JP6681524B1 - 真空蒸着装置 - Google Patents
真空蒸着装置 Download PDFInfo
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- JP6681524B1 JP6681524B1 JP2020506372A JP2020506372A JP6681524B1 JP 6681524 B1 JP6681524 B1 JP 6681524B1 JP 2020506372 A JP2020506372 A JP 2020506372A JP 2020506372 A JP2020506372 A JP 2020506372A JP 6681524 B1 JP6681524 B1 JP 6681524B1
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- 238000001771 vacuum deposition Methods 0.000 title abstract description 3
- 238000007740 vapor deposition Methods 0.000 claims abstract description 186
- 238000005192 partition Methods 0.000 claims abstract description 108
- 239000000463 material Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims description 36
- 238000003860 storage Methods 0.000 claims description 33
- 238000010438 heat treatment Methods 0.000 claims description 29
- 239000002245 particle Substances 0.000 claims description 19
- 230000002093 peripheral effect Effects 0.000 claims description 14
- 238000007599 discharging Methods 0.000 claims description 2
- 238000000151 deposition Methods 0.000 abstract description 19
- 230000008021 deposition Effects 0.000 abstract description 14
- 239000010408 film Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 12
- 230000015572 biosynthetic process Effects 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 7
- 238000001816 cooling Methods 0.000 description 6
- 230000004308 accommodation Effects 0.000 description 4
- 239000002826 coolant Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 238000003892 spreading Methods 0.000 description 2
- 230000007480 spreading Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (3)
- シート状の基材を走行させる基材走行手段とこの基材走行手段により走行されるシート状の基材が巻き掛けられるキャンローラとを有する真空雰囲気の形成が可能なメインチャンバと、キャンローラに巻き掛けられたシート状の基材の部分に対して蒸着する蒸着ユニットとを備える真空蒸着装置において、
メインチャンバ内に、蒸着ユニットが格納される蒸着室を区画する第1隔壁と、第1隔壁に連設されて蒸着ユニットの周方向両側に位置するキャンローラの外筒部分をキャンローラの外周面に一致する曲率で湾曲する第1間隙を介して覆う第2隔壁とを更に備え、第1間隙を境界として蒸着室とこの蒸着室に隣接するメインチャンバ内の隣接室とが互いに連通し、第2隔壁で蒸着室と隣接室との間のコンダクタンスが確定されるように構成し、
前記第2隔壁の少なくとも一方が、前記蒸着ユニットに対向するキャンローラの部分を遮蔽する遮蔽位置と蒸着ユニットから周方向に離間した退避位置との間でキャンローラの回転軸を回転中心として回動自在に構成されることを特徴とする真空蒸着装置。 - 前記蒸着ユニットが、蒸着物質を収容する収容箱と蒸着物質の加熱を可能とする加熱手段とを備え、前記キャンローラに対峙する収容箱の蓋体が、キャンローラの母線方向長さと同等以上の2本の横辺を持つと共に上記曲率で湾曲され、この蓋体に、加熱手段による加熱で昇華または気化した蒸着粒子を放出する放出開口が開設され、
蓋体がキャンローラの外周面に上記曲率で湾曲した第2間隙を存して近接する蒸着位置と、蓋体がキャンローラの外周面から離間した離間位置との間で蒸着ユニットをキャンローラの径方向に進退させる移動手段を備え、
前記第2隔壁の退避位置にて蒸着ユニットを蒸着位置に進入させると、蓋体の各横辺が第1隔壁に夫々当接または近接して、第2間隙で区画される蒸着空間が第1間隙を境界として隣接室に連通することを特徴とする請求項1記載の真空蒸着装置。 - 前記第2隔壁の周方向の両端に、キャンローラの母線方向長さと同等以上の長さを持つ隔壁板が夫々取り付けられ、第2隔壁を遮蔽位置または退避位置に移動すると、いずれか一方の隔壁板とこの隔壁板と同等の長さを持つメインチャンバに固定の固定隔壁とが当接または近接して第1隔壁を構成するようにしたことを特徴とする請求項2記載の真空蒸着装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2019044883 | 2019-03-12 | ||
JP2019044883 | 2019-03-12 | ||
PCT/JP2019/042105 WO2020183777A1 (ja) | 2019-03-12 | 2019-10-28 | 真空蒸着装置 |
Publications (2)
