KR940027591U - 저압화학기상증착 시스템의 부산물 제거장치 - Google Patents

저압화학기상증착 시스템의 부산물 제거장치

Info

Publication number
KR940027591U
KR940027591U KR2019930007995U KR930007995U KR940027591U KR 940027591 U KR940027591 U KR 940027591U KR 2019930007995 U KR2019930007995 U KR 2019930007995U KR 930007995 U KR930007995 U KR 930007995U KR 940027591 U KR940027591 U KR 940027591U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
removal device
pressure chemical
Prior art date
Application number
KR2019930007995U
Other languages
English (en)
Other versions
KR960000138Y1 (ko
Inventor
최재규
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930007995U priority Critical patent/KR960000138Y1/ko
Publication of KR940027591U publication Critical patent/KR940027591U/ko
Application granted granted Critical
Publication of KR960000138Y1 publication Critical patent/KR960000138Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR2019930007995U 1993-05-13 1993-05-13 저압화학기상증착 시스템의 부산물 제거장치 KR960000138Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930007995U KR960000138Y1 (ko) 1993-05-13 1993-05-13 저압화학기상증착 시스템의 부산물 제거장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930007995U KR960000138Y1 (ko) 1993-05-13 1993-05-13 저압화학기상증착 시스템의 부산물 제거장치

Publications (2)

Publication Number Publication Date
KR940027591U true KR940027591U (ko) 1994-12-10
KR960000138Y1 KR960000138Y1 (ko) 1996-01-04

Family

ID=19355202

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930007995U KR960000138Y1 (ko) 1993-05-13 1993-05-13 저압화학기상증착 시스템의 부산물 제거장치

Country Status (1)

Country Link
KR (1) KR960000138Y1 (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100589924B1 (ko) * 1999-03-11 2006-06-15 동경 엘렉트론 주식회사 처리 장치, 처리 장치용 진공 배기 시스템, 감압 ｃｖｄ장치, 감압 ｃｖｄ 장치용 진공 배기 시스템 및 트랩 장치

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160001103A (ko) * 2014-06-26 2016-01-06 주식회사 우남케미코 우레탄계 약액주입패커를 이용한 연약지반 보강공법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100589924B1 (ko) * 1999-03-11 2006-06-15 동경 엘렉트론 주식회사 처리 장치, 처리 장치용 진공 배기 시스템, 감압 ｃｖｄ장치, 감압 ｃｖｄ 장치용 진공 배기 시스템 및 트랩 장치

Also Published As

Publication number Publication date
KR960000138Y1 (ko) 1996-01-04

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