KR960025282U - 저압화학기상증착장치 - Google Patents

저압화학기상증착장치

Info

Publication number
KR960025282U
KR960025282U KR2019940039576U KR19940039576U KR960025282U KR 960025282 U KR960025282 U KR 960025282U KR 2019940039576 U KR2019940039576 U KR 2019940039576U KR 19940039576 U KR19940039576 U KR 19940039576U KR 960025282 U KR960025282 U KR 960025282U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition device
Prior art date
Application number
KR2019940039576U
Other languages
English (en)
Other versions
KR0128230Y1 (ko
Inventor
송인정
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019940039576U priority Critical patent/KR0128230Y1/ko
Publication of KR960025282U publication Critical patent/KR960025282U/ko
Application granted granted Critical
Publication of KR0128230Y1 publication Critical patent/KR0128230Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019940039576U 1994-12-31 1994-12-31 저압화학기상증착장치 KR0128230Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940039576U KR0128230Y1 (ko) 1994-12-31 1994-12-31 저압화학기상증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940039576U KR0128230Y1 (ko) 1994-12-31 1994-12-31 저압화학기상증착장치

Publications (2)

Publication Number Publication Date
KR960025282U true KR960025282U (ko) 1996-07-22
KR0128230Y1 KR0128230Y1 (ko) 1998-12-01

Family

ID=19405662

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940039576U KR0128230Y1 (ko) 1994-12-31 1994-12-31 저압화학기상증착장치

Country Status (1)

Country Link
KR (1) KR0128230Y1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100500430B1 (ko) * 2002-12-06 2005-07-12 주식회사 피에스엠 흡입형 기체유동을 이용한 대기압 플라즈마 표면처리장치및 그처리방법

Also Published As

Publication number Publication date
KR0128230Y1 (ko) 1998-12-01

Similar Documents

Publication Publication Date Title
DE69624870D1 (de) Flüssigkeit/Dampf-Kontaktvorrichtung
KR960025282U (ko) 저압화학기상증착장치
KR950028660U (ko) 저압 화학 기상 증착장치
KR960006305U (ko) 저압화학증착장치
KR960022673U (ko) 저압 화학 기상 증착장치
KR960027782U (ko) 저압화학기상증착 장치
KR970046634U (ko) 저압 화학 기상 증착 장치
KR960002692U (ko) 저압 화학 증기 증착장치
KR950023944U (ko) 저압 화학 증기 증착장치
KR960006306U (ko) 저압화학 기상 증착 장치
KR940027591U (ko) 저압화학기상증착 시스템의 부산물 제거장치
KR960011167U (ko) 화학증착 코팅장치
KR970056052U (ko) 화학기상증착장치
KR970056051U (ko) 화학기상증착장치
KR950028633U (ko) 화학기상 증착기
KR970056053U (ko) 수평식 저압 화학기상 증착장치
KR970015293U (ko) 대기압식 화학기상증착장치
KR970015294U (ko) 화학기상증착장치
KR960027170U (ko) 화학 기상 증착장치
KR940008658U (ko) 투-핫-존(two-hot-zone) 저압 화학기상증착 장치
KR950025872U (ko) 종형 플라즈마 저압 화학 증기 증착장치
KR950002225U (ko) 저압 화학증기 증착기
KR960019073U (ko) 저압화학기상증착장치용 석영관의 이송장치
KR940023545U (ko) 저압화학증착 장치
KR950021369U (ko) 저압화학기상증착장비

Legal Events

Date Code Title Description
A201 Request for examination
E902 Notification of reason for refusal
E701 Decision to grant or registration of patent right
REGI Registration of establishment
FPAY Annual fee payment

Payment date: 20080617

Year of fee payment: 11

LAPS Lapse due to unpaid annual fee