KR101022587B1 - 경화성 실리콘 수지 조성물 - Google Patents
경화성 실리콘 수지 조성물 Download PDFInfo
- Publication number
- KR101022587B1 KR101022587B1 KR1020040074588A KR20040074588A KR101022587B1 KR 101022587 B1 KR101022587 B1 KR 101022587B1 KR 1020040074588 A KR1020040074588 A KR 1020040074588A KR 20040074588 A KR20040074588 A KR 20040074588A KR 101022587 B1 KR101022587 B1 KR 101022587B1
- Authority
- KR
- South Korea
- Prior art keywords
- group
- formula
- substituted
- silicone resin
- unsubstituted
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 CO[Si](c(cc1)ccc1[Si+](*)OC)OC Chemical compound CO[Si](c(cc1)ccc1[Si+](*)OC)OC 0.000 description 2
- FTTHGZFWJARJSC-UHFFFAOYSA-N C[SiH+](C)c(cc1)ccc1[SiH+](C)CI Chemical compound C[SiH+](C)c(cc1)ccc1[SiH+](C)CI FTTHGZFWJARJSC-UHFFFAOYSA-N 0.000 description 1
- UOYVOQUYPMAIID-UHFFFAOYSA-N C[SiH+](C)c1cc([SiH+](C)CI)ccc1 Chemical compound C[SiH+](C)c1cc([SiH+](C)CI)ccc1 UOYVOQUYPMAIID-UHFFFAOYSA-N 0.000 description 1
- PQNVKHCDSQTRIR-UHFFFAOYSA-N C[SiH](C)Cc1cc(C[SiH+](C)C)ccc1 Chemical compound C[SiH](C)Cc1cc(C[SiH+](C)C)ccc1 PQNVKHCDSQTRIR-UHFFFAOYSA-N 0.000 description 1
- LJOXPQKRDFFHLM-UHFFFAOYSA-N C[SiH](C)Cc1ccc(C[SiH+](C)C)cc1 Chemical compound C[SiH](C)Cc1ccc(C[SiH+](C)C)cc1 LJOXPQKRDFFHLM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/12—Polysiloxanes containing silicon bound to hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
- C08G77/18—Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K2201/00—Specific properties of additives
- C08K2201/014—Additives containing two or more different additives of the same subgroup in C08K
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/5403—Silicon-containing compounds containing no other elements than carbon or hydrogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Silicon Polymers (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPJP-P-2003-00327372 | 2003-09-19 | ||
| JP2003327372A JP2005089671A (ja) | 2003-09-19 | 2003-09-19 | 硬化性シリコーン樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050028843A KR20050028843A (ko) | 2005-03-23 |
| KR101022587B1 true KR101022587B1 (ko) | 2011-03-16 |
Family
ID=34308779
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020040074588A Expired - Fee Related KR101022587B1 (ko) | 2003-09-19 | 2004-09-17 | 경화성 실리콘 수지 조성물 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7294682B2 (enExample) |
| EP (1) | EP1524554A3 (enExample) |
| JP (1) | JP2005089671A (enExample) |
| KR (1) | KR101022587B1 (enExample) |
| TW (1) | TW200512256A (enExample) |
Families Citing this family (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4520251B2 (ja) * | 2003-10-10 | 2010-08-04 | 信越化学工業株式会社 | 硬化性組成物 |
| JP2005272697A (ja) | 2004-03-25 | 2005-10-06 | Shin Etsu Chem Co Ltd | 硬化性シリコーン樹脂組成物、光半導体用封止材および光半導体装置 |
| ATE442417T1 (de) * | 2004-11-19 | 2009-09-15 | Dow Corning | Silikonzusammensetzung und gehärtetes silikonharz |
| JP4844732B2 (ja) * | 2005-05-24 | 2011-12-28 | 信越化学工業株式会社 | 発光半導体装置 |
| JP4648099B2 (ja) * | 2005-06-07 | 2011-03-09 | 信越化学工業株式会社 | ダイボンディング用シリコーン樹脂組成物 |
| EP1749861B1 (en) * | 2005-08-03 | 2014-08-20 | Shin-Etsu Chemical Co., Ltd. | Addition curable silicone resin composition for light emitting diode |
| JP4648146B2 (ja) * | 2005-09-26 | 2011-03-09 | 信越化学工業株式会社 | 耐クラック性に優れた付加硬化型シリコーン組成物 |
| TW200732382A (en) * | 2005-12-22 | 2007-09-01 | Rohm & Haas | Siloxane encapsulants |
| DE602007000068D1 (de) * | 2006-02-20 | 2008-09-25 | Shinetsu Chemical Co | Hitzeerhärtbare Silikonzusammensetzung |
| US8207442B2 (en) * | 2006-04-18 | 2012-06-26 | Itn Energy Systems, Inc. | Reinforcing structures for thin-film photovoltaic device substrates, and associated methods |
| WO2007120905A2 (en) * | 2006-04-18 | 2007-10-25 | Dow Corning Corporation | Cadmium telluride-based photovoltaic device and method of preparing the same |
