DE69503296D1 - Verfahren zur plasmaunterstützten chemischen Abscheidung aus der Dampfphase - Google Patents

Verfahren zur plasmaunterstützten chemischen Abscheidung aus der Dampfphase

Info

Publication number
DE69503296D1
DE69503296D1 DE69503296T DE69503296T DE69503296D1 DE 69503296 D1 DE69503296 D1 DE 69503296D1 DE 69503296 T DE69503296 T DE 69503296T DE 69503296 T DE69503296 T DE 69503296T DE 69503296 D1 DE69503296 D1 DE 69503296D1
Authority
DE
Germany
Prior art keywords
plasma
vapor phase
chemical deposition
assisted chemical
assisted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69503296T
Other languages
English (en)
Other versions
DE69503296T2 (de
Inventor
Eugene S Lopata
John S Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Linde LLC
Original Assignee
BOC Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Inc filed Critical BOC Group Inc
Application granted granted Critical
Publication of DE69503296D1 publication Critical patent/DE69503296D1/de
Publication of DE69503296T2 publication Critical patent/DE69503296T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Laminated Bodies (AREA)
  • Surface Treatment Of Glass (AREA)
  • Paints Or Removers (AREA)
  • Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
DE69503296T 1994-04-19 1995-04-18 Verfahren zur plasmaunterstützten chemischen Abscheidung aus der Dampfphase Expired - Fee Related DE69503296T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/230,028 US5487920A (en) 1994-04-19 1994-04-19 Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates

Publications (2)

Publication Number Publication Date
DE69503296D1 true DE69503296D1 (de) 1998-08-13
DE69503296T2 DE69503296T2 (de) 1999-04-08

Family

ID=22863671

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69503296T Expired - Fee Related DE69503296T2 (de) 1994-04-19 1995-04-18 Verfahren zur plasmaunterstützten chemischen Abscheidung aus der Dampfphase

Country Status (7)

Country Link
US (1) US5487920A (de)
EP (1) EP0678593B1 (de)
JP (1) JPH0848543A (de)
AU (1) AU678681B2 (de)
CA (1) CA2145949A1 (de)
DE (1) DE69503296T2 (de)
ZA (1) ZA952858B (de)

Families Citing this family (34)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6149982A (en) * 1994-02-16 2000-11-21 The Coca-Cola Company Method of forming a coating on an inner surface
WO1995022413A1 (en) * 1994-02-16 1995-08-24 The Coca-Cola Company Hollow containers with inert or impermeable inner surface through plasma-assisted surface reaction or on-surface polymerization
JP3561021B2 (ja) * 1995-01-26 2004-09-02 株式会社メニコン 眼用レンズ材料
US5897925A (en) * 1996-03-28 1999-04-27 Industrial Technology Research Institute Fog-resistant microporous SiOH films and the method of manufacturing the same
US5895587A (en) * 1997-01-21 1999-04-20 Cryovac, Inc. Cook-in package and method of making same
DE19704947A1 (de) * 1997-02-10 1998-08-13 Leybold Systems Gmbh Verfahren und Vorrichtung zur Schutzbeschichtung von Verspiegelungsschichten
DE19709673C2 (de) * 1997-03-11 2001-01-04 Heraeus Kulzer Gmbh & Co Kg Verfahren zur Behandlung von Oberflächen
JP3161362B2 (ja) * 1997-05-01 2001-04-25 富士ゼロックス株式会社 微小構造体、その製造方法、その製造装置、基板および成形型
US5922459A (en) * 1997-10-23 1999-07-13 Industrial Technology Research Institute Plasma-polymerized DMDAS anti-fogging film and method for manufacturing the same
CA2340972C (en) * 1998-09-21 2007-04-03 The Procter & Gamble Company Durably wettable, liquid pervious webs
TW591097B (en) * 1998-12-10 2004-06-11 Toray Industries Optical articles and the preparation of optical articles
AUPQ859000A0 (en) 2000-07-06 2000-07-27 Commonwealth Scientific And Industrial Research Organisation Apparatus for surface engineering
WO2002004552A1 (en) * 2000-07-06 2002-01-17 Commonwealth Scientific And Industrial Research Organisation A process for modifying the surface of a substrate containing a polymeric material by means of vaporising the surface modifying agent
KR20020051456A (ko) * 2000-12-22 2002-06-29 황 철 주 저온환경의 화학기상증착 방법
BR0116786B1 (pt) * 2001-01-16 2012-10-02 tampa para recipiente de vinho feita de um elastÈmero expandido.
US7008979B2 (en) 2002-04-30 2006-03-07 Hydromer, Inc. Coating composition for multiple hydrophilic applications
US7731881B2 (en) * 2003-12-30 2010-06-08 Sabic Innovative Plastics Ip B.V. Method for making fog resistant thermoplastic articles and articles made therefrom
FR2866643B1 (fr) * 2004-02-24 2006-05-26 Saint Gobain Substrat, notamment verrier, a surface hydrophobe, avec une durabilite amelioree des proprietes hydrophobes
US20050202263A1 (en) * 2004-03-09 2005-09-15 Jonathan Sargent Barrier layer to prevent the loss of additives in an underlying layer
US7504156B2 (en) * 2004-04-15 2009-03-17 Avery Dennison Corporation Dew resistant coatings
US20080187728A1 (en) * 2005-09-30 2008-08-07 General Electric Company Anti-frost film assemblies, method of manufacture, and articles made thereof
WO2007056856A1 (en) * 2005-11-16 2007-05-24 UNIVERSITé LAVAL Process for producing anto-fog coating
JP2008066067A (ja) * 2006-09-06 2008-03-21 Ichikoh Ind Ltd 車両用ランプ装置の製造方法
TWI275658B (en) * 2006-09-13 2007-03-11 Ind Tech Res Inst Method of improving surface frame resistance of a substrate
US7718553B2 (en) * 2006-09-21 2010-05-18 Asm Japan K.K. Method for forming insulation film having high density
US7781352B2 (en) * 2007-06-06 2010-08-24 Asm Japan K.K. Method for forming inorganic silazane-based dielectric film
US7651959B2 (en) 2007-12-03 2010-01-26 Asm Japan K.K. Method for forming silazane-based dielectric film
JP2009277686A (ja) * 2008-05-12 2009-11-26 Taiyo Nippon Sanso Corp 絶縁膜の成膜方法および絶縁膜
US7622369B1 (en) 2008-05-30 2009-11-24 Asm Japan K.K. Device isolation technology on semiconductor substrate
US8765233B2 (en) * 2008-12-09 2014-07-01 Asm Japan K.K. Method for forming low-carbon CVD film for filling trenches
US20110100061A1 (en) * 2009-10-30 2011-05-05 James Fleming Formation of microstructured fiber preforms using porous glass deposition
ITMI20101529A1 (it) 2010-08-09 2012-02-10 Consiglio Nazionale Ricerche Elementi ottici plastici con caratteristiche antiappannanti e metodo per la loro realizzazione
TWI606986B (zh) 2012-10-03 2017-12-01 康寧公司 用於保護玻璃表面的物理氣相沉積層
CN111501023A (zh) * 2020-04-30 2020-08-07 江苏菲沃泰纳米科技有限公司 亲水防雾膜层及其制备方法、应用和产品

