KR101296501B1 - 노광 장치 및 디바이스 제조 방법 - Google Patents

노광 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR101296501B1
KR101296501B1 KR1020067000412A KR20067000412A KR101296501B1 KR 101296501 B1 KR101296501 B1 KR 101296501B1 KR 1020067000412 A KR1020067000412 A KR 1020067000412A KR 20067000412 A KR20067000412 A KR 20067000412A KR 101296501 B1 KR101296501 B1 KR 101296501B1
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South Korea
Prior art keywords
liquid
substrate
supply
image
exposure
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Korean (ko)
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KR20060030106A (ko
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히로유키 나가사카
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가부시키가이샤 니콘
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067000412A 2003-07-09 2004-07-07 노광 장치 및 디바이스 제조 방법 Expired - Fee Related KR101296501B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00272616 2003-07-09
JP2003272616 2003-07-09
PCT/JP2004/009999 WO2005006418A1 (ja) 2003-07-09 2004-07-07 露光装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
KR20060030106A KR20060030106A (ko) 2006-04-07
KR101296501B1 true KR101296501B1 (ko) 2013-08-13

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KR1020067000412A Expired - Fee Related KR101296501B1 (ko) 2003-07-09 2004-07-07 노광 장치 및 디바이스 제조 방법

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US (4) US7379157B2 (enExample)
JP (2) JP5273135B2 (enExample)
KR (1) KR101296501B1 (enExample)
TW (1) TWI433209B (enExample)
WO (1) WO2005006418A1 (enExample)

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KR101547077B1 (ko) 2003-04-09 2015-08-25 가부시키가이샤 니콘 노광 방법 및 장치, 그리고 디바이스 제조 방법
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KR20170070264A (ko) 2003-09-03 2017-06-21 가부시키가이샤 니콘 액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
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CN101681123B (zh) 2007-10-16 2013-06-12 株式会社尼康 照明光学系统、曝光装置以及元件制造方法
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US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
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CN105606344B (zh) 2008-05-28 2019-07-30 株式会社尼康 照明光学系统、照明方法、曝光装置以及曝光方法
EP2196857A3 (en) * 2008-12-09 2010-07-21 ASML Netherlands BV Lithographic apparatus and device manufacturing method
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CN101862966B (zh) * 2010-07-02 2012-02-15 上海交通大学 二自由度平动并联解耦微动平台
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