KR101706517B1 - 전도성 시드 레이어를 레이저 제거하는 방법 및 장치 - Google Patents
전도성 시드 레이어를 레이저 제거하는 방법 및 장치 Download PDFInfo
- Publication number
- KR101706517B1 KR101706517B1 KR1020167001251A KR20167001251A KR101706517B1 KR 101706517 B1 KR101706517 B1 KR 101706517B1 KR 1020167001251 A KR1020167001251 A KR 1020167001251A KR 20167001251 A KR20167001251 A KR 20167001251A KR 101706517 B1 KR101706517 B1 KR 101706517B1
- Authority
- KR
- South Korea
- Prior art keywords
- substrate
- laser
- seed layer
- irradiating
- stage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/362—Laser etching
- B23K26/364—Laser etching for making a groove or trench, e.g. for scribing a break initiation groove
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/40—Removing material taking account of the properties of the material involved
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0622—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam by shaping pulses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/062—Shaping the laser beam, e.g. by masks or multi-focusing by direct control of the laser beam
- B23K26/0626—Energy control of the laser beam
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/08—Devices involving relative movement between laser beam and workpiece
- B23K26/083—Devices involving movement of the workpiece in at least one axial direction
- B23K26/0853—Devices involving movement of the workpiece in at least two axial directions, e.g. in a plane
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/12—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure
- B23K26/127—Working by laser beam, e.g. welding, cutting or boring in a special environment or atmosphere, e.g. in an enclosure in an enclosure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/142—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor for the removal of by-products
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/1462—Nozzles; Features related to nozzles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/032—Manufacture or treatment of conductive parts of the interconnections of conductive barrier, adhesion or liner layers
- H10W20/042—Manufacture or treatment of conductive parts of the interconnections of conductive barrier, adhesion or liner layers the barrier, adhesion or liner layers being seed or nucleation layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/032—Manufacture or treatment of conductive parts of the interconnections of conductive barrier, adhesion or liner layers
- H10W20/054—Manufacture or treatment of conductive parts of the interconnections of conductive barrier, adhesion or liner layers by selectively removing parts thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K2103/00—Materials to be soldered, welded or cut
- B23K2103/16—Composite materials
- B23K2103/166—Multilayered materials
- B23K2103/172—Multilayered materials wherein at least one of the layers is non-metallic
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201161432539P | 2011-01-13 | 2011-01-13 | |
| US61/432,539 | 2011-01-13 | ||
| PCT/US2012/020983 WO2012097092A2 (en) | 2011-01-13 | 2012-01-11 | Laser removal of conductive seed layers |
| US13/348,063 US8778799B2 (en) | 2011-01-13 | 2012-01-11 | Laser removal of conductive seed layers |
| US13/348,063 | 2012-01-11 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137021093A Division KR20140037044A (ko) | 2011-01-13 | 2012-01-11 | 전도성 시드 레이어를 레이저 제거하는 방법 및 장치 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20160012250A KR20160012250A (ko) | 2016-02-02 |
| KR101706517B1 true KR101706517B1 (ko) | 2017-02-13 |
Family
ID=46491096
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020167001251A Active KR101706517B1 (ko) | 2011-01-13 | 2012-01-11 | 전도성 시드 레이어를 레이저 제거하는 방법 및 장치 |
