KR970007707U - 화학 기상 증착 장치 - Google Patents

화학 기상 증착 장치

Info

Publication number
KR970007707U
KR970007707U KR2019950018939U KR19950018939U KR970007707U KR 970007707 U KR970007707 U KR 970007707U KR 2019950018939 U KR2019950018939 U KR 2019950018939U KR 19950018939 U KR19950018939 U KR 19950018939U KR 970007707 U KR970007707 U KR 970007707U
Authority
KR
South Korea
Prior art keywords
vapor deposition
chemical vapor
deposition equipment
equipment
chemical
Prior art date
Application number
KR2019950018939U
Other languages
English (en)
Other versions
KR0125240Y1 (ko
Inventor
이덕희
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950018939U priority Critical patent/KR0125240Y1/ko
Publication of KR970007707U publication Critical patent/KR970007707U/ko
Application granted granted Critical
Publication of KR0125240Y1 publication Critical patent/KR0125240Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67253—Process monitoring, e.g. flow or thickness monitoring

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR2019950018939U 1995-07-27 1995-07-27 화학 기상 증착 장치 KR0125240Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950018939U KR0125240Y1 (ko) 1995-07-27 1995-07-27 화학 기상 증착 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950018939U KR0125240Y1 (ko) 1995-07-27 1995-07-27 화학 기상 증착 장치

Publications (2)

Publication Number Publication Date
KR970007707U true KR970007707U (ko) 1997-02-21
KR0125240Y1 KR0125240Y1 (ko) 1999-02-18

Family

ID=19419341

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950018939U KR0125240Y1 (ko) 1995-07-27 1995-07-27 화학 기상 증착 장치

Country Status (1)

Country Link
KR (1) KR0125240Y1 (ko)

Also Published As

Publication number Publication date
KR0125240Y1 (ko) 1999-02-18

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