JP2020200487A - 真空蒸着装置用の蒸着源 - Google Patents
真空蒸着装置用の蒸着源 Download PDFInfo
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- JP2020200487A JP2020200487A JP2019105712A JP2019105712A JP2020200487A JP 2020200487 A JP2020200487 A JP 2020200487A JP 2019105712 A JP2019105712 A JP 2019105712A JP 2019105712 A JP2019105712 A JP 2019105712A JP 2020200487 A JP2020200487 A JP 2020200487A
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- vapor deposition
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- vaporized
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- 238000007740 vapor deposition Methods 0.000 title claims abstract description 124
- 239000000463 material Substances 0.000 claims abstract description 108
- 238000010438 heat treatment Methods 0.000 claims abstract description 45
- 238000007599 discharging Methods 0.000 claims abstract description 10
- 239000011364 vaporized material Substances 0.000 claims description 35
- 239000007787 solid Substances 0.000 claims description 13
- 239000007791 liquid phase Substances 0.000 claims description 8
- 239000012071 phase Substances 0.000 claims description 5
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 2
- 238000000151 deposition Methods 0.000 abstract description 3
- 239000000758 substrate Substances 0.000 description 57
- 239000010409 thin film Substances 0.000 description 16
- 238000000427 thin-film deposition Methods 0.000 description 12
- 239000007789 gas Substances 0.000 description 10
- 238000009834 vaporization Methods 0.000 description 9
- 230000008016 vaporization Effects 0.000 description 9
- 230000007423 decrease Effects 0.000 description 7
- 239000011261 inert gas Substances 0.000 description 7
- 239000008186 active pharmaceutical agent Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000008022 sublimation Effects 0.000 description 3
- 238000000859 sublimation Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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Abstract
Description
Claims (3)
- 真空チャンバ内で被蒸着物に対して蒸着するための真空蒸着装置用の蒸着源において、
真空チャンバ内に存して昇華または気化した蒸着材料を被蒸着物に向けて放出する放出開口を有する放出手段と、真空チャンバ外に存して蒸着材料を放出手段に供給する供給手段とを備え、
供給手段は、固体の蒸着材料を収容する第1収容箱と、第1収容箱内を大気圧より高い圧力に加圧する加圧手段と、蒸着材料を加熱する第1加熱手段とを有し、第1収容箱内の加圧下で加熱して蒸着材料を昇華、気化または液化させて、放出手段と供給手段とを連通する供給管を介して放出手段に供給するように構成したことを特徴とする真空蒸着装置用の蒸着源。 - 請求項1記載の真空蒸着装置用の蒸着源であって、前記蒸着材料が加熱時に液相を経て気相に転移するものにおいて、
前記放出手段は、固体の蒸着材料を収容可能な第2収容箱と、第2収容箱に連通し、前記放出開口を有する放出箱と、蒸着材料を加熱する第2加熱手段とを備え、
第2収容箱内で液化させた蒸着材料が前記供給管を介して第1収容箱に供給されるように構成したことを特徴とする真空蒸着装置用の蒸着源。 - 前記第2収容箱内を所定圧力に調整する圧力調整弁を更に備えることを特徴とする請求項2記載の真空蒸着装置用の蒸着源。
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JP2019105712A JP7312023B2 (ja) | 2019-06-05 | 2019-06-05 | 真空蒸着装置用の蒸着源 |
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JP2019105712A JP7312023B2 (ja) | 2019-06-05 | 2019-06-05 | 真空蒸着装置用の蒸着源 |
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JP2020200487A true JP2020200487A (ja) | 2020-12-17 |
JP7312023B2 JP7312023B2 (ja) | 2023-07-20 |
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JP2019105712A Active JP7312023B2 (ja) | 2019-06-05 | 2019-06-05 | 真空蒸着装置用の蒸着源 |
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Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2003085157A1 (fr) * | 2002-04-05 | 2003-10-16 | Matsushita Electric Industrial Co., Ltd. | Procede et dispositif pour preparer un film de resine mince |
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Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2003085157A1 (fr) * | 2002-04-05 | 2003-10-16 | Matsushita Electric Industrial Co., Ltd. | Procede et dispositif pour preparer un film de resine mince |
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