| KR1020137021093A Ceased KR20140037044A (ko) | 2011-01-13 | 2012-01-11 | 전도성 시드 레이어를 레이저 제거하는 방법 및 장치 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020137021093A Ceased KR20140037044A (ko) | 2011-01-13 | 2012-01-11 | 전도성 시드 레이어를 레이저 제거하는 방법 및 장치 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US8778799B2 (https=) |
| EP (1) | EP2663419A2 (https=) |
| JP (1) | JP5898699B2 (https=) |
| KR (2) | KR101706517B1 (https=) |
| CN (1) | CN103442840B (https=) |
| TW (1) | TWI502683B (https=) |
| WO (1) | WO2012097092A2 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI504322B (zh) * | 2012-03-29 | 2015-10-11 | Taiwan Green Point Entpr Co | 雙面電路板及其製備方法 |
| US8741691B2 (en) * | 2012-04-20 | 2014-06-03 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of fabricating three dimensional integrated circuit |
| US8975177B2 (en) * | 2013-03-14 | 2015-03-10 | Intel Corporation | Laser resist removal for integrated circuit (IC) packaging |
| US9412702B2 (en) | 2013-03-14 | 2016-08-09 | Intel Corporation | Laser die backside film removal for integrated circuit (IC) packaging |
| US9908201B2 (en) * | 2014-04-22 | 2018-03-06 | Taiwan Semiconductor Manufacturing Company Limited | Systems and methods for edge bead removal |
| US9754823B2 (en) | 2014-05-28 | 2017-09-05 | International Business Machines Corporation | Substrate including selectively formed barrier layer |
| CN107850554B (zh) * | 2015-08-26 | 2021-09-07 | 伊雷克托科学工业股份有限公司 | 相对于气流的镭射扫描定序及方向 |
| WO2017052633A1 (en) * | 2015-09-25 | 2017-03-30 | Vivek Raghunathan | Thin electronic package elements using laser spallation |
| EP3624571A1 (en) * | 2018-09-14 | 2020-03-18 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | A process for the manufacturing of printed conductive tracks on an object and 3d printed electronics |
| DE102019112030B4 (de) * | 2019-05-08 | 2023-11-02 | LSR Engineering & Consulting Limited | Verfahren zum Strukturieren eines Substrats |
| TWI825194B (zh) * | 2019-10-14 | 2023-12-11 | 雷立光國際股份有限公司 | 乾式晶圓回收設備 |
| CN114513900A (zh) * | 2022-03-25 | 2022-05-17 | 深圳市大族数控科技股份有限公司 | 加工设备 |
| CN114885525B (zh) * | 2022-03-25 | 2025-08-15 | 深圳市大族数控科技股份有限公司 | 线路板制作方法及线路板 |
| CN114554704A (zh) * | 2022-03-25 | 2022-05-27 | 深圳市大族数控科技股份有限公司 | 线路板的制作方法 |
| US12288763B2 (en) * | 2022-03-31 | 2025-04-29 | Texas Instruments Incorporated | Flip chip package assembly having post connects with solder-based joints |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62104692A (ja) * | 1985-11-01 | 1987-05-15 | Fuji Electric Corp Res & Dev Ltd | レ−ザ加工装置 |
| US5221426A (en) * | 1991-11-29 | 1993-06-22 | Motorola Inc. | Laser etch-back process for forming a metal feature on a non-metal substrate |
| JPH1099978A (ja) * | 1996-09-27 | 1998-04-21 | Hitachi Ltd | レーザー加工装置 |
| JPH1128900A (ja) * | 1997-05-12 | 1999-02-02 | Sumitomo Heavy Ind Ltd | レーザ光を用いた塗装除去方法及びレーザ処理装置 |
| JPH11106911A (ja) | 1997-10-08 | 1999-04-20 | Canon Inc | 薄膜形成装置及びそれを用いた化合物薄膜の形成法 |
| US6262579B1 (en) * | 1998-11-13 | 2001-07-17 | Kulicke & Soffa Holdings, Inc. | Method and structure for detecting open vias in high density interconnect substrates |
| US6165892A (en) * | 1998-07-31 | 2000-12-26 | Kulicke & Soffa Holdings, Inc. | Method of planarizing thin film layers deposited over a common circuit base |
| JP2000225487A (ja) * | 1999-02-08 | 2000-08-15 | Nippon Steel Corp | レーザ切断用ノズル及びレーザ切断装置 |
| US7379483B2 (en) * | 2003-03-18 | 2008-05-27 | Loma Linda University Medical Center | Method and apparatus for material processing |
| DE10318681B4 (de) * | 2003-04-24 | 2006-07-06 | Schott Ag | Verfahren und Vorrichtung zum Entfernen eines Randbereichs einer Substratschicht und zur Substratbeschichtung sowie Substrat |
