KR970046634U - 저압 화학 기상 증착 장치 - Google Patents

저압 화학 기상 증착 장치

Info

Publication number
KR970046634U
KR970046634U KR2019950048427U KR19950048427U KR970046634U KR 970046634 U KR970046634 U KR 970046634U KR 2019950048427 U KR2019950048427 U KR 2019950048427U KR 19950048427 U KR19950048427 U KR 19950048427U KR 970046634 U KR970046634 U KR 970046634U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition device
Prior art date
Application number
KR2019950048427U
Other languages
English (en)
Other versions
KR0134164Y1 (ko
Inventor
이승희
Original Assignee
엘지반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 엘지반도체주식회사 filed Critical 엘지반도체주식회사
Priority to KR2019950048427U priority Critical patent/KR0134164Y1/ko
Publication of KR970046634U publication Critical patent/KR970046634U/ko
Application granted granted Critical
Publication of KR0134164Y1 publication Critical patent/KR0134164Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019950048427U 1995-12-27 1995-12-27 저압 화학 기상 증착 장치 KR0134164Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019950048427U KR0134164Y1 (ko) 1995-12-27 1995-12-27 저압 화학 기상 증착 장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019950048427U KR0134164Y1 (ko) 1995-12-27 1995-12-27 저압 화학 기상 증착 장치

Publications (2)

Publication Number Publication Date
KR970046634U true KR970046634U (ko) 1997-07-31
KR0134164Y1 KR0134164Y1 (ko) 1999-03-20

Family

ID=19439096

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019950048427U KR0134164Y1 (ko) 1995-12-27 1995-12-27 저압 화학 기상 증착 장치

Country Status (1)

Country Link
KR (1) KR0134164Y1 (ko)

Also Published As

Publication number Publication date
KR0134164Y1 (ko) 1999-03-20

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Legal Events

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Payment date: 20040920

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