JP6713093B1 - 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 - Google Patents
蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 Download PDFInfo
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- JP6713093B1 JP6713093B1 JP2020520683A JP2020520683A JP6713093B1 JP 6713093 B1 JP6713093 B1 JP 6713093B1 JP 2020520683 A JP2020520683 A JP 2020520683A JP 2020520683 A JP2020520683 A JP 2020520683A JP 6713093 B1 JP6713093 B1 JP 6713093B1
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 165
- 238000003860 storage Methods 0.000 claims abstract description 64
- 239000000463 material Substances 0.000 claims abstract description 52
- 238000010438 heat treatment Methods 0.000 claims abstract description 38
- 238000007599 discharging Methods 0.000 claims abstract description 3
- 239000000758 substrate Substances 0.000 claims description 23
- 239000000126 substance Substances 0.000 claims description 14
- 238000009826 distribution Methods 0.000 claims description 8
- 230000004308 accommodation Effects 0.000 claims description 5
- 239000011364 vaporized material Substances 0.000 claims 1
- 238000005192 partition Methods 0.000 description 39
- 238000000151 deposition Methods 0.000 description 9
- 239000010408 film Substances 0.000 description 8
- 230000007246 mechanism Effects 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 230000008021 deposition Effects 0.000 description 7
- 238000012423 maintenance Methods 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 238000006073 displacement reaction Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 238000004891 communication Methods 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 239000002826 coolant Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 238000011144 upstream manufacturing Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
Claims (6)
- 蒸着物質が収納される収容箱と収容箱内の蒸着物質を加熱する加熱手段とを備え、収容箱の一面に、加熱により昇華または気化した蒸着物質を放出する放出開口が形成される蒸着ユニットにおいて、
蒸着ユニットが、一面を開口した格納チャンバ内に設けられ、格納チャンバの開口を向く方向を上として、格納チャンバ内で蒸着ユニットを上下方向に進退する移動手段を更に備え、
前記収容箱は、上面を開口した外容器と、外容器の内壁面に固定の支持枠と、支持枠の内側に配置されて蒸着物質が収納される内容器と、外容器と内容器との上面の開口を覆う、放出開口が形成される蓋体とを備え、支持枠の所定位置にその内方に向けて突出する複数本の支持ピンが配置され、外容器内に内容器を格納したとき各支持ピンで内容器が支持されるように構成したことを特徴とする蒸着ユニット。 - 前記加熱手段は、前記支持枠で保持されて前記内容器の外壁面に対向配置される複数本のシースヒータで構成され、前記内容器の外壁を複数の領域に分け、各領域に夫々対向配置されるシースヒータ毎に、所定電流値で通電可能としたことを特徴とする請求項1記載の蒸着ユニット。
- 請求項1または請求項2記載の蒸着ユニットを備える真空蒸着装置において、
キャンローラを有する真空チャンバを備え、真空チャンバに開設された取付開口に前記格納チャンバがその開口側から装着され、前記収容箱の前記放出開口がキャンローラの軸線に対して直交する姿勢で前記蒸着ユニットがセットされるように構成したことを特徴とする真空蒸着装置。 - 前記放出開口と、前記キャンローラに巻き掛けられるシート状の基材との距離を前記移動手段により蒸着ユニットの上下動のストロークの範囲内で変化させて前記収容箱内で昇華または気化した蒸着物質の飛散分布を調整自在としたことを特徴とする請求項3記載の真空蒸着装置。
- 請求項3または請求項4記載の真空蒸着装置であって、前記キャンローラの軸線方向をX軸方向、上下方向をZ軸方向、X軸及びZ軸に直交する方向をY軸方向とし、前記蓋体がX軸方向に長手で且つ板状であるものにおいて、
前記蓋体のY軸方向への熱変形及びZ軸回りの回転を許容しつつ、X軸方向及びY軸方向への変形を規制する規制手段を更に備えることを特徴とする真空蒸着装置。 - 前記規制手段は、前記蒸着ユニットの蒸着位置にてX軸方向中央領域で放出開口の外縁部に対峙させて位置する第1及び第2の両規制部と、X軸方向両端部で放出開口の外縁部に位置する第3の規制部とを備えることを特徴とする請求項5記載の真空蒸着装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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JP2019090499 | 2019-05-13 | ||
