KR101389660B1 - 하전 입자선 장치 - Google Patents

하전 입자선 장치 Download PDF

Info

Publication number
KR101389660B1
KR101389660B1 KR1020137020260A KR20137020260A KR101389660B1 KR 101389660 B1 KR101389660 B1 KR 101389660B1 KR 1020137020260 A KR1020137020260 A KR 1020137020260A KR 20137020260 A KR20137020260 A KR 20137020260A KR 101389660 B1 KR101389660 B1 KR 101389660B1
Authority
KR
South Korea
Prior art keywords
charged particle
sample
housing
thin film
particle beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020137020260A
Other languages
English (en)
Korean (ko)
Other versions
KR20130118359A (ko
Inventor
유스께 오미나미
스께히로 이또
마사미 가쯔야마
Original Assignee
가부시키가이샤 히다치 하이테크놀로지즈
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 가부시키가이샤 히다치 하이테크놀로지즈 filed Critical 가부시키가이샤 히다치 하이테크놀로지즈
Publication of KR20130118359A publication Critical patent/KR20130118359A/ko
Application granted granted Critical
Publication of KR101389660B1 publication Critical patent/KR101389660B1/ko
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/18—Vacuum locks ; Means for obtaining or maintaining the desired pressure within the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/244—Detectors; Associated components or circuits therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/261—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/16—Vessels
    • H01J2237/164—Particle-permeable windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/2602—Details
    • H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26—Electron or ion microscopes
    • H01J2237/28—Scanning microscopes
    • H01J2237/2809—Scanning microscopes characterised by the imaging problems involved
    • H01J2237/2811—Large objects

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
KR1020137020260A 2011-01-31 2011-11-02 하전 입자선 장치 Expired - Fee Related KR101389660B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2011017383A JP5320418B2 (ja) 2011-01-31 2011-01-31 荷電粒子線装置
JPJP-P-2011-017383 2011-01-31
PCT/JP2011/006127 WO2012104942A1 (ja) 2011-01-31 2011-11-02 荷電粒子線装置

Related Child Applications (2)

Application Number Title Priority Date Filing Date
KR1020147005627A Division KR101514190B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치
KR1020137027846A Division KR101390112B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치

Publications (2)

Publication Number Publication Date
KR20130118359A KR20130118359A (ko) 2013-10-29
KR101389660B1 true KR101389660B1 (ko) 2014-04-28

Family

ID=46602190

Family Applications (3)

Application Number Title Priority Date Filing Date
KR1020147005627A Expired - Fee Related KR101514190B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치
KR1020137020260A Expired - Fee Related KR101389660B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치
KR1020137027846A Expired - Fee Related KR101390112B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치

Family Applications Before (1)

Application Number Title Priority Date Filing Date
KR1020147005627A Expired - Fee Related KR101514190B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020137027846A Expired - Fee Related KR101390112B1 (ko) 2011-01-31 2011-11-02 하전 입자선 장치

Country Status (6)

