JP6762460B1 - 真空蒸着装置用の蒸着源 - Google Patents
真空蒸着装置用の蒸着源 Download PDFInfo
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- JP6762460B1 JP6762460B1 JP2020541465A JP2020541465A JP6762460B1 JP 6762460 B1 JP6762460 B1 JP 6762460B1 JP 2020541465 A JP2020541465 A JP 2020541465A JP 2020541465 A JP2020541465 A JP 2020541465A JP 6762460 B1 JP6762460 B1 JP 6762460B1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/568—Transferring the substrates through a series of coating stations
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
Description
の分岐管部64が突設され、開閉扉Ed2を閉じた状態では、主筒体6の内部雰囲気は、分岐管部64のみが連通する対象となっている。分岐管部64は、第1の支持プレート21に設けた透孔21に挿通してその先端が真空処理室Msまで突出している。分岐管部64のZ軸方向の高さ位置は、少なくとも坩堝部61内に充填される蒸着材料Emの上層部分より上方に位置するように設定されている。主筒体6内にはまた、加熱手段としてのシースヒータ8a(発熱体)が設けられ、シースヒータ8aに図外の電源から通電することで、坩堝部61内の蒸着材料Emだけでなく、主筒体6内の内面や蓋体62をその全面に亘って加熱できるようにしている。
Claims (3)
- 真空チャンバ内で成膜対象物に対して蒸着するための真空蒸着装置用の蒸着源において、
長手方向が鉛直方向に合致する姿勢で設置され、蒸着材料が充填される坩堝部を有する主筒体と、坩堝部内に充填される蒸着材料より上方に位置する主筒体の部分に突設され、放出開口を有する副筒体と、少なくとも坩堝部に充填される蒸着材料の加熱を可能とする加熱手段とを備え、
副筒体が放出開口の位相を変えて主筒体に着脱自在に取り付けでき、
坩堝部の上面開口を開閉自在に閉塞する蓋体が設けられ、
真空雰囲気中にて坩堝部の上面開口を蓋体で閉塞した状態で加熱手段により坩堝部内の蒸着材料を加熱して蒸着材料を昇華または気化させ、蓋体を開放したときに、昇華または気化した蒸着材料がその蒸気圧を保ちつつ副筒体に移送されて放出開口から放出されるように構成したことを特徴とする真空蒸着装置用の蒸着源。 - 請求項1記載の真空蒸着装置用の蒸着源であって、前記放出開口が一方向に長手のスリット孔で構成されるものにおいて、
前記副筒体内に、副筒体に移送された昇華または気化した蒸着材料を放出開口に導く分布孔が形成された分布板が挿設されることを特徴とする真空蒸着装置用の蒸着源。 - 前記加熱手段が前記副筒体内に設けられる発熱体を更に備えることを特徴とする請求項1または請求項2記載の真空蒸着装置用の蒸着源。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019184125 | 2019-10-04 | ||
JP2019184125 | 2019-10-04 | ||
PCT/JP2020/022080 WO2021065081A1 (ja) | 2019-10-04 | 2020-06-04 | 真空蒸着装置用の蒸着源 |
Publications (2)
Publication Number | Publication Date |
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JP6762460B1 true JP6762460B1 (ja) | 2020-09-30 |
JPWO2021065081A1 JPWO2021065081A1 (ja) | 2021-11-11 |
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JP2020541465A Active JP6762460B1 (ja) | 2019-10-04 | 2020-06-04 | 真空蒸着装置用の蒸着源 |
Country Status (4)
Country | Link |
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US (1) | US20220316047A1 (ja) |
JP (1) | JP6762460B1 (ja) |
KR (1) | KR20220079605A (ja) |
CN (1) | CN114836720A (ja) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004100002A (ja) * | 2002-09-11 | 2004-04-02 | Ulvac Japan Ltd | 蒸発源及びこれを用いた薄膜形成装置 |
JP2008150649A (ja) * | 2006-12-15 | 2008-07-03 | Tokki Corp | 真空蒸着装置 |
JP2010533790A (ja) * | 2007-07-19 | 2010-10-28 | アプライド マテリアルズ インコーポレイテッド | 固体材料のための真空蒸着装置 |
JP2012122104A (ja) * | 2010-12-09 | 2012-06-28 | Panasonic Corp | 加熱蒸着装置 |
JP2019515132A (ja) * | 2016-04-25 | 2019-06-06 | イノベイティブ アドバンスド マテリアルズ,インク.Innovative Advanced Materials,Inc. | 流出セル、流出セルを含む蒸着システム、及び関連方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
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US5543159A (en) | 1994-09-15 | 1996-08-06 | General Motors Of Canada Limited | Flash-proof rim mold and method of making |
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2020
- 2020-06-04 KR KR1020227015050A patent/KR20220079605A/ko unknown
- 2020-06-04 CN CN202210599823.5A patent/CN114836720A/zh active Pending
- 2020-06-04 US US17/764,866 patent/US20220316047A1/en active Pending
- 2020-06-04 JP JP2020541465A patent/JP6762460B1/ja active Active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004100002A (ja) * | 2002-09-11 | 2004-04-02 | Ulvac Japan Ltd | 蒸発源及びこれを用いた薄膜形成装置 |
JP2008150649A (ja) * | 2006-12-15 | 2008-07-03 | Tokki Corp | 真空蒸着装置 |
JP2010533790A (ja) * | 2007-07-19 | 2010-10-28 | アプライド マテリアルズ インコーポレイテッド | 固体材料のための真空蒸着装置 |
JP2012122104A (ja) * | 2010-12-09 | 2012-06-28 | Panasonic Corp | 加熱蒸着装置 |
JP2019515132A (ja) * | 2016-04-25 | 2019-06-06 | イノベイティブ アドバンスド マテリアルズ,インク.Innovative Advanced Materials,Inc. | 流出セル、流出セルを含む蒸着システム、及び関連方法 |
Also Published As
Publication number | Publication date |
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JPWO2021065081A1 (ja) | 2021-11-11 |
CN114836720A (zh) | 2022-08-02 |
US20220316047A1 (en) | 2022-10-06 |
KR20220079605A (ko) | 2022-06-13 |
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