972A JP5743555B2 (ja) 2010-02-02 2011-01-07 ダイシングシート
JPJP-P-2011-001972 2011-01-07

Publications (2)

Publication Number Publication Date
KR20110090799A KR20110090799A (ko) 2011-08-10
KR101766399B1 true KR101766399B1 (ko) 2017-08-08

Family

ID=44693055

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020110009068A KR101766399B1 (ko) 2010-02-02 2011-01-28 다이싱 시트

Country Status (2)

Country Link
JP (1) JP5743555B2 (ja)
KR (1) KR101766399B1 (ja)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5945439B2 (ja) * 2012-03-26 2016-07-05 リンテック株式会社 ダイシングシート
JP5945438B2 (ja) * 2012-03-26 2016-07-05 リンテック株式会社 ダイシングシート
JP6071231B2 (ja) * 2012-03-30 2017-02-01 リンテック株式会社 粘着剤および粘着シート
JP6081094B2 (ja) * 2012-07-13 2017-02-15 リンテック株式会社 ダイシングシート
JP6087122B2 (ja) * 2012-12-04 2017-03-01 リンテック株式会社 ダイシングシート
WO2015002270A1 (ja) * 2013-07-05 2015-01-08 リンテック株式会社 ダイシングシート
JP6034522B1 (ja) * 2016-03-17 2016-11-30 古河電気工業株式会社 半導体ウェハ加工用粘着テープおよび半導体ウェハの加工方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007220863A (ja) * 2006-02-16 2007-08-30 Nitto Denko Corp 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法
JP2009278066A (ja) 2008-04-17 2009-11-26 Hitachi Chem Co Ltd 半導体用接着部材、半導体装置及び半導体装置の製造方法
JP2010016393A (ja) 2009-08-27 2010-01-21 Hitachi Chem Co Ltd 半導体装置の製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61133215A (ja) * 1984-11-30 1986-06-20 Nitto Electric Ind Co Ltd 硬化性樹脂組成物
JPH05232701A (ja) * 1992-02-20 1993-09-10 Hitachi Chem Co Ltd 感光性樹脂組成物
JP3495388B2 (ja) * 1993-07-15 2004-02-09 古河電気工業株式会社 半導体ウエハダイシング用粘着テープ
JP3199600B2 (ja) * 1995-04-19 2001-08-20 日立化成工業株式会社 感光性樹脂組成物及びこれを用いた感光性エレメント
JP2002003795A (ja) * 2000-06-26 2002-01-09 Kanegafuchi Chem Ind Co Ltd 新規接着剤組成物及びそれを用いた接合部材
EP1411073B1 (en) * 2001-06-27 2013-03-20 Daikin Industries, Ltd. Surface-treating agent composition and process for producing the same
JP4443962B2 (ja) * 2004-03-17 2010-03-31 日東電工株式会社 ダイシング・ダイボンドフィルム
JP2007100064A (ja) * 2005-09-07 2007-04-19 Furukawa Electric Co Ltd:The ダイシング用粘着テープ
JP4788716B2 (ja) * 2005-10-25 2011-10-05 日立化成工業株式会社 感光性樹脂組成物、これを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
JP5020496B2 (ja) * 2005-10-28 2012-09-05 東京応化工業株式会社 接着剤組成物および接着フィルム
JP4979063B2 (ja) * 2006-06-15 2012-07-18 日東電工株式会社 半導体装置の製造方法
JP4931519B2 (ja) * 2006-09-01 2012-05-16 日東電工株式会社 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007220863A (ja) * 2006-02-16 2007-08-30 Nitto Denko Corp 活性面貼付ダイシング用粘着テープ又はシートおよび被加工物の切断片のピックアップ方法
JP2009278066A (ja) 2008-04-17 2009-11-26 Hitachi Chem Co Ltd 半導体用接着部材、半導体装置及び半導体装置の製造方法
JP2010016393A (ja) 2009-08-27 2010-01-21 Hitachi Chem Co Ltd 半導体装置の製造方法

Also Published As

Publication number Publication date
KR20110090799A (ko) 2011-08-10
JP5743555B2 (ja) 2015-07-01
JP2011181899A (ja) 2011-09-15

Similar Documents

Publication Publication Date Title
JP7207778B2 (ja) 半導体加工用粘着テープ、及び半導体装置の製造方法
JP6475901B2 (ja) 半導体加工用粘着テープおよび半導体装置の製造方法
KR101766399B1 (ko) 다이싱 시트
JP5128575B2 (ja) ステルスダイシング用粘着シート及び半導体装置の製造方法
JP5049612B2 (ja) 粘着シート
KR101708909B1 (ko) 점착시트 및 반도체 웨이퍼의 가공방법, 반도체 칩의 제조방법
KR102152605B1 (ko) 보호막 형성용 필름
JP4991348B2 (ja) 粘着シート
KR101967444B1 (ko) 다이싱 시트 및 반도체 칩의 제조 방법
EP2154220B1 (en) Re-releasable adhesive agent and re-releasable adhesive sheet
KR101437176B1 (ko) 점착시트
JP6139515B2 (ja) ダイシングシート
JP5464635B2 (ja) 半導体ウエハ加工用粘着シートおよびその使用方法
JP2008231243A (ja) 粘着シート
CN107924864B (zh) 半导体晶片半切割后的背面研削加工用紫外线硬化型粘合片
WO2014155756A1 (ja) 粘着シートおよび保護膜形成用複合シートならびに保護膜付きチップの製造方法
JP6091955B2 (ja) 粘着シートおよび保護膜形成用複合シートならびに保護膜付きチップの製造方法
KR20170115048A (ko) 수지막 형성용 복합 시트, 및 수지막을 갖는 칩의 제조 방법
JP4991350B2 (ja) 粘着シート
KR20160134708A (ko) 다이싱 시트 및 당해 다이싱 시트를 사용하는 칩의 제조 방법
KR102642079B1 (ko) 반도체 가공용 점착 테이프
KR101711563B1 (ko) 스텔스 다이싱용 점착 시트 및 반도체 장치의 제조 방법
JP5033440B2 (ja) 粘着シート
KR20230098594A (ko) 점착 테이프 및 가공 방법
JP5945439B2 (ja) ダイシングシート

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
GRNT Written decision to grant