KR940023562U - 저압화학증착 장비의 배기장치 - Google Patents

저압화학증착 장비의 배기장치

Info

Publication number
KR940023562U
KR940023562U KR2019930004202U KR930004202U KR940023562U KR 940023562 U KR940023562 U KR 940023562U KR 2019930004202 U KR2019930004202 U KR 2019930004202U KR 930004202 U KR930004202 U KR 930004202U KR 940023562 U KR940023562 U KR 940023562U
Authority
KR
South Korea
Prior art keywords
vapor deposition
low pressure
chemical vapor
exhaust system
pressure chemical
Prior art date
Application number
KR2019930004202U
Other languages
English (en)
Other versions
KR960009552Y1 (ko
Inventor
이승희
Original Assignee
금성일렉트론 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 금성일렉트론 주식회사 filed Critical 금성일렉트론 주식회사
Priority to KR2019930004202U priority Critical patent/KR960009552Y1/ko
Publication of KR940023562U publication Critical patent/KR940023562U/ko
Application granted granted Critical
Publication of KR960009552Y1 publication Critical patent/KR960009552Y1/ko

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
KR2019930004202U 1993-03-20 1993-03-20 저압화학증착 장비의 배기장치 KR960009552Y1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR2019930004202U KR960009552Y1 (ko) 1993-03-20 1993-03-20 저압화학증착 장비의 배기장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR2019930004202U KR960009552Y1 (ko) 1993-03-20 1993-03-20 저압화학증착 장비의 배기장치

Publications (2)

Publication Number Publication Date
KR940023562U true KR940023562U (ko) 1994-10-22
KR960009552Y1 KR960009552Y1 (ko) 1996-10-22

Family

ID=19352398

Family Applications (1)

Application Number Title Priority Date Filing Date
KR2019930004202U KR960009552Y1 (ko) 1993-03-20 1993-03-20 저압화학증착 장비의 배기장치

Country Status (1)

Country Link
KR (1) KR960009552Y1 (ko)

Also Published As

Publication number Publication date
KR960009552Y1 (ko) 1996-10-22

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