KR960027781U - 화학기상증착장치 - Google Patents

화학기상증착장치

Info

Publication number
KR960027781U
KR960027781U KR2019950001045U KR19950001045U KR960027781U KR 960027781 U KR960027781 U KR 960027781U KR 2019950001045 U KR2019950001045 U KR 2019950001045U KR 19950001045 U KR19950001045 U KR 19950001045U KR 960027781 U KR960027781 U KR 960027781U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
deposition system
chemical
vapor
Prior art date
Application number
KR2019950001045U
Other languages
English (en)
Other versions
KR0121712Y1 (ko
Inventor
한찬희
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR2019950001045U priority Critical patent/KR0121712Y1/ko
Publication of KR960027781U publication Critical patent/KR960027781U/ko
Application granted granted Critical
Publication of KR0121712Y1 publication Critical patent/KR0121712Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45578—Elongated nozzles, tubes with holes

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019950001045U 1995-01-24 1995-01-24 화학기상증착장치 KR0121712Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950001045U KR0121712Y1 (ko) 1995-01-24 1995-01-24 화학기상증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950001045U KR0121712Y1 (ko) 1995-01-24 1995-01-24 화학기상증착장치

Publications (2)

Publication Number Publication Date
KR960027781U true KR960027781U (ko) 1996-08-17
KR0121712Y1 KR0121712Y1 (ko) 1998-08-17

Family

ID=19407072

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950001045U KR0121712Y1 (ko) 1995-01-24 1995-01-24 화학기상증착장치

Country Status (1)

Country Link
KR (1) KR0121712Y1 (ko)

Also Published As

Publication number Publication date
KR0121712Y1 (ko) 1998-08-17

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