| JP4479556B2 (ja) * | 2005-03-25 | 2010-06-09 | ソニー株式会社 | レーザエッチング装置 |
| JP4947973B2 (ja) * | 2005-06-02 | 2012-06-06 | ソニー株式会社 | レーザ加工装置とその加工方法及びデブリ回収機構とその回収方法 |
| JP2007021528A (ja) | 2005-07-15 | 2007-02-01 | Matsushita Electric Ind Co Ltd | レーザ加工装置およびその調整方法 |
| US7335611B2 (en) * | 2005-08-08 | 2008-02-26 | Applied Materials, Inc. | Copper conductor annealing process employing high speed optical annealing with a low temperature-deposited optical absorber layer |
| JP4993886B2 (ja) * | 2005-09-07 | 2012-08-08 | 株式会社ディスコ | レーザー加工装置 |
| US7528069B2 (en) * | 2005-11-07 | 2009-05-05 | Freescale Semiconductor, Inc. | Fine pitch interconnect and method of making |
| WO2007058605A1 (en) | 2005-11-18 | 2007-05-24 | Replisaurus Technologies Ab | Master electrode and method of forming it |
| FI124239B (fi) | 2006-02-23 | 2014-05-15 | Picodeon Ltd Oy | Elementti, jossa on sähköä johtava kalvomainen rakenne lämmittävän ja/tai jäähdyttävän vaikutuksen synnyttämiseksi sähkövirran avulla |
| FI20060178A7 (fi) * | 2006-02-23 | 2007-08-24 | Picodeon Ltd Oy | Pinnoitusmenetelmä |
| JP2009006350A (ja) * | 2007-06-27 | 2009-01-15 | Sony Corp | レーザ加工装置とその加工方法、デブリ回収機構とその回収方法、並びに表示パネルの製造方法 |
| KR101000466B1 (ko) * | 2008-04-02 | 2010-12-14 | 에이피시스템 주식회사 | 레이저 가공장치 및 가공방법 |
| CN105023973A (zh) | 2009-04-21 | 2015-11-04 | 泰特拉桑有限公司 | 形成太阳能电池中的结构的方法 |
| US7994045B1 (en) | 2009-09-08 | 2011-08-09 | Amkor Technology, Inc. | Bumped chip package fabrication method and structure |
| EP2638510B1 (en) * | 2010-11-08 | 2019-05-22 | Smartrac Investment B.V. | A method for producing an rfid transponder |
-
2012
- 2012-01-11 CN CN201280012947.3A patent/CN103442840B/zh active Active
- 2012-01-11 US US13/348,063 patent/US8778799B2/en active Active
- 2012-01-11 WO PCT/US2012/020983 patent/WO2012097092A2/en not_active Ceased
- 2012-01-11 KR KR1020167001251A patent/KR101706517B1/ko active Active
- 2012-01-11 KR KR1020137021093A patent/KR20140037044A/ko not_active Ceased
- 2012-01-11 EP EP12704145.7A patent/EP2663419A2/en not_active Withdrawn
- 2012-01-11 JP JP2013549523A patent/JP5898699B2/ja active Active
- 2012-01-13 TW TW101101498A patent/TWI502683B/zh not_active IP Right Cessation
-
2014
- 2014-07-14 US US14/331,141 patent/US9132511B2/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014504804A (ja) | 2014-02-24 |
| US9132511B2 (en) | 2015-09-15 |
| WO2012097092A3 (en) | 2013-01-24 |
| TW201238002A (en) | 2012-09-16 |
| US20120184099A1 (en) | 2012-07-19 |
| KR20160012250A (ko) | 2016-02-02 |
| KR20140037044A (ko) | 2014-03-26 |
| CN103442840B (zh) | 2015-07-01 |
| EP2663419A2 (en) | 2013-11-20 |
| WO2012097092A2 (en) | 2012-07-19 |
| TWI502683B (zh) | 2015-10-01 |
| US20150014287A1 (en) | 2015-01-15 |
| JP5898699B2 (ja) | 2016-04-06 |
| US8778799B2 (en) | 2014-07-15 |
| HK1191608A1 (en) | 2014-08-01 |
| CN103442840A (zh) | 2013-12-11 |
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Legal Events
| Date | Code | Title | Description |
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| A107 | Divisional application of patent | ||
| A201 | Request for examination | ||
| PA0104 | Divisional application for international application |
Comment text: Divisional Application for International Patent Patent event code: PA01041R01D Patent event date: 20160115 Application number text: 1020137021093 Filing date: 20130809 |
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| PA0201 | Request for examination | ||
| PG1501 | Laying open of application | ||
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| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20160405 Patent event code: PE09021S01D |
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