Country Link
US (1) US9543111B2 (enExample)
JP (1) JP5320418B2 (enExample)
KR (3) KR101514190B1 (enExample)
CN (2) CN103329240B (enExample)
DE (1) DE112011104347B4 (enExample)
WO (1) WO2012104942A1 (enExample)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5936484B2 (ja) * 2012-08-20 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
CN103632912A (zh) * 2012-08-21 2014-03-12 B-纳诺有限公司 电子显微镜成像系统及方法
JP5923412B2 (ja) 2012-08-24 2016-05-24 株式会社日立ハイテクノロジーズ 観察装置および光軸調整方法
JP2014053073A (ja) * 2012-09-05 2014-03-20 Hitachi High-Technologies Corp 荷電粒子線装置用部材、荷電粒子線装置および隔膜部材
JP5936497B2 (ja) * 2012-09-14 2016-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5930922B2 (ja) * 2012-09-14 2016-06-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置及び試料観察方法
JP5909431B2 (ja) * 2012-09-27 2016-04-26 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP6207824B2 (ja) * 2012-10-01 2017-10-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置、隔膜の位置調整方法および隔膜位置調整ジグ
JP6051014B2 (ja) * 2012-10-29 2016-12-21 株式会社日立ハイテクノロジーズ 試料格納用容器、荷電粒子線装置、及び画像取得方法
JP6362827B2 (ja) * 2013-01-26 2018-07-25 株式会社ホロン アライメント測定装置およびアライメント測定方法
JP6309195B2 (ja) * 2013-02-18 2018-04-11 株式会社ホロン 走査型電子顕微鏡および検査装置
KR102026936B1 (ko) * 2013-03-26 2019-10-01 삼성디스플레이 주식회사 주사 전자 현미경을 이용한 검사 시스템
CN105493224B (zh) * 2013-08-23 2017-06-06 株式会社日立高新技术 隔膜安装部件及带电粒子线装置
KR101752164B1 (ko) * 2013-09-06 2017-06-29 가부시키가이샤 히다치 하이테크놀로지즈 하전 입자선 장치 및 시료 화상 취득 방법
JP6117070B2 (ja) * 2013-09-26 2017-04-19 株式会社日立ハイテクノロジーズ 電子顕微鏡
JP6047508B2 (ja) 2014-01-27 2016-12-21 株式会社日立ハイテクノロジーズ 荷電粒子線装置、試料画像取得方法、およびプログラム記録媒体
JP6302702B2 (ja) * 2014-02-27 2018-03-28 株式会社日立ハイテクノロジーズ 走査電子顕微鏡および画像生成方法
JP6199333B2 (ja) * 2015-04-03 2017-09-20 株式会社 テクネックス工房 走査型電子顕微鏡
HK1243824A1 (zh) * 2015-06-08 2018-07-20 株式会社尼康 带电粒子束曝光装置及器件制造方法
US10431416B2 (en) 2015-08-21 2019-10-01 Hitachi High-Technologies Corporation Observation support unit for charged particle microscope and sample observation method using same
JP6118870B2 (ja) * 2015-10-07 2017-04-19 株式会社日立ハイテクノロジーズ 試料観察方法
KR101725139B1 (ko) * 2015-11-20 2017-04-10 한국표준과학연구원 시료고정부가 연속 배열된 시료스테이지를 포함하는 전자현미경
CN107437487A (zh) * 2016-05-25 2017-12-05 宝山钢铁股份有限公司 一种用于扫描电镜样品台升降防撞装置
US10607808B2 (en) 2017-09-13 2020-03-31 Taiwan Electron Microscope Instrument Corporation Examination container and electron microscope
CN110186942A (zh) * 2018-02-23 2019-08-30 台湾电镜仪器股份有限公司 薄膜组件、检验容器以及电子显微镜
CN110186944B (zh) * 2018-02-23 2021-11-09 台湾电镜仪器股份有限公司 检验容器以及电子显微镜
US10593513B2 (en) 2018-07-18 2020-03-17 Taiwan Electron Microscope Instrument Corporation Membrane assembly, examination container and electron microscope
JP2020017415A (ja) * 2018-07-26 2020-01-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
KR102181455B1 (ko) * 2018-12-28 2020-11-23 참엔지니어링(주) 시료 관찰 장치 및 방법
JP7091263B2 (ja) * 2019-01-22 2022-06-27 株式会社日立ハイテク 電子顕微鏡及び３次元構造の深さ算出方法
KR102180979B1 (ko) * 2019-08-19 2020-11-19 참엔지니어링(주) 처리 장치 및 방법
JP7493101B2 (ja) * 2021-04-13 2024-05-30 株式会社日立ハイテク 透過型電子顕微鏡
KR102657974B1 (ko) * 2021-11-25 2024-04-15 재단법인 한국전자기계융합기술원 박막 교체를 수행하는 빔 가공 장치 및 그 제어 방법

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05234552A (ja) * 1992-02-21 1993-09-10 Elionix Kk 走査電子顕微鏡
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
US20100224780A1 (en) 2007-11-13 2010-09-09 Bernd Spruck Beam device system comprising a particle beam device and an optical microscope

