KR101104665B1 - 기판 검사 시스템, 기판 검사 방법 및 기판 검사 장치 - Google Patents
기판 검사 시스템, 기판 검사 방법 및 기판 검사 장치 Download PDFInfo
- Publication number
- KR101104665B1 KR101104665B1 KR1020040019584A KR20040019584A KR101104665B1 KR 101104665 B1 KR101104665 B1 KR 101104665B1 KR 1020040019584 A KR1020040019584 A KR 1020040019584A KR 20040019584 A KR20040019584 A KR 20040019584A KR 101104665 B1 KR101104665 B1 KR 101104665B1
- Authority
- KR
- South Korea
- Prior art keywords
- inspection
- inspected
- substrate
- macro
- defects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007689 inspection Methods 0.000 title claims abstract description 397
- 238000000034 method Methods 0.000 title claims description 50
- 230000007547 defect Effects 0.000 claims abstract description 198
- 239000000758 substrate Substances 0.000 claims abstract description 159
- 238000009826 distribution Methods 0.000 claims abstract description 47
- 238000003860 storage Methods 0.000 claims abstract description 34
- 238000012360 testing method Methods 0.000 claims abstract description 22
- 235000012431 wafers Nutrition 0.000 description 108
- 238000005259 measurement Methods 0.000 description 21
- 238000005070 sampling Methods 0.000 description 19
- 238000013500 data storage Methods 0.000 description 16
- 238000004519 manufacturing process Methods 0.000 description 14
- 230000005856 abnormality Effects 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- 230000002950 deficient Effects 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 238000012544 monitoring process Methods 0.000 description 6
- 238000004891 communication Methods 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000001459 lithography Methods 0.000 description 5
- 230000001364 causal effect Effects 0.000 description 4
- 238000001514 detection method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 230000002123 temporal effect Effects 0.000 description 3
- 230000002159 abnormal effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000008929 regeneration Effects 0.000 description 2
- 238000011069 regeneration method Methods 0.000 description 2
- 238000012216 screening Methods 0.000 description 1
Images
Classifications
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- A—HUMAN NECESSITIES
- A01—AGRICULTURE; FORESTRY; ANIMAL HUSBANDRY; HUNTING; TRAPPING; FISHING
- A01K—ANIMAL HUSBANDRY; AVICULTURE; APICULTURE; PISCICULTURE; FISHING; REARING OR BREEDING ANIMALS, NOT OTHERWISE PROVIDED FOR; NEW BREEDS OF ANIMALS
- A01K61/00—Culture of aquatic animals
- A01K61/10—Culture of aquatic animals of fish
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8867—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
Landscapes
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Pathology (AREA)
- Immunology (AREA)
- Environmental Sciences (AREA)
- Physics & Mathematics (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Zoology (AREA)
- Marine Sciences & Fisheries (AREA)
- Biodiversity & Conservation Biology (AREA)
- Animal Husbandry (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2003-00084741 | 2003-03-26 | ||
| JP2003084741A JP4529365B2 (ja) | 2003-03-26 | 2003-03-26 | 基板検査システムおよび基板検査方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20040084710A KR20040084710A (ko) | 2004-10-06 |
| KR101104665B1 true KR101104665B1 (ko) | 2012-01-13 |
