DE69311611T2 - Verfahren zur Herstellung eines Überzuges durch chemische Abscheidung aus der Dampfphase mittels Plasma - Google Patents

Verfahren zur Herstellung eines Überzuges durch chemische Abscheidung aus der Dampfphase mittels Plasma

Info

Publication number
DE69311611T2
DE69311611T2 DE69311611T DE69311611T DE69311611T2 DE 69311611 T2 DE69311611 T2 DE 69311611T2 DE 69311611 T DE69311611 T DE 69311611T DE 69311611 T DE69311611 T DE 69311611T DE 69311611 T2 DE69311611 T2 DE 69311611T2
Authority
DE
Germany
Prior art keywords
plasma
coating
production
vapor deposition
chemical vapor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69311611T
Other languages
English (en)
Other versions
DE69311611D1 (de
Inventor
Kiyoshi Takahashi
Mikio Murai
Masaru Odagiri
Hideyuki Ueda
Yukikazu Ohchi
Tatsuya Hiwatashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Application granted granted Critical
Publication of DE69311611D1 publication Critical patent/DE69311611D1/de
Publication of DE69311611T2 publication Critical patent/DE69311611T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating
    • C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Chemical Vapour Deposition (AREA)
DE69311611T 1992-03-30 1993-03-23 Verfahren zur Herstellung eines Überzuges durch chemische Abscheidung aus der Dampfphase mittels Plasma Expired - Fee Related DE69311611T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7205692 1992-03-30

Publications (2)

Publication Number Publication Date
DE69311611D1 DE69311611D1 (de) 1997-07-24
DE69311611T2 true DE69311611T2 (de) 1997-10-02

Family

ID=13478349

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69311611T Expired - Fee Related DE69311611T2 (de) 1992-03-30 1993-03-23 Verfahren zur Herstellung eines Überzuges durch chemische Abscheidung aus der Dampfphase mittels Plasma

Country Status (3)

Country Link
US (1) US5328737A (de)
EP (1) EP0563748B1 (de)
DE (1) DE69311611T2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3419045B2 (ja) * 1993-10-20 2003-06-23 松下電器産業株式会社 磁気記録媒体の製造方法
US5589263A (en) * 1993-12-28 1996-12-31 Matsushita Electric Industrial Co., Ltd. Magnetic recording medium having a ferromagnetic metal thin film, a dry etched layer, a carbonaceous film, and a lubricant film
DE4414083C2 (de) * 1994-04-22 2000-01-20 Leybold Ag Vorrichtung zum Herstellen dünner Schichten auf Kunststoff-Substraten und zum Ätzen solcher Substrate
FR2731370B1 (fr) * 1995-03-07 1997-06-06 Cie Generale D Optique Essilor Procede pour le depot assiste par plasma d'au moins une couche mince sur un substrat a deux faces, et reacteur correspondant
JP2005350652A (ja) * 2004-05-12 2005-12-22 Matsushita Electric Ind Co Ltd 潤滑剤、ならびに磁気記録媒体および磁気記録媒体の製造方法
JP5460236B2 (ja) * 2009-10-22 2014-04-02 株式会社神戸製鋼所 Ｃｖｄ成膜装置
CN112368413B (zh) * 2019-03-12 2022-04-29 株式会社爱发科 真空蒸镀装置
DE102021133627A1 (de) * 2021-12-17 2023-06-22 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Vorrichtung zum Beschichten eines bandförmigen Substrates mit einer Parylene-Schicht

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4645977A (en) * 1984-08-31 1987-02-24 Matsushita Electric Industrial Co., Ltd. Plasma CVD apparatus and method for forming a diamond like carbon film
JPS63118074A (ja) * 1986-11-05 1988-05-23 Matsushita Electric Ind Co Ltd 薄膜形成装置
FR2621930B1 (fr) * 1987-10-15 1990-02-02 Solems Sa Procede et appareil pour la production par plasma de couches minces a usage electronique et/ou optoelectronique
JP2687730B2 (ja) * 1991-01-09 1997-12-08 松下電器産業株式会社 磁気記録媒体の製造方法
JPH0525648A (ja) * 1991-07-15 1993-02-02 Matsushita Electric Ind Co Ltd プラズマｃｖｄ成膜方法

Also Published As

Publication number Publication date
US5328737A (en) 1994-07-12
EP0563748A3 (en) 1995-03-29
EP0563748B1 (de) 1997-06-18
EP0563748A2 (de) 1993-10-06
DE69311611D1 (de) 1997-07-24

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee