KR970046641U - 화학기상증착장치 - Google Patents

화학기상증착장치

Info

Publication number
KR970046641U
KR970046641U KR2019950039699U KR19950039699U KR970046641U KR 970046641 U KR970046641 U KR 970046641U KR 2019950039699 U KR2019950039699 U KR 2019950039699U KR 19950039699 U KR19950039699 U KR 19950039699U KR 970046641 U KR970046641 U KR 970046641U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
deposition system
chemical
vapor
Prior art date
Application number
KR2019950039699U
Other languages
English (en)
Other versions
KR200148617Y1 (ko
Inventor
김경준
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950039699U priority Critical patent/KR200148617Y1/ko
Publication of KR970046641U publication Critical patent/KR970046641U/ko
Application granted granted Critical
Publication of KR200148617Y1 publication Critical patent/KR200148617Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
    • C23C16/4582—Rigid and flat substrates, e.g. plates or discs
    • C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
    • C23C16/4586—Elements in the interior of the support, e.g. electrodes, heating or cooling devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019950039699U 1995-12-11 1995-12-11 화학기상증착장치 KR200148617Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950039699U KR200148617Y1 (ko) 1995-12-11 1995-12-11 화학기상증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950039699U KR200148617Y1 (ko) 1995-12-11 1995-12-11 화학기상증착장치

Publications (2)

Publication Number Publication Date
KR970046641U true KR970046641U (ko) 1997-07-31
KR200148617Y1 KR200148617Y1 (ko) 1999-06-15

Family

ID=19432955

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950039699U KR200148617Y1 (ko) 1995-12-11 1995-12-11 화학기상증착장치

Country Status (1)

Country Link
KR (1) KR200148617Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689807B1 (ko) * 2000-11-20 2007-03-08 삼성전자주식회사 화학기상 증착장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100689807B1 (ko) * 2000-11-20 2007-03-08 삼성전자주식회사 화학기상 증착장치

Also Published As

Publication number Publication date
KR200148617Y1 (ko) 1999-06-15

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