KR101422085B1 - 난연성을 갖는 반응성 화합물을 사용한 활성 에너지선 경화형 수지 조성물, 그 경화물의 제조법 및, 그 경화물의 층을 갖는 다층 재료 - Google Patents

난연성을 갖는 반응성 화합물을 사용한 활성 에너지선 경화형 수지 조성물, 그 경화물의 제조법 및, 그 경화물의 층을 갖는 다층 재료 Download PDF

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KR101422085B1
KR101422085B1 KR1020090021330A KR20090021330A KR101422085B1 KR 101422085 B1 KR101422085 B1 KR 101422085B1 KR 1020090021330 A KR1020090021330 A KR 1020090021330A KR 20090021330 A KR20090021330 A KR 20090021330A KR 101422085 B1 KR101422085 B1 KR 101422085B1
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South Korea
Prior art keywords
active energy
resin composition
energy ray
curable resin
meth
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KR1020090021330A
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English (en)
Korean (ko)
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KR20090100258A (ko
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카즈요시 야마모토
토루 구리하시
코우지 이소베
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닛뽄 가야쿠 가부시키가이샤
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Publication of KR20090100258A publication Critical patent/KR20090100258A/ko
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Publication of KR101422085B1 publication Critical patent/KR101422085B1/ko

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/49—Phosphorus-containing compounds
    • C08K5/51—Phosphorus bound to oxygen
    • C08K5/53—Phosphorus bound to oxygen bound to oxygen and to carbon only
    • C08K5/5397—Phosphine oxides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/062—Copolymers with monomers not covered by C08L33/06
    • C08L33/068—Copolymers with monomers not covered by C08L33/06 containing glycidyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/08—Homopolymers or copolymers of acrylic acid esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
    • C08L33/10—Homopolymers or copolymers of methacrylic acid esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2201/00—Properties
    • C08L2201/02—Flame or fire retardant/resistant
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00—Materials not provided for elsewhere
    • C09K3/10—Materials in mouldable or extrudable form for sealing or packing joints or covers
    • C09K2003/1034—Materials or components characterised by specific properties
    • C09K2003/1062—UV-curable materials

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  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Paints Or Removers (AREA)
KR1020090021330A 2008-03-18 2009-03-12 난연성을 갖는 반응성 화합물을 사용한 활성 에너지선 경화형 수지 조성물, 그 경화물의 제조법 및, 그 경화물의 층을 갖는 다층 재료 KR101422085B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2008-068909 2008-03-18
JP2008068909 2008-03-18

Publications (2)

Publication Number Publication Date
KR20090100258A KR20090100258A (ko) 2009-09-23
KR101422085B1 true KR101422085B1 (ko) 2014-07-23

Family

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Application Number Title Priority Date Filing Date
KR1020090021330A KR101422085B1 (ko) 2008-03-18 2009-03-12 난연성을 갖는 반응성 화합물을 사용한 활성 에너지선 경화형 수지 조성물, 그 경화물의 제조법 및, 그 경화물의 층을 갖는 다층 재료

Country Status (4)

Country Link
JP (1) JP5384149B2 (zh)
KR (1) KR101422085B1 (zh)
CN (1) CN101538348B (zh)
TW (1) TWI431049B (zh)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5291488B2 (ja) * 2009-02-18 2013-09-18 京セラケミカル株式会社 感光性熱硬化型樹脂組成物、およびフレキシブルプリント配線板
JP5439988B2 (ja) * 2009-07-08 2014-03-12 Ｊｓｒ株式会社 感放射線性樹脂組成物、感放射線性カバーレイおよびフレキシブルプリント配線板
WO2011083554A1 (ja) * 2010-01-05 2011-07-14 日本化薬株式会社 ホスフィンオキサイドを含むポリアミド又はポリイミド樹脂組成物並びにその硬化物
CN102858823A (zh) * 2010-04-09 2013-01-02 日本化药株式会社 光学透镜片用能量射线固化型树脂组合物及其固化物
JP5654259B2 (ja) * 2010-05-11 2015-01-14 株式会社カネカ 新規な感光性樹脂組成物及びその利用
JP5764368B2 (ja) * 2011-04-05 2015-08-19 株式会社カネカ 新規な感光性樹脂組成物及びその利用
JP2012247560A (ja) * 2011-05-26 2012-12-13 Kyocera Chemical Corp アルカリ現像型の感光性樹脂組成物、並びにこれを用いた感光性フィルム及びレジスト
KR101447456B1 (ko) * 2011-12-28 2014-10-06 제일모직주식회사 포스피네이트계 난연제의 제조방법
TWI457353B (zh) * 2012-05-08 2014-10-21 Ind Tech Res Inst 高分子、高分子混摻物、與阻燃材料
JP6123547B2 (ja) * 2013-07-26 2017-05-10 日立化成株式会社 回路接続材料、回路接続構造体、回路接続構造体の製造方法、接着剤組成物、及び接着剤シート
KR101692003B1 (ko) * 2013-12-24 2017-01-03 코오롱인더스트리 주식회사 드라이 필름 포토 레지스트용 감광성 수지 조성물
CN108137791A (zh) * 2015-09-30 2018-06-08 太阳油墨制造株式会社 固化性树脂组合物、干膜及使用其的印刷电路板
JP6224188B1 (ja) * 2016-08-08 2017-11-01 太陽インキ製造株式会社 半導体封止材
CN108912174B (zh) * 2018-06-22 2021-02-09 四川东材科技集团股份有限公司 一种阻燃双烷环型多元醇树脂及其制备方法
JP7131984B2 (ja) 2018-06-27 2022-09-06 キオクシア株式会社 パターン形成材料、パターン形成方法および半導体装置の製造方法
CN108929524A (zh) * 2018-09-05 2018-12-04 贵州省材料产业技术研究院 一种反应增容阻燃聚酯材料及其制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244860A (en) * 1975-12-23 1981-01-13 Dynamit Nobel Aktiengesellschaft Plastic molding composition
JPH0748394A (ja) * 1993-08-02 1995-02-21 Nippon Kayaku Co Ltd （メタ）アクリル酸エステル、その製造方法、それを用いた硬化性樹脂組成物およびその硬化物
JP2004143286A (ja) 2002-10-24 2004-05-20 Kanegafuchi Chem Ind Co Ltd 有機リン組成物およびそれを含有する難燃剤、難燃性樹脂組成物

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4244860A (en) * 1975-12-23 1981-01-13 Dynamit Nobel Aktiengesellschaft Plastic molding composition
JPH0748394A (ja) * 1993-08-02 1995-02-21 Nippon Kayaku Co Ltd （メタ）アクリル酸エステル、その製造方法、それを用いた硬化性樹脂組成物およびその硬化物
JP3454544B2 (ja) * 1993-08-02 2003-10-06 日本化薬株式会社 （メタ）アクリル酸エステル、その製造方法、それを用いた硬化性樹脂組成物およびその硬化物
JP2004143286A (ja) 2002-10-24 2004-05-20 Kanegafuchi Chem Ind Co Ltd 有機リン組成物およびそれを含有する難燃剤、難燃性樹脂組成物

Also Published As

Publication number Publication date
CN101538348B (zh) 2012-11-07
KR20090100258A (ko) 2009-09-23
TW200946579A (en) 2009-11-16
TWI431049B (zh) 2014-03-21
CN101538348A (zh) 2009-09-23
JP2009256622A (ja) 2009-11-05
JP5384149B2 (ja) 2014-01-08

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