KR101042065B1 - 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지센서 - Google Patents

방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지센서 Download PDF

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KR101042065B1
KR101042065B1 KR1020080055234A KR20080055234A KR101042065B1 KR 101042065 B1 KR101042065 B1 KR 101042065B1 KR 1020080055234 A KR1020080055234 A KR 1020080055234A KR 20080055234 A KR20080055234 A KR 20080055234A KR 101042065 B1 KR101042065 B1 KR 101042065B1
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film
radiation
scintillator
aluminum substrate
metal film
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KR20080110507A (ko
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다카하루 스즈키
유타카 구수야마
마사노리 야마시타
가즈히로 시라카와
도시오 다카바야시
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하마마츠 포토닉스 가부시키가이샤
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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
    • H10F30/20—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors
    • H10F30/29—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices having potential barriers, e.g. phototransistors the devices being sensitive to radiation having very short wavelengths, e.g. X-rays, gamma-rays or corpuscular radiation
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01T—MEASUREMENT OF NUCLEAR OR X-RADIATION
    • G01T1/00—Measuring X-radiation, gamma radiation, corpuscular radiation, or cosmic radiation
    • G01T1/16—Measuring radiation intensity
    • G01T1/20—Measuring radiation intensity with scintillation detectors

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Molecular Biology (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Measurement Of Radiation (AREA)
  • Conversion Of X-Rays Into Visible Images (AREA)
KR1020080055234A 2007-06-15 2008-06-12 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지센서 Active KR101042065B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/812,233 US7468514B1 (en) 2007-06-15 2007-06-15 Radiation image conversion panel, scintillator panel, and radiation image sensor
US11/812,233 2007-06-15

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KR1020110010623A Division KR101294870B1 (ko) 2007-06-15 2011-02-07 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지 센서

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KR20080110507A KR20080110507A (ko) 2008-12-18
KR101042065B1 true KR101042065B1 (ko) 2011-06-16

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KR1020080055234A Active KR101042065B1 (ko) 2007-06-15 2008-06-12 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지센서
KR1020110010623A Active KR101294870B1 (ko) 2007-06-15 2011-02-07 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지 센서
KR1020120054990A Active KR101294880B1 (ko) 2007-06-15 2012-05-23 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지 센서

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KR1020120054990A Active KR101294880B1 (ko) 2007-06-15 2012-05-23 방사선상 변환 패널, 신틸레이터 패널 및 방사선 이미지 센서

