KR960027170U - 화학 기상 증착장치 - Google Patents

화학 기상 증착장치

Info

Publication number
KR960027170U
KR960027170U KR2019950000542U KR19950000542U KR960027170U KR 960027170 U KR960027170 U KR 960027170U KR 2019950000542 U KR2019950000542 U KR 2019950000542U KR 19950000542 U KR19950000542 U KR 19950000542U KR 960027170 U KR960027170 U KR 960027170U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
deposition equipment
equipment
chemical
Prior art date
Application number
KR2019950000542U
Other languages
English (en)
Other versions
KR200161171Y1 (ko
Inventor
오재섭
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019950000542U priority Critical patent/KR200161171Y1/ko
Publication of KR960027170U publication Critical patent/KR960027170U/ko
Application granted granted Critical
Publication of KR200161171Y1 publication Critical patent/KR200161171Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02365—Forming inorganic semiconducting materials on a substrate
    • H01L21/02612—Formation types
    • H01L21/02617—Deposition types
    • H01L21/0262—Reduction or decomposition of gaseous compounds, e.g. CVD

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR2019950000542U 1995-01-14 1995-01-14 화학 기상 증착장치 KR200161171Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950000542U KR200161171Y1 (ko) 1995-01-14 1995-01-14 화학 기상 증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950000542U KR200161171Y1 (ko) 1995-01-14 1995-01-14 화학 기상 증착장치

Publications (2)

Publication Number Publication Date
KR960027170U true KR960027170U (ko) 1996-08-17
KR200161171Y1 KR200161171Y1 (ko) 1999-11-15

Family

ID=19406724

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950000542U KR200161171Y1 (ko) 1995-01-14 1995-01-14 화학 기상 증착장치

Country Status (1)

Country Link
KR (1) KR200161171Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100712496B1 (ko) * 2001-09-21 2007-05-02 삼성전자주식회사 반도체 제조용 화학기상증착 장비의 가스 디퓨저

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100712496B1 (ko) * 2001-09-21 2007-05-02 삼성전자주식회사 반도체 제조용 화학기상증착 장비의 가스 디퓨저

Also Published As

Publication number Publication date
KR200161171Y1 (ko) 1999-11-15

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