KR101200524B1 - 유기 금속 화합물 - Google Patents

유기 금속 화합물 Download PDF

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Publication number
KR101200524B1
KR101200524B1 KR1020040022845A KR20040022845A KR101200524B1 KR 101200524 B1 KR101200524 B1 KR 101200524B1 KR 1020040022845 A KR1020040022845 A KR 1020040022845A KR 20040022845 A KR20040022845 A KR 20040022845A KR 101200524 B1 KR101200524 B1 KR 101200524B1
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KR
South Korea
Prior art keywords
germanium
butyl
silicon
dimethylamino
german
Prior art date
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Expired - Fee Related
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KR1020040022845A
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English (en)
Korean (ko)
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KR20040086811A (ko
Inventor
셰나이-카트카테데오다타비나약
파우어마이클브렌던
Original Assignee
롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨.
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Publication of KR20040086811A publication Critical patent/KR20040086811A/ko
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/28—Deposition of only one other non-metal element
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/10—Office automation; Time management
    • G06Q10/109—Time management, e.g. calendars, reminders, meetings or time accounting
    • G06Q10/1091—Recording time for administrative or management purposes
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B5/00—Measuring for diagnostic purposes; Identification of persons
    • A61B5/117—Identification of persons
    • A61B5/1171—Identification of persons based on the shapes or appearances of their bodies or parts thereof
    • A61B5/1172—Identification of persons based on the shapes or appearances of their bodies or parts thereof using fingerprinting
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C391/00—Compounds containing selenium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C395/00—Compounds containing tellurium
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/0805—Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms
    • C07F7/0807—Compounds with Si-C or Si-Si linkages comprising only Si, C or H atoms comprising Si as a ring atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/0803—Compounds with Si-C or Si-Si linkages
    • C07F7/0825—Preparations of compounds not comprising Si-Si or Si-cyano linkages
    • C07F7/0827—Syntheses with formation of a Si-C bond
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/30—Germanium compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/18—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06Q—INFORMATION AND COMMUNICATION TECHNOLOGY [ICT] SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES; SYSTEMS OR METHODS SPECIALLY ADAPTED FOR ADMINISTRATIVE, COMMERCIAL, FINANCIAL, MANAGERIAL OR SUPERVISORY PURPOSES, NOT OTHERWISE PROVIDED FOR
    • G06Q10/00—Administration; Management
    • G06Q10/06—Resources, workflows, human or project management; Enterprise or organisation planning; Enterprise or organisation modelling
    • G06Q10/063—Operations research, analysis or management
    • G06Q10/0631—Resource planning, allocation, distributing or scheduling for enterprises or organisations
    • G06Q10/06311—Scheduling, planning or task assignment for a person or group
    • G06Q10/063116—Schedule adjustment for a person or group
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
    • G06V20/00—Scenes; Scene-specific elements
    • G06V20/80—Recognising image objects characterised by unique random patterns
    • G—PHYSICS
    • G07—CHECKING-DEVICES
    • G07C—TIME OR ATTENDANCE REGISTERS; REGISTERING OR INDICATING THE WORKING OF MACHINES; GENERATING RANDOM NUMBERS; VOTING OR LOTTERY APPARATUS; ARRANGEMENTS, SYSTEMS OR APPARATUS FOR CHECKING NOT PROVIDED FOR ELSEWHERE
    • G07C1/00—Registering, indicating or recording the time of events or elapsed time, e.g. time-recorders for work people