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US (2) US7468514B1 (enExample)
JP (1) JP4317251B2 (enExample)
KR (3) KR101042065B1 (enExample)
CN (2) CN102819032B (enExample)
CA (1) CA2633667C (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1645671B2 (de) * 2004-10-08 2019-10-23 SGL Carbon SE Polymergebundene fasergelege
CN101604118B (zh) * 2008-12-31 2012-07-04 中国工程物理研究院流体物理研究所 一种将高能x射线图像转换为可见光图像的装置
WO2010103917A1 (ja) 2009-03-13 2010-09-16 コニカミノルタエムジー株式会社 放射線検出装置
US8957380B2 (en) * 2009-06-30 2015-02-17 Avago Technologies General Ip (Singapore) Pte. Ltd. Infrared attenuating or blocking layer in optical proximity sensor
JP5577644B2 (ja) * 2009-08-05 2014-08-27 コニカミノルタ株式会社 放射線画像検出装置およびその製造方法
JP2011137665A (ja) * 2009-12-26 2011-07-14 Canon Inc シンチレータパネル及び放射線撮像装置とその製造方法、ならびに放射線撮像システム
GB2477346B (en) * 2010-02-01 2016-03-23 Scintacor Ltd Scintillator assembly for use in digital x-ray imaging
JP5801891B2 (ja) 2010-07-30 2015-10-28 パルセータ, エルエルシーPulsetor, Llc 電子イメージングを用いて試料の画像を作成する荷電粒子線装置及び方法
EP2739958B1 (en) 2011-08-05 2016-01-20 Pulsetor, LLC Electron detector including one or more intimately-coupled scintillator-photomultiplier combinations, and electron microscope employing same
US8829454B2 (en) 2012-02-27 2014-09-09 Analog Devices, Inc. Compact sensor module
JP5922518B2 (ja) * 2012-07-20 2016-05-24 浜松ホトニクス株式会社 シンチレータパネル及び放射線検出器
US9116022B2 (en) 2012-12-07 2015-08-25 Analog Devices, Inc. Compact sensor module
KR101455382B1 (ko) * 2012-12-26 2014-10-27 한국전기연구원 휘진성 형광체를 이용한 하이브리드 엑스-선 검출 장치
EP3197983B1 (en) 2014-09-25 2023-06-07 Koninklijke Philips N.V. Detection device for detecting gamma or x-ray radiation
KR101601530B1 (ko) * 2014-11-06 2016-03-09 현대자동차주식회사 전파 투과형 다층 광학막
US10670741B2 (en) * 2015-03-20 2020-06-02 Varex Imaging Corporation Scintillator
WO2016167334A1 (ja) * 2015-04-16 2016-10-20 三菱化学株式会社 放射線像変換スクリーン、フラットパネルディテクタ、放射線検出装置、及びシンチレータ
US10074624B2 (en) 2015-08-07 2018-09-11 Analog Devices, Inc. Bond pads with differently sized openings
JP6504997B2 (ja) 2015-11-05 2019-04-24 浜松ホトニクス株式会社 放射線像変換パネル、放射線像変換パネルの製造方法、放射線イメージセンサ及び放射線イメージセンサの製造方法
JP6676372B2 (ja) * 2015-12-28 2020-04-08 株式会社Ｓ−Ｎａｎｏｔｅｃｈ Ｃｏ−Ｃｒｅａｔｉｏｎ シンチレータ及び電子検出器
DE112017003014B4 (de) 2016-06-16 2025-03-06 Ngk Insulators, Ltd. Leuchtstoffvorrichtung und Fluoreszenz aussendende Beleuchtungsvorrichtung
JP6534497B2 (ja) * 2017-03-22 2019-06-26 富士フイルム株式会社 放射線検出器及び放射線画像撮影装置
JP6707130B2 (ja) * 2017-03-22 2020-06-10 富士フイルム株式会社 放射線検出器及び放射線画像撮影装置
US11056455B2 (en) 2017-08-01 2021-07-06 Analog Devices, Inc. Negative fillet for mounting an integrated device die to a carrier
JP6433560B1 (ja) 2017-09-27 2018-12-05 浜松ホトニクス株式会社 シンチレータパネル及び放射線検出器
JP6433561B1 (ja) * 2017-09-27 2018-12-05 浜松ホトニクス株式会社 シンチレータパネル及び放射線検出器
WO2020118102A1 (en) 2018-12-06 2020-06-11 Analog Devices, Inc. Shielded integrated device packages
EP3891793A4 (en) 2018-12-06 2022-10-05 Analog Devices, Inc. INTEGRATED DEVICE PACKAGES WITH PASSIVE DEVICE ARRANGEMENTS
JP7057299B2 (ja) 2019-02-21 2022-04-19 ニチバン株式会社 伸縮性パッドを用いた医療用貼付材
JP2021032817A (ja) * 2019-08-28 2021-03-01 キヤノン電子管デバイス株式会社 シンチレータパネル、および放射線検出器
US11664340B2 (en) 2020-07-13 2023-05-30 Analog Devices, Inc. Negative fillet for mounting an integrated device die to a carrier
CN115107135A (zh) * 2021-03-22 2022-09-27 云南传承木业有限公司 一种无醛强化木地板的制作方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010110762A (ko) * 1999-04-16 2001-12-13 테루오 히루마 신틸레이터 패널 및 방사선 이미지 센서
KR20030072606A (ko) * 2001-01-30 2003-09-15 하마마츠 포토닉스 가부시키가이샤 신틸레이터 패널 및 방사선 이미지 센서
US6692836B2 (en) 2000-12-20 2004-02-17 Alanod Aluminium-Veredlung Gmbh & Co. Kg Composite material
JP2006119124A (ja) 2004-09-22 2006-05-11 Fuji Photo Film Co Ltd 放射線像変換パネルおよびその製造方法