Family
ID=33399840
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020040019584A Expired - Lifetime KR101104665B1 (ko) | 2003-03-26 | 2004-03-23 | 기판 검사 시스템, 기판 검사 방법 및 기판 검사 장치 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7330042B2 (https=) |
| JP (1) | JP4529365B2 (https=) |
| KR (1) | KR101104665B1 (https=) |
| TW (1) | TW200504350A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200046014A (ko) * | 2017-06-14 | 2020-05-06 | 캠텍 리미티드 | 자동 결함 분류 |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10308258A1 (de) * | 2003-02-25 | 2004-09-02 | Leica Microsystems Jena Gmbh | Vorrichtung und Verfahren zur Dünnschichtmetrologie |
| US7858404B2 (en) * | 2007-03-14 | 2010-12-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Measurement of overlay offset in semiconductor processing |
| US8165706B2 (en) * | 2009-12-29 | 2012-04-24 | Memc Electronic Materials, Inc. | Methods for generating representations of flatness defects on wafers |
| US8340801B2 (en) * | 2009-12-29 | 2012-12-25 | Memc Electronic Materials, Inc. | Systems for generating representations of flatness defects on wafers |
| JP5625935B2 (ja) * | 2011-01-18 | 2014-11-19 | オムロン株式会社 | 判定基準値の適否判定方法およびその適正値の特定方法ならびに適正値への変更方法、部品実装基板の検査システム、生産現場におけるシミュレーション方法およびシミュレーションシステム |
| JP5782782B2 (ja) * | 2011-03-30 | 2015-09-24 | 株式会社Sumco | 特定欠陥の検出方法、特定欠陥の検出システムおよびプログラム |
| US20130335743A1 (en) * | 2012-06-19 | 2013-12-19 | Shenzhen China Star Optoelectronics Technology Co. Ltd. | Inspection Device for Glass Substrate Cassette |
| CN103247550B (zh) * | 2013-05-07 | 2016-04-13 | 上海华力微电子有限公司 | 监控制程稳定性的测试模块和方法 |
| US9262821B2 (en) | 2014-05-12 | 2016-02-16 | Kla-Tencor Corp. | Inspection recipe setup from reference image variation |
| US10438340B2 (en) * | 2017-03-21 | 2019-10-08 | Test Research, Inc. | Automatic optical inspection system and operating method thereof |
| JP6819451B2 (ja) * | 2017-05-08 | 2021-01-27 | 信越化学工業株式会社 | 大型合成石英ガラス基板並びにその評価方法及び製造方法 |
| US12189375B2 (en) * | 2020-09-21 | 2025-01-07 | Applied Materials, Inc. | Dynamic scheduling based on task dependencies |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5910231A (ja) * | 1982-07-09 | 1984-01-19 | Mitsubishi Electric Corp | パタ−ン欠陥解析装置 |
| JPH08184407A (ja) * | 1994-12-29 | 1996-07-16 | Nagoya Denki Kogyo Kk | 実装済印刷配線板自動検査装置 |
| JP2002050668A (ja) * | 2000-08-07 | 2002-02-15 | Tokyo Electron Ltd | 基板処理装置及びその方法 |
| JP2002082063A (ja) * | 2000-09-05 | 2002-03-22 | Komatsu Electronic Metals Co Ltd | ウエハの表面検査装置及び検査方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5944778B2 (ja) * | 1980-11-29 | 1984-11-01 | 日本電気ホームエレクトロニクス株式会社 | 半導体ペレツト外観検査方法 |
| US4644172A (en) * | 1984-02-22 | 1987-02-17 | Kla Instruments Corporation | Electronic control of an automatic wafer inspection system |
| JPS62173731A (ja) * | 1986-01-28 | 1987-07-30 | Toshiba Corp | 被検査物の表面検査装置 |
| IL99823A0 (en) * | 1990-11-16 | 1992-08-18 | Orbot Instr Ltd | Optical inspection method and apparatus |
| JPH07321174A (ja) * | 1994-05-25 | 1995-12-08 | Sony Corp | 半導体検査装置 |
| JP3361945B2 (ja) * | 1996-12-19 | 2003-01-07 | 株式会社日立製作所 | 平面ディスプレイパネルの製造方法およびプラズマディスプレイパネルの製造方法 |
| JP3981895B2 (ja) | 1997-08-29 | 2007-09-26 | 株式会社ニコン | 自動マクロ検査装置 |
| JP3333148B2 (ja) | 1999-05-31 | 2002-10-07 | オリンパス光学工業株式会社 | 外観検査装置 |
| JP2001099788A (ja) | 1999-09-28 | 2001-04-13 | Sharp Corp | 自動マクロ外観検査装置 |
