KR101045515B1 - 진공 증착 장치 및 증착 필름 제조 방법 - Google Patents
진공 증착 장치 및 증착 필름 제조 방법 Download PDFInfo
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- KR101045515B1 KR101045515B1 KR1020057012013A KR20057012013A KR101045515B1 KR 101045515 B1 KR101045515 B1 KR 101045515B1 KR 1020057012013 A KR1020057012013 A KR 1020057012013A KR 20057012013 A KR20057012013 A KR 20057012013A KR 101045515 B1 KR101045515 B1 KR 101045515B1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02631—Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
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- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims (10)
- 진공 중에서 풀기 롤(11)로부터 풀어낸 소재 필름(f1)을 입측 가이드 롤 (13)에서 코팅 롤(14)로 도입하고, 이 코팅 롤 상에서 증착층을 소재 필름 표면에 형성하고, 상기 코팅 롤로부터 도출된 증착 필름 표면의 증착층을 출측 가이드 롤(15)로 누르면서 해당 증착 필름(f2)을 감기 롤(17)에 감기게 하는 진공 증착 장치(1)로서,상기 코팅 롤(14)의 외주 속도(v1)와 상기 출측 가이드 롤(15)의 외주 속도(v2)를 v1=v2가 되도록 동조시키기 위한 동조 수단(18)을 구비하고,상기 출측 가이드 롤은 텐션 롤이고,상기 동조 수단(18)은,상기 코팅 롤(14)의 회전축을 회전중심으로 하는 제 1 벨트 차(b1)와,상기 출측 가이드 롤(15)의 회전축을 회전중심으로 하는 제 2 벨트 차(b2)와,상기 제 1 벨트 차의 회전을 상기 제 2 벨트 차에 전달하기 위한 벨트(b3),상기 제 2 벨트 차의 외주부와 상기 텐션 롤의 내주부 양자에 접하여 설치된 복수의 볼 베어링(b4)를 포함하고 있고,상기 텐션 롤은, 상기 각 볼 베어링을 통하여 상기 제 2 벨트 차의 회전력이 전달되는 것을 특징으로 하는 진공 증착 장치.
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- 제 1 항에 있어서,상기 코팅 롤(142) 상의 필름(f)에 증착층을 형성하기 위한 증착 유닛(212)과,상기 증착 유닛을 수용하고, 적어도 외벽(222)의 일부(252)가 착탈 또는 개 폐가능한 증착실(202)과,상기 코팅 롤의 상류측 또는 하류측에 개별적으로 설치한 1개 이상의 처리 롤(141)과,상기 처리 롤 상의 필름에, 상기 증착 유닛과는 다른 방식의 코팅 처리 또는 표면 처리를 실시하기 위한 1대 이상의 처리 유닛(211)과,상기 처리 유닛을 개별적으로 수용하고, 적어도 외벽(221)의 일부(231, 251)가 착탈 또는 개폐가능한 1실 이상의 처리실(201)과,상기 증착 유닛 및 상기 처리 유닛에 대하여, 상기 필름을 「상류측에서 하류측으로의 정방향」 또는 「하류측에서 상류측으로의 역방향」의 쌍방향으로 공급하기 위한 쌍방향 공급 수단(19),을 구비한 것을 특징으로 하는 진공 증착 장치.
- 제 5 항에 있어서,상기 증착 유닛(212)은 PVD방식에 의해 증착 처리를 상기 필름(f) 상에 실시하는 것을 특징으로 하는 진공 증착 장치.
- 제 1 항에 기재된 진공 증착 장치가 실행하는 증착 필름 제조 방법으로서,상기 코팅 롤(14)의 외주 속도(v1)와 상기 출측 가이드 롤(15)의 외주 속도(v2)를 v1=v2가 되도록 동조시키기 위한 동조 공정(18)을 구비하고,상기 동조 공정(18)은,상기 코팅 롤(14)의 회전축을 회전중심으로 상기 제 1 벨트 차(b1)가 회전하는 공정과,이 제 1 벨트 차의 회전에 따라 상기 벨트(b3)가 이동하는 공정과,이 벨트의 이동에 따라 상기 출측 가이드 롤(15)의 회전축을 회전중심으로 상기 제 2 벨트 차(b2)가 회전하는 공정과,상기 제 2 벨트 차의 회전력이 상기 각 볼 베어링(b4)을 통하여 상기 텐션 롤인 상기 출측 가이드 롤에 전달되는 공정을 구비한 것을 특징으로 하는 증착 필름 제조 방법.
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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JP2002376933 | 2002-12-26 | ||
JPJP-P-2002-00376933 | 2002-12-26 |
Publications (2)
Publication Number | Publication Date |
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KR20050092724A KR20050092724A (ko) | 2005-09-22 |
KR101045515B1 true KR101045515B1 (ko) | 2011-06-30 |
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KR1020057012013A KR101045515B1 (ko) | 2002-12-26 | 2003-12-26 | 진공 증착 장치 및 증착 필름 제조 방법 |
Country Status (9)
Country | Link |
---|---|
US (1) | US7754015B2 (ko) |
EP (1) | EP1593754B1 (ko) |
JP (1) | JP4529688B2 (ko) |
KR (1) | KR101045515B1 (ko) |
CN (1) | CN100582295C (ko) |
AU (1) | AU2003292634A1 (ko) |
IN (1) | IN266855B (ko) |
RU (1) | RU2332523C2 (ko) |
WO (1) | WO2004059032A1 (ko) |
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2003
- 2003-12-26 EP EP03782915.7A patent/EP1593754B1/en not_active Expired - Lifetime
- 2003-12-26 WO PCT/JP2003/016846 patent/WO2004059032A1/ja active Application Filing
- 2003-12-26 JP JP2004562952A patent/JP4529688B2/ja not_active Expired - Fee Related
- 2003-12-26 CN CN200380107480A patent/CN100582295C/zh not_active Expired - Lifetime
- 2003-12-26 RU RU2005120006/02A patent/RU2332523C2/ru active
- 2003-12-26 IN IN2696DEN2005 patent/IN266855B/en unknown
- 2003-12-26 AU AU2003292634A patent/AU2003292634A1/en not_active Abandoned
- 2003-12-26 KR KR1020057012013A patent/KR101045515B1/ko active IP Right Grant
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- 2005-06-21 US US11/157,163 patent/US7754015B2/en active Active
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Also Published As
Publication number | Publication date |
---|---|
EP1593754A1 (en) | 2005-11-09 |
RU2005120006A (ru) | 2006-02-10 |
KR20050092724A (ko) | 2005-09-22 |
US7754015B2 (en) | 2010-07-13 |
IN266855B (ko) | 2015-06-09 |
JP4529688B2 (ja) | 2010-08-25 |
WO2004059032A1 (ja) | 2004-07-15 |
EP1593754B1 (en) | 2018-05-23 |
US20050249875A1 (en) | 2005-11-10 |
JPWO2004059032A1 (ja) | 2006-04-27 |
EP1593754A4 (en) | 2011-03-23 |
AU2003292634A1 (en) | 2004-07-22 |
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