JP5642153B2 - 材料堆積装置において基板を保持する装置 - Google Patents

材料堆積装置において基板を保持する装置 Download PDF

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Publication number
JP5642153B2
JP5642153B2 JP2012502857A JP2012502857A JP5642153B2 JP 5642153 B2 JP5642153 B2 JP 5642153B2 JP 2012502857 A JP2012502857 A JP 2012502857A JP 2012502857 A JP2012502857 A JP 2012502857A JP 5642153 B2 JP5642153 B2 JP 5642153B2
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JP
Japan
Prior art keywords
substrate
support structure
shadow mask
deposition
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2012502857A
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English (en)
Japanese (ja)
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JP2012522891A5 (enExample
JP2012522891A (ja
Inventor
クライネ ヨハネス
クライネ ヨハネス
アイリング エアヴィン
アイリング エアヴィン
ホーハウス カール−ハインツ
ホーハウス カール−ハインツ
ゲアゲン ヴォルフガング
ゲアゲン ヴォルフガング
フィリペンス マーク
フィリペンス マーク
シャイヒャー リヒャート
シャイヒャー リヒャート
フィシャー アンスガー
フィシャー アンスガー
マーティン　ミュラー
ミュラー マーティン
ロフィヒ アンドレアス
ロフィヒ アンドレアス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ams Osram International GmbH
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Osram Opto Semiconductors GmbH
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Publication of JP2012522891A5 publication Critical patent/JP2012522891A5/ja
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP2012502857A 2009-04-03 2010-03-29 材料堆積装置において基板を保持する装置 Expired - Fee Related JP5642153B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
EP09157249 2009-04-03
EP09157249.5 2009-04-03
EP10154410 2010-02-23
EP10154410.4 2010-02-23
PCT/IB2010/051356 WO2010113102A1 (en) 2009-04-03 2010-03-29 An arrangement for holding a substrate in a material deposition apparatus

Publications (3)

Publication Number Publication Date
JP2012522891A JP2012522891A (ja) 2012-09-27
JP2012522891A5 JP2012522891A5 (enExample) 2013-04-04
JP5642153B2 true JP5642153B2 (ja) 2014-12-17

Family

ID=42285443

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2012502857A Expired - Fee Related JP5642153B2 (ja) 2009-04-03 2010-03-29 材料堆積装置において基板を保持する装置

Country Status (7)

Country Link
US (1) US8808402B2 (enExample)
EP (1) EP2425034B1 (enExample)
JP (1) JP5642153B2 (enExample)
KR (1) KR101629995B1 (enExample)
CN (1) CN102482759B (enExample)
TW (1) TW201105809A (enExample)
WO (1) WO2010113102A1 (enExample)

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EP2425034B1 (en) * 2009-04-03 2016-07-13 OSRAM OLED GmbH An arrangement for holding a substrate in a material deposition apparatus
CN103203551B (zh) * 2012-01-16 2015-08-12 昆山允升吉光电科技有限公司 去除掩模板辅助图形的方法
TWI470110B (zh) * 2012-09-07 2015-01-21 Manz Taiwan Ltd 用於化學沉積設備的夾固裝置
KR102112751B1 (ko) * 2013-02-01 2020-05-19 삼성디스플레이 주식회사 레이저 빔을 이용한 마스크 제조 방법 및 마스크 제조 장치
KR102060366B1 (ko) * 2013-04-17 2019-12-31 삼성디스플레이 주식회사 유기 발광층 형성장치 및 그것을 이용한 유기 발광층의 제조 방법
JP6078818B2 (ja) * 2013-07-02 2017-02-15 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
KR101537967B1 (ko) * 2013-12-30 2015-07-20 주식회사 에스에프에이 기판과 마스크의 어태치 장치 및 방법
CN106784394B (zh) * 2013-12-30 2018-10-09 Sfa工程股份有限公司 用于附着玻璃与掩模的设备及方法、以及用于装载基板的系统及方法
JP6418440B2 (ja) * 2014-06-03 2018-11-07 Ｔｉａｎｍａ Ｊａｐａｎ株式会社 メタルマスク及びメタルマスクの製造方法並びにメタルマスクを用いた成膜方法
US10644239B2 (en) 2014-11-17 2020-05-05 Emagin Corporation High precision, high resolution collimating shadow mask and method for fabricating a micro-display
TWI564408B (zh) * 2015-02-02 2017-01-01 鴻海精密工業股份有限公司 蒸鍍遮罩、蒸鍍方法及蒸鍍遮罩之製造方法
KR20160097444A (ko) 2015-02-06 2016-08-18 삼성디스플레이 주식회사 표시 장치
JP2017008342A (ja) * 2015-06-17 2017-01-12 株式会社ブイ・テクノロジー 成膜マスク及び成膜マスクの製造方法
KR101638344B1 (ko) * 2015-12-04 2016-07-11 주식회사 유아이디 스퍼터링용 원판패널 고정 장치 및 방법
TWI721170B (zh) * 2016-05-24 2021-03-11 美商伊麥傑公司 蔽蔭遮罩沉積系統及其方法
KR102377183B1 (ko) 2016-05-24 2022-03-21 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
US10386731B2 (en) 2016-05-24 2019-08-20 Emagin Corporation Shadow-mask-deposition system and method therefor
CN109642313B (zh) * 2016-05-24 2021-03-09 埃马金公司 高精准度蔽荫掩模沉积系统及其方法
KR101797927B1 (ko) * 2016-06-01 2017-11-15 (주)브이앤아이솔루션 정전척
DE102017106160B4 (de) 2017-03-22 2025-03-20 VON ARDENNE Asset GmbH & Co. KG Substratträger, Transportanordnung, Vakuumanordnung und Verfahren
KR102378672B1 (ko) * 2017-05-17 2022-03-24 이매진 코퍼레이션 고정밀 섀도 마스크 증착 시스템 및 그 방법
JP6998139B2 (ja) * 2017-06-28 2022-01-18 株式会社ジャパンディスプレイ 蒸着マスク
KR102411538B1 (ko) * 2017-09-04 2022-06-22 삼성디스플레이 주식회사 표시 장치의 제조장치 및 표시 장치의 제조방법
CN113646668A (zh) * 2019-04-11 2021-11-12 应用材料公司 用于光学装置的多深度膜
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WO2011111134A1 (ja) * 2010-03-09 2011-09-15 シャープ株式会社 蒸着マスク、蒸着装置及び蒸着方法

Also Published As

Publication number Publication date
WO2010113102A9 (en) 2012-03-29
KR101629995B1 (ko) 2016-06-13
EP2425034B1 (en) 2016-07-13
TW201105809A (en) 2011-02-16
US8808402B2 (en) 2014-08-19
CN102482759B (zh) 2014-11-12
WO2010113102A1 (en) 2010-10-07
US20120178190A1 (en) 2012-07-12
CN102482759A (zh) 2012-05-30
EP2425034A1 (en) 2012-03-07
KR20120007022A (ko) 2012-01-19
JP2012522891A (ja) 2012-09-27

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