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS534020B2 (de) * 1974-09-05 1978-02-13
CA1077787A (en) * 1975-11-21 1980-05-20 National Aeronautics And Space Administration Abrasion resistant coatings for plastic surfaces
US4080476A (en) * 1976-11-15 1978-03-21 Datascope Corporation Anti-fog coated optical substrates
US4467073A (en) * 1982-10-20 1984-08-21 Hydromer, Inc. Transparent anti-fog coating compositions
JPS60155675A (ja) * 1984-01-26 1985-08-15 Shin Etsu Chem Co Ltd 潤滑性のある表面硬化膜の製造方法
DE3413019A1 (de) * 1984-04-06 1985-10-17 Robert Bosch Gmbh, 7000 Stuttgart Verfahren zum aufbringen einer duennen, transparenten schicht auf der oberflaeche optischer elemente
EP0182367B1 (de) * 1984-11-20 1990-04-18 Hitachi Maxell Ltd. Magnetischer Aufzeichnungsträger und Herstellung derselben
FR2591587A1 (fr) * 1985-12-17 1987-06-19 Saint Gobain Vitrage Film organo-mineral depose sur un substrat en verre eventuellement revetu d'une ou plusieurs couches metalliques minces.
DE3624467A1 (de) * 1986-07-19 1988-01-28 Leybold Heraeus Gmbh & Co Kg Verfahren zum herstellen transparenter schutzschichten aus siliziumverbindungen
DE3706782A1 (de) * 1987-03-03 1988-09-15 Daimler Benz Ag Verwendung von siliciumorganischen verbindungen auf windschutzscheiben aus glas zur erreichung eines anti-fogging-effekts gegenueber oeligen organischen substanzen
US4927704A (en) * 1987-08-24 1990-05-22 General Electric Company Abrasion-resistant plastic articles and method for making them
US5051308A (en) * 1987-08-24 1991-09-24 General Electric Company Abrasion-resistant plastic articles
US5326584A (en) * 1989-04-24 1994-07-05 Drexel University Biocompatible, surface modified materials and method of making the same
CA2021933A1 (en) * 1989-07-27 1991-01-28 Hiroshi Hosono Process for preparation of anti-fogging coating
US4980196A (en) * 1990-02-14 1990-12-25 E. I. Du Pont De Nemours And Company Method of coating steel substrate using low temperature plasma processes and priming
US5211995A (en) * 1991-09-30 1993-05-18 Manfred R. Kuehnle Method of protecting an organic surface by deposition of an inorganic refractory coating thereon
US5298587A (en) * 1992-12-21 1994-03-29 The Dow Chemical Company Protective film for articles and method

Also Published As

Publication number Publication date
AU1508695A (en) 1995-10-26
EP0678593A1 (de) 1995-10-25
US5487920A (en) 1996-01-30
DE69503296T2 (de) 1999-04-08
JPH0848543A (ja) 1996-02-20
ZA952858B (en) 1996-10-04
AU678681B2 (en) 1997-06-05
EP0678593B1 (de) 1998-07-08
CA2145949A1 (en) 1995-10-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee