KR101629995B1 - 재료 증착 장치에서 기판을 홀딩하는 장치 - Google Patents

재료 증착 장치에서 기판을 홀딩하는 장치 Download PDF

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Publication number
KR101629995B1
KR101629995B1 KR1020117026030A KR20117026030A KR101629995B1 KR 101629995 B1 KR101629995 B1 KR 101629995B1 KR 1020117026030 A KR1020117026030 A KR 1020117026030A KR 20117026030 A KR20117026030 A KR 20117026030A KR 101629995 B1 KR101629995 B1 KR 101629995B1
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South Korea
Prior art keywords
substrate
support structure
shadow mask
deposition
mask
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Expired - Fee Related
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KR1020117026030A
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English (en)
Korean (ko)
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KR20120007022A (ko
Inventor
요하네스 크리즈네
에르윈 에일링
칼-헤인즈 호하우스
울프강 고에르겐
마크 필리펜즈
리차드 쉐이처
안스가르 피셔
마르틴 뮐러
안드레아스 로비치
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오스람 오엘이디 게엠베하
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
KR1020117026030A 2009-04-03 2010-03-29 재료 증착 장치에서 기판을 홀딩하는 장치 Expired - Fee Related KR101629995B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP09157249 2009-04-03
EP09157249.5 2009-04-03
EP10154410 2010-02-23
EP10154410.4 2010-02-23

Publications (2)

Publication Number Publication Date
KR20120007022A KR20120007022A (ko) 2012-01-19
KR101629995B1 true KR101629995B1 (ko) 2016-06-13

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KR1020117026030A Expired - Fee Related KR101629995B1 (ko) 2009-04-03 2010-03-29 재료 증착 장치에서 기판을 홀딩하는 장치

Country Status (7)

Country Link
US (1) US8808402B2 (enExample)
EP (1) EP2425034B1 (enExample)
JP (1) JP5642153B2 (enExample)
KR (1) KR101629995B1 (enExample)
CN (1) CN102482759B (enExample)
TW (1) TW201105809A (enExample)
WO (1) WO2010113102A1 (enExample)

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EP2425034B1 (en) * 2009-04-03 2016-07-13 OSRAM OLED GmbH An arrangement for holding a substrate in a material deposition apparatus
CN103203551B (zh) * 2012-01-16 2015-08-12 昆山允升吉光电科技有限公司 去除掩模板辅助图形的方法
TWI470110B (zh) * 2012-09-07 2015-01-21 Manz Taiwan Ltd 用於化學沉積設備的夾固裝置
KR102112751B1 (ko) * 2013-02-01 2020-05-19 삼성디스플레이 주식회사 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치
KR102060366B1 (ko) * 2013-04-17 2019-12-31 삼성디스플레이 주식회사 유기 발광층 형성장치 및 그것을 이용한 유기 발광층의 제조 방법
JP6078818B2 (ja) * 2013-07-02 2017-02-15 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
KR101537967B1 (ko) * 2013-12-30 2015-07-20 주식회사 에스에프에이 기판과 마스크의 어태치 장치 및 방법
CN106784394B (zh) * 2013-12-30 2018-10-09 Sfa工程股份有限公司 用于附着玻璃与掩模的设备及方法、以及用于装载基板的系统及方法
JP6418440B2 (ja) * 2014-06-03 2018-11-07 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 メタルマスク及びメタルマスクの製造方法並びにメタルマスクを用いた成膜方法
US10644239B2 (en) 2014-11-17 2020-05-05 Emagin Corporation High precision, high resolution collimating shadow mask and method for fabricating a micro-display
TWI564408B (zh) * 2015-02-02 2017-01-01 鴻海精密工業股份有限公司 蒸鍍遮罩、蒸鍍方法及蒸鍍遮罩之製造方法
KR20160097444A (ko) 2015-02-06 2016-08-18 삼성디스플레이 주식회사 표시 장치
JP2017008342A (ja) * 2015-06-17 2017-01-12 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
KR101638344B1 (ko) * 2015-12-04 2016-07-11 주식회사 유아이디 스퍼터링용 원판패널 고정 장치 및 방법
TWI721170B (zh) * 2016-05-24 2021-03-11 美商伊麥傑公司 蔽蔭遮罩沉積系統及其方法
KR102377183B1 (ko) 2016-05-24 2022-03-21 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
US10386731B2 (en) 2016-05-24 2019-08-20 Emagin Corporation Shadow-mask-deposition system and method therefor
CN109642313B (zh) * 2016-05-24 2021-03-09 埃马金公司 高精准度蔽荫掩模沉积系统及其方法
KR101797927B1 (ko) * 2016-06-01 2017-11-15 (주)브이앤아이솔루션 정전척
DE102017106160B4 (de) 2017-03-22 2025-03-20 VON ARDENNE Asset GmbH & Co. KG Substratträger, Transportanordnung, Vakuumanordnung und Verfahren
KR102378672B1 (ko) * 2017-05-17 2022-03-24 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
JP6998139B2 (ja) * 2017-06-28 2022-01-18 株式会社ジャパンディスプレイ 蒸着マスク
KR102411538B1 (ko) * 2017-09-04 2022-06-22 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
CN113646668A (zh) * 2019-04-11 2021-11-12 应用材料公司 用于光学装置的多深度膜
US11613802B2 (en) * 2020-04-17 2023-03-28 Rockwell Collins, Inc. Additively manufactured shadow masks for material deposition control
KR102787867B1 (ko) * 2020-07-03 2025-04-01 삼성디스플레이 주식회사 표시 장치의 제조 장치 및 표시 장치의 제조 방법
CN117467930A (zh) * 2023-05-18 2024-01-30 武汉华星光电半导体显示技术有限公司 掩模版及显示面板

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JP2003217850A (ja) * 2001-12-05 2003-07-31 Samsung Nec Mobile Display Co Ltd 有機ｅｌデバイスの薄膜蒸着用マスクフレーム組立体
JP2008240088A (ja) * 2007-03-28 2008-10-09 Seiko Epson Corp 蒸着装置、蒸着方法、電気光学装置及び電子機器
JP2012522891A (ja) 2009-04-03 2012-09-27 オスラム オプト セミコンダクターズ ゲゼルシャフト ミット ベシュレンクテル ハフツング 材料堆積装置において基板を保持する装置

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Publication number Publication date
WO2010113102A9 (en) 2012-03-29
EP2425034B1 (en) 2016-07-13
TW201105809A (en) 2011-02-16
US8808402B2 (en) 2014-08-19
CN102482759B (zh) 2014-11-12
WO2010113102A1 (en) 2010-10-07
US20120178190A1 (en) 2012-07-12
CN102482759A (zh) 2012-05-30
JP5642153B2 (ja) 2014-12-17
EP2425034A1 (en) 2012-03-07
KR20120007022A (ko) 2012-01-19
JP2012522891A (ja) 2012-09-27

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