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS522785A (en) * 1975-06-24 1977-01-10 Shimadzu Corp Analyzing method and its device for the same
EP0109147A3 (en) 1982-10-19 1986-04-16 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
US4607167A (en) 1982-10-19 1986-08-19 Varian Associates, Inc. Charged particle beam lithography machine incorporating localized vacuum envelope
JP2794471B2 (ja) * 1989-11-24 1998-09-03 日本電子テクニクス株式会社 電子顕微鏡
JPH1064467A (ja) * 1996-08-23 1998-03-06 Toshiba Corp 電子顕微鏡
EP0969493A1 (en) * 1998-07-03 2000-01-05 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Apparatus and method for examining specimen with a charged particle beam
JP2001008083A (ja) * 1999-06-23 2001-01-12 Seiji Ishikawa ビデオマイクロスコープ
JP2001242300A (ja) 2000-03-02 2001-09-07 Sony Corp 電子ビーム照射装置
DE10032607B4 (de) * 2000-07-07 2004-08-12 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät mit einer im Ultrahochvakuum zu betreibenden Teilchenquelle und kaskadenförmige Pumpanordnung für ein solches Teilchenstrahlgerät
JP3994759B2 (ja) 2002-03-07 2007-10-24 ソニー株式会社 位置制御装置、位置制御方法および電子ビーム照射装置
JP2004354309A (ja) 2003-05-30 2004-12-16 Mitsubishi Heavy Ind Ltd エネルギー線取出窓、エネルギー線投射装置、及び、エネルギー線取出方法
JP2005108867A (ja) 2003-09-26 2005-04-21 Tokyo Seimitsu Co Ltd 露光マスクおよび電子ビーム露光装置
JP2005158338A (ja) 2003-11-21 2005-06-16 Canon Inc 試料の観察装置及び加工装置
JP4262158B2 (ja) * 2004-07-13 2009-05-13 株式会社日立ハイテクサイエンスシステムズ 低真空走査電子顕微鏡
JP2007188821A (ja) * 2006-01-16 2007-07-26 Univ Osaka Sangyo ハンディ電子顕微鏡
JP2007294365A (ja) * 2006-04-27 2007-11-08 Jeol Ltd 試料検査方法、試料保持体、及び試料検査装置並びに試料検査システム
EP2080014B1 (en) * 2006-10-24 2016-08-31 B-Nano Ltd. An interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
JP5318364B2 (ja) * 2007-01-31 2013-10-16 日本電子株式会社 試料保持体、試料検査装置及び試料検査方法、並びに試料保持体の製造方法
DE102007021897A1 (de) * 2007-05-10 2008-11-20 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum Durchführen von thermischen und nicht-thermischen Elektronenstrahlprozessen
JP5253800B2 (ja) * 2007-12-26 2013-07-31 日本電子株式会社 試料保持体及び観察・検査方法並びに観察・検査装置
EP2105944A1 (en) 2008-03-28 2009-09-30 FEI Company Environmental cell for a particle-optical apparatus
JP2009277648A (ja) * 2008-04-17 2009-11-26 Hitachi High-Technologies Corp 検査装置、および、検査方法
WO2010001399A1 (en) * 2008-07-03 2010-01-07 B-Nano A scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
US8178851B2 (en) * 2010-07-30 2012-05-15 E.A. Fischione Instruments, Inc. In situ holder assembly

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05234552A (ja) * 1992-02-21 1993-09-10 Elionix Kk 走査電子顕微鏡
JP2006147430A (ja) * 2004-11-22 2006-06-08 Hokkaido Univ 電子顕微鏡
US20100224780A1 (en) 2007-11-13 2010-09-09 Bernd Spruck Beam device system comprising a particle beam device and an optical microscope