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JP6681524B1 true JP6681524B1 (ja) | 2020-04-15 |
JPWO2020183777A1 JPWO2020183777A1 (ja) | 2021-03-18 |
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US (1) | US11345992B2 (ja) |
JP (1) | JP6681524B1 (ja) |
CN (1) | CN112368413B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2020230359A1 (ja) * | 2019-05-13 | 2020-11-19 | 株式会社アルバック | 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 |
CN117888063B (zh) * | 2023-12-30 | 2024-07-05 | 绍兴市德鑫包装材料有限公司 | 一种真空镀铝膜的制造方法 |
Family Cites Families (17)
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DE69311611T2 (de) * | 1992-03-30 | 1997-10-02 | Matsushita Electric Ind Co Ltd | Verfahren zur Herstellung eines Überzuges durch chemische Abscheidung aus der Dampfphase mittels Plasma |
JPH06173003A (ja) * | 1992-12-03 | 1994-06-21 | Fuji Photo Film Co Ltd | 蒸着装置 |
IN266855B (ja) | 2002-12-26 | 2015-06-09 | Toppan Printing Co Ltd | |
US20060159844A1 (en) * | 2005-01-18 | 2006-07-20 | Fuji Photo Film Co., Ltd. | Process and apparatus for producing magnetic recording medium |
CN101145720A (zh) * | 2006-09-04 | 2008-03-19 | 精工爱普生株式会社 | 电机及其制法和电磁线圈、电子设备及燃料电池使用设备 |
JP5291875B2 (ja) * | 2006-11-01 | 2013-09-18 | 富士フイルム株式会社 | プラズマ装置 |
JP4324239B2 (ja) * | 2007-03-09 | 2009-09-02 | パナソニック株式会社 | 蒸着装置および蒸着装置を用いた膜の製造方法 |
JP2010163693A (ja) | 2010-04-12 | 2010-07-29 | Ulvac Japan Ltd | 巻取式真空蒸着方法 |
JP5694023B2 (ja) * | 2011-03-23 | 2015-04-01 | 小島プレス工業株式会社 | 積層構造体の製造装置 |
KR102046440B1 (ko) | 2012-10-09 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
EP2762609B1 (en) * | 2013-01-31 | 2019-04-17 | Applied Materials, Inc. | Apparatus and method for depositing at least two layers on a substrate |
JP5969953B2 (ja) | 2013-05-31 | 2016-08-17 | 株式会社神戸製鋼所 | 成膜装置 |
EP2868768B1 (en) * | 2013-10-29 | 2021-06-16 | Oerlikon Surface Solutions AG, Pfäffikon | Shutter system |
JP6347662B2 (ja) * | 2014-05-09 | 2018-06-27 | 東レエンジニアリング株式会社 | 薄膜形成装置 |
TWI613314B (zh) * | 2015-03-31 | 2018-02-01 | Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) | 成膜裝置及成膜裝置的分隔壁構造體 |
JP6408949B2 (ja) | 2015-03-31 | 2018-10-17 | 株式会社神戸製鋼所 | 成膜装置 |
KR20180096728A (ko) * | 2015-12-21 | 2018-08-29 | 어플라이드 머티어리얼스, 인코포레이티드 | 필름 형성 장치 |
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2019
- 2019-10-28 CN CN201980038547.1A patent/CN112368413B/zh active Active
- 2019-10-28 JP JP2020506372A patent/JP6681524B1/ja active Active
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2021
- 2021-01-25 US US17/156,985 patent/US11345992B2/en active Active
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Publication number | Publication date |
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CN112368413B (zh) | 2022-04-29 |
JPWO2020183777A1 (ja) | 2021-03-18 |
US20210140034A1 (en) | 2021-05-13 |
US11345992B2 (en) | 2022-05-31 |
CN112368413A (zh) | 2021-02-12 |
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