JP2019090499 | 2019-05-13 | ||
PCT/JP2019/051373 WO2020230359A1 (ja) | 2019-05-13 | 2019-12-27 | 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 |
Related Child Applications (1)
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JP2020095941A Division JP2020186469A (ja) | 2019-05-13 | 2020-06-02 | 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 |
Publications (2)
Publication Number | Publication Date |
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JP6713093B1 true JP6713093B1 (ja) | 2020-06-24 |
JPWO2020230359A1 JPWO2020230359A1 (ja) | 2021-05-20 |
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JP2020520683A Active JP6713093B1 (ja) | 2019-05-13 | 2019-12-27 | 蒸着ユニット及びこの蒸着ユニットを備える真空蒸着装置 |
Country Status (4)
Country | Link |
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US (1) | US20220145443A1 (ja) |
JP (1) | JP6713093B1 (ja) |
KR (1) | KR20220007159A (ja) |
SG (1) | SG11202111356VA (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004035964A (ja) * | 2002-07-04 | 2004-02-05 | Tokki Corp | 蒸着装置 |
JP2005029837A (ja) * | 2003-07-11 | 2005-02-03 | Showa Shinku:Kk | 真空蒸着装置の蒸発源移動機構 |
JP2011168805A (ja) * | 2010-02-16 | 2011-09-01 | Hitachi High-Technologies Corp | 蒸発源及びこれを用いた真空蒸着装置 |
WO2011158453A1 (ja) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | 薄膜の製造方法 |
JP2015021169A (ja) * | 2013-07-19 | 2015-02-02 | 株式会社日立ハイテクノロジーズ | 蒸着装置及び蒸着方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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GB9323033D0 (en) * | 1993-11-09 | 1994-01-05 | Gen Vacuum Equip Ltd | Evaporator for vacuum web coating |
GB9515929D0 (en) * | 1995-08-03 | 1995-10-04 | Fisons Plc | Sources used in molecular beam epitaxy |
JP3858437B2 (ja) * | 1998-04-13 | 2006-12-13 | ソニー株式会社 | 真空薄膜形成装置 |
KR20150008927A (ko) * | 2012-06-29 | 2015-01-23 | 가부시키가이샤 알박 | 성막 장치 |
KR102046440B1 (ko) | 2012-10-09 | 2019-11-20 | 삼성디스플레이 주식회사 | 증착 장치 및 이를 이용한 유기 발광 표시장치의 제조방법 |
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2019
- 2019-12-27 KR KR1020217040544A patent/KR20220007159A/ko unknown
- 2019-12-27 SG SG11202111356VA patent/SG11202111356VA/en unknown
- 2019-12-27 JP JP2020520683A patent/JP6713093B1/ja active Active
- 2019-12-27 US US17/605,106 patent/US20220145443A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004035964A (ja) * | 2002-07-04 | 2004-02-05 | Tokki Corp | 蒸着装置 |
JP2005029837A (ja) * | 2003-07-11 | 2005-02-03 | Showa Shinku:Kk | 真空蒸着装置の蒸発源移動機構 |
JP2011168805A (ja) * | 2010-02-16 | 2011-09-01 | Hitachi High-Technologies Corp | 蒸発源及びこれを用いた真空蒸着装置 |
WO2011158453A1 (ja) * | 2010-06-16 | 2011-12-22 | パナソニック株式会社 | 薄膜の製造方法 |
JP2015021169A (ja) * | 2013-07-19 | 2015-02-02 | 株式会社日立ハイテクノロジーズ | 蒸着装置及び蒸着方法 |
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US20220145443A1 (en) | 2022-05-12 |
JPWO2020230359A1 (ja) | 2021-05-20 |
SG11202111356VA (en) | 2021-12-30 |
KR20220007159A (ko) | 2022-01-18 |
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