| JP2001141657A (ja) * | 1999-10-29 | 2001-05-25 | Internatl Business Mach Corp <Ibm> | マクロ検査用照明装置、マクロ検査装置及び該方法 |
| JP2002076077A (ja) * | 2000-08-31 | 2002-03-15 | Nikon Corp | 検査装置 |
| JP4004248B2 (ja) * | 2000-09-01 | 2007-11-07 | 大日本スクリーン製造株式会社 | 基板処理装置および基板検査方法 |
| US6891627B1 (en) * | 2000-09-20 | 2005-05-10 | Kla-Tencor Technologies Corp. | Methods and systems for determining a critical dimension and overlay of a specimen |
| US6673637B2 (en) * | 2000-09-20 | 2004-01-06 | Kla-Tencor Technologies | Methods and systems for determining a presence of macro defects and overlay of a specimen |
-
2003
- 2003-03-26 JP JP2003084741A patent/JP4529365B2/ja not_active Expired - Fee Related
-
2004
- 2004-03-23 KR KR1020040019584A patent/KR101104665B1/ko not_active Expired - Lifetime
- 2004-03-24 US US10/807,262 patent/US7330042B2/en not_active Expired - Lifetime
- 2004-03-26 TW TW093108290A patent/TW200504350A/zh not_active IP Right Cessation
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5910231A (ja) * | 1982-07-09 | 1984-01-19 | Mitsubishi Electric Corp | パタ−ン欠陥解析装置 |
| JPH08184407A (ja) * | 1994-12-29 | 1996-07-16 | Nagoya Denki Kogyo Kk | 実装済印刷配線板自動検査装置 |
| JP2002050668A (ja) * | 2000-08-07 | 2002-02-15 | Tokyo Electron Ltd | 基板処理装置及びその方法 |
| JP2002082063A (ja) * | 2000-09-05 | 2002-03-22 | Komatsu Electronic Metals Co Ltd | ウエハの表面検査装置及び検査方法 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20200046014A (ko) * | 2017-06-14 | 2020-05-06 | 캠텍 리미티드 | 자동 결함 분류 |
| KR102309569B1 (ko) | 2017-06-14 | 2021-10-07 | 캠텍 리미티드 | 자동 결함 분류 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200504350A (en) | 2005-02-01 |
| JP4529365B2 (ja) | 2010-08-25 |
| US7330042B2 (en) | 2008-02-12 |
| US20050072945A1 (en) | 2005-04-07 |
| KR20040084710A (ko) | 2004-10-06 |
| JP2004294172A (ja) | 2004-10-21 |
| TWI307408B (https=) | 2009-03-11 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PA0109 | Patent application |
Patent event code: PA01091R01D Comment text: Patent Application Patent event date: 20040323 |
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| PG1501 | Laying open of application | ||
| A201 | Request for examination | ||
| PA0201 | Request for examination |
Patent event code: PA02012R01D Patent event date: 20090319 Comment text: Request for Examination of Application Patent event code: PA02011R01I Patent event date: 20040323 Comment text: Patent Application |
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| E902 | Notification of reason for refusal | ||
| PE0902 | Notice of grounds for rejection |
Comment text: Notification of reason for refusal Patent event date: 20110214 Patent event code: PE09021S01D |
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| E701 | Decision to grant or registration of patent right | ||
| PE0701 | Decision of registration |
Patent event code: PE07011S01D Comment text: Decision to Grant Registration Patent event date: 20111121 |
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| GRNT | Written decision to grant | ||
| PR0701 | Registration of establishment |
Comment text: Registration of Establishment Patent event date: 20120104 Patent event code: PR07011E01D |
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| PR1002 | Payment of registration fee |
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