DE69701109T2 - Verfahren zur Reinigung organometallischer Verbindungen - Google Patents

Verfahren zur Reinigung organometallischer Verbindungen

Info

Publication number
DE69701109T2
DE69701109T2 DE69701109T DE69701109T DE69701109T2 DE 69701109 T2 DE69701109 T2 DE 69701109T2 DE 69701109 T DE69701109 T DE 69701109T DE 69701109 T DE69701109 T DE 69701109T DE 69701109 T2 DE69701109 T2 DE 69701109T2
Authority
DE
Germany
Prior art keywords
cleaning
organometallic compounds
organometallic
compounds
cleaning organometallic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69701109T
Other languages
English (en)
Other versions
DE69701109D1 (de
Inventor
Hiromi Ohsaki
Toshinobu Ishihara
Kazuhiro Hirahara
Isao Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Chemical Co Ltd
Original Assignee
Shin Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Chemical Co Ltd filed Critical Shin Etsu Chemical Co Ltd
Publication of DE69701109D1 publication Critical patent/DE69701109D1/de
Application granted granted Critical
Publication of DE69701109T2 publication Critical patent/DE69701109T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D5/00—Condensation of vapours; Recovering volatile solvents by condensation
    • B01D5/0003—Condensation of vapours; Recovering volatile solvents by condensation by using heat-exchange surfaces for indirect contact between gases or vapours and the cooling medium
    • B01D5/0012—Vertical tubes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D7/00—Sublimation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4402—Reduction of impurities in the source gas
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S159/00—Concentrating evaporators
    • Y10S159/16—Vacuum
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S159/00—Concentrating evaporators
    • Y10S159/23—Cooling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S165/00—Heat exchange
    • Y10S165/911—Vaporization
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S165/00—Heat exchange
    • Y10S165/912—Combined or convertible heat exchange modes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
DE69701109T 1996-06-25 1997-06-24 Verfahren zur Reinigung organometallischer Verbindungen Expired - Lifetime DE69701109T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18410596A JP3525371B2 (ja) 1996-06-25 1996-06-25 有機金属化合物の精製方法

Publications (2)

Publication Number Publication Date
DE69701109D1 DE69701109D1 (de) 2000-02-17
DE69701109T2 true DE69701109T2 (de) 2000-09-28

Family

ID=16147487

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69701109T Expired - Lifetime DE69701109T2 (de) 1996-06-25 1997-06-24 Verfahren zur Reinigung organometallischer Verbindungen

Country Status (4)

Country Link
US (1) US5951820A (de)
EP (1) EP0816530B1 (de)
JP (1) JP3525371B2 (de)
DE (1) DE69701109T2 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6004433A (en) 1997-02-03 1999-12-21 L'air Liquide Societe Anonyme Pour L'etude Et L'exploitation Des Procedes George Claude Purification of electronic specialty gases by vapor phase transfilling
US6482968B1 (en) 1999-05-21 2002-11-19 Akzo Nobel Nv Purification of an organometallic compound
GB2432364B (en) * 2005-11-18 2009-11-11 Rohm & Haas Elect Mat Organometallic compound purification
JP5168919B2 (ja) * 2007-01-30 2013-03-27 宇部興産株式会社 高純度トリアルキルインジウム及びその製法
JP6108704B2 (ja) 2011-07-13 2017-04-05 ダウ グローバル テクノロジーズ エルエルシー 有機金属化合物精製
JP6054659B2 (ja) 2011-07-13 2016-12-27 ダウ グローバル テクノロジーズ エルエルシー 有機金属化合物精製および装置
EP2559682B1 (de) 2011-08-15 2016-08-03 Rohm and Haas Electronic Materials LLC Organometallische Verbindungszubereitung
EP2559681B1 (de) 2011-08-15 2016-06-22 Dow Global Technologies LLC Organometallische Verbindungszubereitung
JP5397641B2 (ja) * 2011-12-27 2014-01-22 宇部興産株式会社 高純度トリアルキルインジウム及びその製法
KR101599454B1 (ko) * 2012-12-18 2016-03-03 한국생산기술연구원 이온성 액체를 이용한 유기소재 정제방법 및 정제장치
CN103910753B (zh) * 2013-01-06 2018-04-17 江苏爱姆欧光电材料有限公司 一种高纯烷基锌化合物的纯化方法
JP2016145170A (ja) * 2015-02-09 2016-08-12 宇部興産株式会社 固体有機金属化合物の製造方法及び製造装置
CN106310700A (zh) * 2015-07-08 2017-01-11 陕西天汉生物科技有限公司 一种降低能耗的乙基麦芽酚结晶升华工艺
US20200165270A1 (en) 2018-11-28 2020-05-28 Versum Materials Us, Llc Low Halide Lanthanum Precursors For Vapor Deposition
CN112891981A (zh) * 2020-11-30 2021-06-04 新乡医学院三全学院 一种药理学用实验装置

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5250740A (en) * 1988-03-31 1993-10-05 The Secretary Of State For Defence In Her Britannic Majesty's Government Of The United Kingdom Of Great Britain And Northern Ireland Precursors for metal fluoride deposition and use thereof
JPH0267230A (ja) * 1988-09-02 1990-03-07 Toyo Stauffer Chem Co 有機金属化合物の精製法
JPH03123783A (ja) * 1989-10-09 1991-05-27 Nippon Mining Co Ltd 有機金属化合物の回収方法
JPH03225817A (ja) * 1990-01-30 1991-10-04 Matsushita Electric Ind Co Ltd 有機金属気相成長装置
JPH0499312A (ja) * 1990-08-17 1992-03-31 Mitsubishi Electric Corp 有機金属気相成長装置
US5201985A (en) * 1991-03-07 1993-04-13 Harald A.T.O. Method and apparatus for the purification and control of the composition of non-stoichiometric and stoichiometric crystalline compounds
JP3303391B2 (ja) * 1993-02-26 2002-07-22 住友化学工業株式会社 容器に充填した固体有機金属の精製方法
JP3624437B2 (ja) * 1993-12-14 2005-03-02 住友化学株式会社 有機金属化合物の精製方法
US5455364A (en) * 1993-12-14 1995-10-03 Sumitomo Chemical Company, Ltd. Process for removing an impurity in organometallic compound
JP3221237B2 (ja) * 1994-06-30 2001-10-22 住友化学工業株式会社 有機金属化合物の精製方法
JP3104836B2 (ja) * 1994-08-15 2000-10-30 信越化学工業株式会社 有機金属化合物中の酸素の定量方法および検査用の試料管

Also Published As

Publication number Publication date
EP0816530A1 (de) 1998-01-07
JP3525371B2 (ja) 2004-05-10
JPH1017572A (ja) 1998-01-20
US5951820A (en) 1999-09-14
DE69701109D1 (de) 2000-02-17
EP0816530B1 (de) 2000-01-12

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