KR950025872U - 종형 플라즈마 저압 화학 증기 증착장치 - Google Patents

종형 플라즈마 저압 화학 증기 증착장치

Info

Publication number
KR950025872U
KR950025872U KR2019940002157U KR19940002157U KR950025872U KR 950025872 U KR950025872 U KR 950025872U KR 2019940002157 U KR2019940002157 U KR 2019940002157U KR 19940002157 U KR19940002157 U KR 19940002157U KR 950025872 U KR950025872 U KR 950025872U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition system
Prior art date
Application number
KR2019940002157U
Other languages
English (en)
Other versions
KR0121629Y1 (ko
Inventor
황철주
Original Assignee
황철주
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 황철주 filed Critical 황철주
Priority to KR2019940002157U priority Critical patent/KR0121629Y1/ko
Publication of KR950025872U publication Critical patent/KR950025872U/ko
Application granted granted Critical
Publication of KR0121629Y1 publication Critical patent/KR0121629Y1/ko

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32458Vessel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/3244Gas supply means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32715Workpiece holder
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32834Exhausting
    • H01J37/32844Treating effluent gases
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02CCAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00Capture or disposal of greenhouse gases
    • Y02C20/30Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR2019940002157U 1994-02-04 1994-02-04 종형 플라즈마 저압 화학 증기 증착장치 KR0121629Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940002157U KR0121629Y1 (ko) 1994-02-04 1994-02-04 종형 플라즈마 저압 화학 증기 증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940002157U KR0121629Y1 (ko) 1994-02-04 1994-02-04 종형 플라즈마 저압 화학 증기 증착장치

Publications (2)

Publication Number Publication Date
KR950025872U true KR950025872U (ko) 1995-09-18
KR0121629Y1 KR0121629Y1 (ko) 1998-08-17

Family

ID=19376860

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940002157U KR0121629Y1 (ko) 1994-02-04 1994-02-04 종형 플라즈마 저압 화학 증기 증착장치

Country Status (1)

Country Link
KR (1) KR0121629Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030055470A (ko) * 2001-12-26 2003-07-04 삼성전자주식회사 방열판을 갖는 화학적 기상 증착 장치

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20030055470A (ko) * 2001-12-26 2003-07-04 삼성전자주식회사 방열판을 갖는 화학적 기상 증착 장치

Also Published As

Publication number Publication date
KR0121629Y1 (ko) 1998-08-17

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Legal Events

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A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080317

Year of fee payment: 11

EXPY Expiration of term