Also Published As

Publication number Publication date
CN103329240B (zh) 2015-04-15
JP5320418B2 (ja) 2013-10-23
JP2012160267A (ja) 2012-08-23
CN103329240A (zh) 2013-09-25
KR101514190B1 (ko) 2015-04-21
KR101390112B1 (ko) 2014-04-29
US9543111B2 (en) 2017-01-10
KR20130135371A (ko) 2013-12-10
CN104851769A (zh) 2015-08-19
KR20130118359A (ko) 2013-10-29
KR20140047724A (ko) 2014-04-22
WO2012104942A1 (ja) 2012-08-09
DE112011104347B4 (de) 2015-08-13
US20130313430A1 (en) 2013-11-28
DE112011104347T5 (de) 2013-09-19

Similar Documents

Publication Publication Date Title
KR101389660B1 (ko) 하전 입자선 장치
JP5699023B2 (ja) 荷電粒子線装置
JP5825964B2 (ja) 検査又は観察装置及び試料の検査又は観察方法
US20140151553A1 (en) Charged particle beam device, method for adjusting charged particle beam device, and method for inspecting or observing sample
CN104541355A (zh) 观察装置以及光轴调整方法
JP5678134B2 (ja) 荷電粒子線装置
JP5919368B2 (ja) 荷電粒子線装置
JP5923632B2 (ja) 荷電粒子線装置
JP6272384B2 (ja) 荷電粒子線装置
JP6118870B2 (ja) 試料観察方法

Legal Events

Date Code Title Description
A201 Request for examination
PA0105 International application

St.27 status event code: A-0-1-A10-A15-nap-PA0105

PA0201 Request for examination

St.27 status event code: A-1-2-D10-D11-exm-PA0201

A107 Divisional application of patent
A302 Request for accelerated examination
PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

PA0302 Request for accelerated examination

St.27 status event code: A-1-2-D10-D17-exm-PA0302

St.27 status event code: A-1-2-D10-D16-exm-PA0302

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

E902 Notification of reason for refusal
PE0902 Notice of grounds for rejection

St.27 status event code: A-1-2-D10-D21-exm-PE0902

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

R17-X000 Change to representative recorded

St.27 status event code: A-3-3-R10-R17-oth-X000

T11-X000 Administrative time limit extension requested

St.27 status event code: U-3-3-T10-T11-oth-X000

A107 Divisional application of patent
P11-X000 Amendment of application requested

St.27 status event code: A-2-2-P10-P11-nap-X000

P13-X000 Application amended

St.27 status event code: A-2-2-P10-P13-nap-X000

PA0104 Divisional application for international application

St.27 status event code: A-0-1-A10-A18-div-PA0104

St.27 status event code: A-0-1-A10-A16-div-PA0104

E701 Decision to grant or registration of patent right
PE0701 Decision of registration

St.27 status event code: A-1-2-D10-D22-exm-PE0701

GRNT Written decision to grant
PR0701 Registration of establishment

St.27 status event code: A-2-4-F10-F11-exm-PR0701

PR1002 Payment of registration fee

St.27 status event code: A-2-2-U10-U12-oth-PR1002

Fee payment year number: 1

PG1601 Publication of registration

St.27 status event code: A-4-4-Q10-Q13-nap-PG1601

FPAY Annual fee payment

Payment date: 20170322

Year of fee payment: 4

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 4

FPAY Annual fee payment

Payment date: 20180403

Year of fee payment: 5

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 5

FPAY Annual fee payment

Payment date: 20190328

Year of fee payment: 6

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 6

R18-X000 Changes to party contact information recorded

St.27 status event code: A-5-5-R10-R18-oth-X000

PR1001 Payment of annual fee

St.27 status event code: A-4-4-U10-U11-oth-PR1001

Fee payment year number: 7

PC1903 Unpaid annual fee

St.27 status event code: A-4-4-U10-U13-oth-PC1903

Not in force date: 20210422

Payment event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

PC1903 Unpaid annual fee

St.27 status event code: N-4-6-H10-H13-oth-PC1903

Ip right cessation event data comment text: Termination Category : DEFAULT_OF_REGISTRATION_FEE

Not in force date: 20210422