KR101176682B1 - Ｅｕｖ 스펙트럼 영역을 위한 내열성 다중층 미러 - Google Patents

Ｅｕｖ 스펙트럼 영역을 위한 내열성 다중층 미러 Download PDF

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Publication number
KR101176682B1
KR101176682B1 KR1020077014768A KR20077014768A KR101176682B1 KR 101176682 B1 KR101176682 B1 KR 101176682B1 KR 1020077014768 A KR1020077014768 A KR 1020077014768A KR 20077014768 A KR20077014768 A KR 20077014768A KR 101176682 B1 KR101176682 B1 KR 101176682B1
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KR
South Korea
Prior art keywords
multilayer mirror
layer
silicon
molybdenum
euv
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KR1020077014768A
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English (en)
Korean (ko)
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KR20070090967A (ko
Inventor
니콜라스 벤오이트
토스텐 페이글
노르베르트 카이저
세르기 유린
Original Assignee
프라운호퍼-게젤샤프트 츄어 푀르더룽 데어 안게반텐 포르슝에.파우.
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0816—Multilayer mirrors, i.e. having two or more reflecting layers
    • G02B5/0825—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only
    • G02B5/0833—Multilayer mirrors, i.e. having two or more reflecting layers the reflecting layers comprising dielectric materials only comprising inorganic materials only
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G21K1/062—Devices having a multilayer structure
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K2201/00—Arrangements for handling radiation or particles
    • G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
    • G21K2201/067—Construction details

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Optical Filters (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020077014768A 2004-12-23 2005-12-23 Ｅｕｖ 스펙트럼 영역을 위한 내열성 다중층 미러 KR101176682B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102004062289.2 2004-12-23
DE102004062289A DE102004062289B4 (de) 2004-12-23 2004-12-23 Thermisch stabiler Multilayer-Spiegel für den EUV-Spektralbereich
PCT/DE2005/002315 WO2006066563A1 (de) 2004-12-23 2005-12-23 Thermisch stabiler multilayer-spiegel für den euv-spektralbereich

Publications (2)

Publication Number Publication Date
KR20070090967A KR20070090967A (ko) 2007-09-06
KR101176682B1 true KR101176682B1 (ko) 2012-08-23

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KR1020077014768A KR101176682B1 (ko) 2004-12-23 2005-12-23 Ｅｕｖ 스펙트럼 영역을 위한 내열성 다중층 미러

Country Status (9)

Country Link
US (1) US7920323B2 (ru)
EP (1) EP1828818B1 (ru)
JP (1) JP4904287B2 (ru)
KR (1) KR101176682B1 (ru)
CN (1) CN101088031A (ru)
CA (1) CA2591530A1 (ru)
DE (1) DE102004062289B4 (ru)
RU (1) RU2410732C2 (ru)
WO (1) WO2006066563A1 (ru)

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DE102009032779A1 (de) * 2009-07-10 2011-01-13 Carl Zeiss Smt Ag Spiegel für den EUV-Wellenlängenbereich, Projektionsobjektiv für die Mikrolithographie mit einem solchen Spiegel und Projektionsbelichtungsanlage für die Mikrolithographie mit einem solchen Projektionsobjektiv
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CN104749662A (zh) * 2015-04-21 2015-07-01 中国科学院长春光学精密机械与物理研究所 具有极紫外光谱纯度及热稳定性的多层膜
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Also Published As

Publication number Publication date
DE102004062289B4 (de) 2007-07-19
EP1828818A1 (de) 2007-09-05
DE102004062289A1 (de) 2006-07-06
RU2007127839A (ru) 2009-01-27
RU2410732C2 (ru) 2011-01-27
JP2008526002A (ja) 2008-07-17
WO2006066563A1 (de) 2006-06-29
US20080088916A1 (en) 2008-04-17
EP1828818B1 (de) 2012-10-17
JP4904287B2 (ja) 2012-03-28
CN101088031A (zh) 2007-12-12
KR20070090967A (ko) 2007-09-06
US7920323B2 (en) 2011-04-05
CA2591530A1 (en) 2006-06-29

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