KR950028660U - 저압 화학 기상 증착장치 - Google Patents

저압 화학 기상 증착장치

Info

Publication number
KR950028660U
KR950028660U KR2019940006121U KR19940006121U KR950028660U KR 950028660 U KR950028660 U KR 950028660U KR 2019940006121 U KR2019940006121 U KR 2019940006121U KR 19940006121 U KR19940006121 U KR 19940006121U KR 950028660 U KR950028660 U KR 950028660U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
pressure chemical
deposition device
Prior art date
Application number
KR2019940006121U
Other languages
English (en)
Other versions
KR200164671Y1 (ko
Inventor
차동열
Original Assignee
현대반도체주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 현대반도체주식회사 filed Critical 현대반도체주식회사
Priority to KR2019940006121U priority Critical patent/KR200164671Y1/ko
Publication of KR950028660U publication Critical patent/KR950028660U/ko
Application granted granted Critical
Publication of KR200164671Y1 publication Critical patent/KR200164671Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Applications Or Details Of Rotary Compressors (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
KR2019940006121U 1994-03-25 1994-03-25 저압 화학 기상 증착장치 KR200164671Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019940006121U KR200164671Y1 (ko) 1994-03-25 1994-03-25 저압 화학 기상 증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019940006121U KR200164671Y1 (ko) 1994-03-25 1994-03-25 저압 화학 기상 증착장치

Publications (2)

Publication Number Publication Date
KR950028660U true KR950028660U (ko) 1995-10-20
KR200164671Y1 KR200164671Y1 (ko) 2000-01-15

Family

ID=19379658

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019940006121U KR200164671Y1 (ko) 1994-03-25 1994-03-25 저압 화학 기상 증착장치

Country Status (1)

Country Link
KR (1) KR200164671Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303149B1 (ko) * 2000-02-15 2001-11-03 이억기 반도체 제조용 건식 가스 스크러버

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100303149B1 (ko) * 2000-02-15 2001-11-03 이억기 반도체 제조용 건식 가스 스크러버

Also Published As

Publication number Publication date
KR200164671Y1 (ko) 2000-01-15

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