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5689702A (en) 1979-12-21 1981-07-21 Sumitomo Electric Ind Ltd Laser beam reflecting mirror
JPS5889702A (ja) 1981-11-20 1983-05-28 松下電器産業株式会社 導電性ペ−スト
JPS6173901A (ja) 1984-09-19 1986-04-16 Fujitsu Ltd 赤外線検知装置用金属鏡の製造方法
DE3578359D1 (de) * 1984-12-17 1990-07-26 Konishiroku Photo Ind Schirm zum speichern eines strahlungsbildes.
US4873708A (en) * 1987-05-11 1989-10-10 General Electric Company Digital radiographic imaging system and method therefor
JP2677818B2 (ja) 1987-08-17 1997-11-17 コニカ株式会社 放射線画像変換パネル
JPH04118599A (ja) 1990-09-10 1992-04-20 Fujitsu Ltd Ｘ線画像変換シートおよびそのシートを用いる装置
US5949848A (en) 1996-07-19 1999-09-07 Varian Assocaites, Inc. X-ray imaging apparatus and method using a flat amorphous silicon imaging panel
EP1156346B1 (en) * 1998-06-18 2006-10-04 Hamamatsu Photonics K.K. Scintillator panel and radiation image sensor
CN1144064C (zh) 1998-06-18 2004-03-31 浜松光子学株式会社 有机膜蒸镀方法
AU4168199A (en) 1998-06-18 2000-01-05 Hamamatsu Photonics K.K. Scintillator panel, radiation image sensor, and method for producing the same
US7034306B2 (en) 1998-06-18 2006-04-25 Hamamatsu Photonics K.K. Scintillator panel and radiation image sensor
DE69927522T2 (de) 1998-06-18 2006-07-13 Hamamatsu Photonics K.K., Hamamatsu Strahlungsbildsensor und verfahren zu dessen herstellung
CN1161625C (zh) 1999-04-09 2004-08-11 浜松光子学株式会社 闪烁体面板和射线图象传感器
JP3126715B2 (ja) * 1999-04-16 2001-01-22 浜松ホトニクス株式会社 シンチレータパネル及び放射線イメージセンサ
WO2002023220A1 (en) 2000-09-11 2002-03-21 Hamamatsu Photonics K.K. Scintillator panel, radiation image sensor and methods of producing them
US7087908B2 (en) 2000-09-11 2006-08-08 Hamamatsu Photonics K.K. Scintillator panel, radiation image sensor and methods of producing them
DE20021657U1 (de) 2000-12-20 2002-05-02 Alanod Aluminium Veredlung Gmb Abdeckteil für eine Lichtquelle
US6835936B2 (en) 2001-02-07 2004-12-28 Canon Kabushiki Kaisha Scintillator panel, method of manufacturing scintillator panel, radiation detection device, and radiation detection system
US6652996B2 (en) * 2002-01-31 2003-11-25 Eastman Kodak Company Radiographic phosphor panel having improved speed and sharpness
JP2003262700A (ja) * 2002-03-08 2003-09-19 Konica Corp 放射線画像変換パネル及び放射線画像変換パネルの作製方法
JP4118599B2 (ja) 2002-05-20 2008-07-16 三菱電機株式会社 ダイバーシチ受信機および受信方法
JP4451843B2 (ja) 2003-03-07 2010-04-14 浜松ホトニクス株式会社 シンチレータパネルの製造方法及び放射線イメージセンサの製造方法
JP2004294137A (ja) * 2003-03-26 2004-10-21 Konica Minolta Holdings Inc 放射線像変換パネル及びその製造方法
JP2004325126A (ja) * 2003-04-22 2004-11-18 Canon Inc 放射線検出装置
JP3848288B2 (ja) * 2003-04-25 2006-11-22 キヤノン株式会社 放射線画像撮影装置
JP2005029895A (ja) * 2003-07-04 2005-02-03 Agfa Gevaert Nv 蒸着装置
JP2005091221A (ja) 2003-09-18 2005-04-07 Fuji Photo Film Co Ltd 放射線像変換器
JP2005172511A (ja) * 2003-12-09 2005-06-30 Canon Inc 放射線検出装置、その製造方法、および放射線撮像システム
JP2005181220A (ja) * 2003-12-22 2005-07-07 Fuji Photo Film Co Ltd 放射線像変換パネル
JP4594188B2 (ja) * 2004-08-10 2010-12-08 キヤノン株式会社 放射線検出装置及び放射線検出システム
US20060060792A1 (en) 2004-09-22 2006-03-23 Fuji Photo Film Co., Ltd. Radiographic image conversion panel and method of manufacturing the same
JP2006113007A (ja) 2004-10-18 2006-04-27 Konica Minolta Medical & Graphic Inc 放射線画像変換パネル
JPWO2006049183A1 (ja) * 2004-11-01 2008-05-29 マークテクノロジー株式会社 放射線画像撮像装置
JP2006189377A (ja) * 2005-01-07 2006-07-20 Canon Inc シンチレータパネル、放射線検出装置、及び放射線検出システム
JP2006220439A (ja) * 2005-02-08 2006-08-24 Canon Inc シンチレータパネル、放射線検出装置及びその製造方法
JP2006267013A (ja) * 2005-03-25 2006-10-05 Fuji Photo Film Co Ltd 輝尽性蛍光体パネル及び輝尽性蛍光体パネルの製造方法
JP2007040836A (ja) * 2005-08-03 2007-02-15 Fujifilm Corp 放射線像変換パネル
RU2298813C1 (ru) 2005-12-26 2007-05-10 Федеральное государственное унитарное предприятие "Научно-исследовательский институт импульсной техники" (ФГУП НИИИТ) Волоконно-оптическое устройство для визуализации распределения плотности потока импульсного ионизирующего излучения
KR100745991B1 (ko) 2006-08-11 2007-08-06 삼성전자주식회사 이미지 센서 및 그 제조 방법