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Business, Economics & Management (AREA)
  • Human Resources & Organizations (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Entrepreneurship & Innovation (AREA)
  • Strategic Management (AREA)
  • General Physics & Mathematics (AREA)
  • Economics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Theoretical Computer Science (AREA)
  • Educational Administration (AREA)
  • Tourism & Hospitality (AREA)
  • Quality & Reliability (AREA)
  • General Business, Economics & Management (AREA)
  • Operations Research (AREA)
  • Marketing (AREA)
  • Inorganic Chemistry (AREA)
  • Development Economics (AREA)
  • Biophysics (AREA)
  • Pathology (AREA)
  • Biomedical Technology (AREA)
  • Heart & Thoracic Surgery (AREA)
  • Medical Informatics (AREA)
  • Molecular Biology (AREA)
  • Surgery (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Veterinary Medicine (AREA)
  • Data Mining & Analysis (AREA)
  • Game Theory and Decision Science (AREA)
  • Multimedia (AREA)
KR1020040022845A 2003-04-05 2004-04-02 유기 금속 화합물 Expired - Fee Related KR101200524B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US46079103P 2003-04-05 2003-04-05
US60/460,791 2003-04-05
US51347603P 2003-10-22 2003-10-22
US60/513,476 2003-10-22

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020110070787A Division KR101059732B1 (ko) 2003-04-05 2011-07-18 유기 금속 화합물

Publications (2)

Publication Number Publication Date
KR20040086811A KR20040086811A (ko) 2004-10-12
KR101200524B1 true KR101200524B1 (ko) 2012-11-13

Family

ID=32853627

Family Applications (2)

Application Number Title Priority Date Filing Date
KR1020040022845A Expired - Fee Related KR101200524B1 (ko) 2003-04-05 2004-04-02 유기 금속 화합물
KR1020110070787A Expired - Fee Related KR101059732B1 (ko) 2003-04-05 2011-07-18 유기 금속 화합물

Family Applications After (1)

Application Number Title Priority Date Filing Date
KR1020110070787A Expired - Fee Related KR101059732B1 (ko) 2003-04-05 2011-07-18 유기 금속 화합물

Country Status (8)

Country Link
US (2) US7413776B2 (enExample)
EP (2) EP1990345B1 (enExample)
JP (2) JP4954448B2 (enExample)
KR (2) KR101200524B1 (enExample)
CN (1) CN100516289C (enExample)
DE (2) DE602004030058D1 (enExample)
SG (1) SG126757A1 (enExample)
TW (1) TWI318222B (enExample)

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US20060172068A1 (en) * 2005-01-28 2006-08-03 Ovshinsky Stanford R Deposition of multilayer structures including layers of germanium and/or germanium alloys
EP1995347A4 (en) * 2006-02-08 2010-04-28 Jsr Corp METHOD FOR FORMING A METAL FILM
JP4957037B2 (ja) * 2006-03-24 2012-06-20 東ソー株式会社 有機シラン化合物、それを含むＳｉ含有膜形成材料、製造方法および用途
GB2452224B (en) 2006-06-20 2011-02-23 Inst Energiteknik The use of biphenyl, terphenyl, and fluorene sulphonic acid based tracers for monitoring streams of fluids
US8318966B2 (en) * 2006-06-23 2012-11-27 Praxair Technology, Inc. Organometallic compounds
KR100757415B1 (ko) 2006-07-13 2007-09-10 삼성전자주식회사 게르마늄 화합물 및 그 제조 방법, 상기 게르마늄 화합물을이용한 상변화 메모리 장치 및 그 형성 방법
KR101501700B1 (ko) * 2007-04-02 2015-03-11 아리조나 보드 오브 리전트스, 아리조나주의 아리조나 주립대 대행법인 신규한 할로실릴게르만의 제조 및 사용 방법
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CN116113725B (zh) * 2020-07-24 2025-10-31 弗萨姆材料美国有限责任公司 用于锗种子层的组合物及其使用方法
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TW202413383A (zh) 2022-08-12 2024-04-01 美商蓋列斯特股份有限公司 含不飽和取代基之高純度錫化合物及其製造方法
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CN121866261A (zh) 2023-09-13 2026-04-14 默克专利有限公司 具有改善的热和光稳定性的分子内稳定化单烷基金属化合物及其用途
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US20090156852A1 (en) 2009-06-18
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US7767840B2 (en) 2010-08-03
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