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010110762A (ko) * 1999-04-16 2001-12-13 테루오 히루마 신틸레이터 패널 및 방사선 이미지 센서
US6692836B2 (en) 2000-12-20 2004-02-17 Alanod Aluminium-Veredlung Gmbh & Co. Kg Composite material
KR20030072606A (ko) * 2001-01-30 2003-09-15 하마마츠 포토닉스 가부시키가이샤 신틸레이터 패널 및 방사선 이미지 센서
JP2006119124A (ja) 2004-09-22 2006-05-11 Fuji Photo Film Co Ltd 放射線像変換パネルおよびその製造方法

Also Published As

Publication number Publication date
KR101294870B1 (ko) 2013-08-08
US20090072160A1 (en) 2009-03-19
KR101294880B1 (ko) 2013-08-08
KR20110031442A (ko) 2011-03-28
US7468514B1 (en) 2008-12-23
CA2633667C (en) 2012-03-13
US20080308736A1 (en) 2008-12-18
JP2008309770A (ja) 2008-12-25
JP4317251B2 (ja) 2009-08-19
CN101324671B (zh) 2012-10-03
US7812315B2 (en) 2010-10-12
CN101324671A (zh) 2008-12-17
KR20120081045A (ko) 2012-07-18
CA2633667A1 (en) 2008-12-15
CN102819032A (zh) 2012-12-12
CN102819032B (zh) 2015-11-25
KR20080110507A (ko) 2008-12-18

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