| EP2016625B1 (en) | 2006-04-18 | 2009-09-02 | Dow Corning Corporation | Copper indium diselenide-based photovoltaic device and method of preparing the same |
| ATE448569T1 (de) | 2006-04-18 | 2009-11-15 | Dow Corning | Fotovoltaische anordnung auf kupfer-indium- diselenidbasis und herstellungsverfahren dafür |
| JP2008069210A (ja) * | 2006-09-12 | 2008-03-27 | Shin Etsu Chem Co Ltd | 多環式炭化水素基含有シリコーン系硬化性組成物 |
| WO2008036769A2 (en) * | 2006-09-19 | 2008-03-27 | Itn Energy Systems, Inc. | Semi-transparent dual layer back contact for bifacial and tandem junction thin-film photovolataic devices |
| JP5279197B2 (ja) * | 2007-05-07 | 2013-09-04 | 信越化学工業株式会社 | 硬化性有機ケイ素組成物およびその硬化物 |
| JP2008274184A (ja) * | 2007-05-07 | 2008-11-13 | Shin Etsu Chem Co Ltd | ケイ素原子に結合した水素原子を有する多環式炭化水素基含有有機ケイ素化合物およびその製造方法 |
| CN101215381B (zh) * | 2008-01-14 | 2011-02-16 | 杭州师范大学 | 一种甲基苯基含氢硅油的制备方法 |
| CN101544834B (zh) * | 2008-03-25 | 2011-09-28 | 广东标美硅氟新材料有限公司 | 冷缩式电力硅橡胶套管的制备方法及其用途 |
| JP5087752B2 (ja) | 2008-12-17 | 2012-12-05 | 信越化学工業株式会社 | β−ケトエステル基含オルガノポリシロキサン化合物 |
| JP2012046604A (ja) * | 2010-08-26 | 2012-03-08 | Shin-Etsu Chemical Co Ltd | 多環式炭化水素骨格含有成分を含む硬化性シリコーン系組成物 |
| TWI522423B (zh) * | 2010-08-31 | 2016-02-21 | 道康寧東麗股份有限公司 | 聚矽氧烷組合物及其硬化物 |
| JP5522116B2 (ja) * | 2011-04-28 | 2014-06-18 | 信越化学工業株式会社 | 付加硬化型シリコーン組成物及びそれを用いた光半導体装置 |
| JP5985981B2 (ja) | 2012-12-28 | 2016-09-06 | 東レ・ダウコーニング株式会社 | 硬化性シリコーン組成物、その硬化物、および光半導体装置 |
| WO2016152073A1 (en) * | 2015-03-20 | 2016-09-29 | Dow Corning Toray Co., Ltd. | Organopolysiloxane, production method thereof, and curable silicone composition |
| JP6520851B2 (ja) * | 2016-07-15 | 2019-05-29 | 信越化学工業株式会社 | シリコーンゲル組成物 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000231002A (ja) | 1999-02-10 | 2000-08-22 | Konica Corp | 光学用レンズ |
| US6509423B1 (en) * | 2001-08-21 | 2003-01-21 | Dow Corning Corporation | Silicone composition and cured silicone product |
| US20030171476A1 (en) | 2002-03-05 | 2003-09-11 | Zhongtao Li | Hydrosilyation cured silicone resin containing colloidal silica and a process for producing the same |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1022849A (ja) | 1996-06-28 | 1998-01-23 | Niles Parts Co Ltd | Fm文字多重放送受信装置 |
| TW383508B (en) | 1996-07-29 | 2000-03-01 | Nichia Kagaku Kogyo Kk | Light emitting device and display |
| US6608332B2 (en) | 1996-07-29 | 2003-08-19 | Nichia Kagaku Kogyo Kabushiki Kaisha | Light emitting device and display |
| JP4286935B2 (ja) | 1998-10-14 | 2009-07-01 | 株式会社朝日ラバー | 調色照明装置 |
| US6310146B1 (en) * | 1999-07-01 | 2001-10-30 | Dow Corning Corporation | Silsesquioxane resin with high strength and fracture toughness and method for the preparation thereof |
-
2003
- 2003-09-19 JP JP2003327372A patent/JP2005089671A/ja active Pending
-
2004
- 2004-06-25 TW TW093118661A patent/TW200512256A/zh not_active IP Right Cessation
- 2004-09-17 US US10/942,837 patent/US7294682B2/en not_active Expired - Lifetime
- 2004-09-17 KR KR1020040074588A patent/KR101022587B1/ko not_active Expired - Fee Related
- 2004-09-17 EP EP04022238A patent/EP1524554A3/en not_active Withdrawn
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000231002A (ja) | 1999-02-10 | 2000-08-22 | Konica Corp | 光学用レンズ |
| US6509423B1 (en) * | 2001-08-21 | 2003-01-21 | Dow Corning Corporation | Silicone composition and cured silicone product |
| US20030171476A1 (en) | 2002-03-05 | 2003-09-11 | Zhongtao Li | Hydrosilyation cured silicone resin containing colloidal silica and a process for producing the same |
Also Published As
| Publication number | Publication date |
|---|---|
| US20050061437A1 (en) | 2005-03-24 |
| EP1524554A2 (en) | 2005-04-20 |
| TW200512256A (en) | 2005-04-01 |
| JP2005089671A (ja) | 2005-04-07 |
| US7294682B2 (en) | 2007-11-13 |
| TWI330654B (enExample) | 2010-09-21 |
| KR20050028843A (ko) | 2005-03-23 |
| EP1524554A3 (en) | 2008-05-21 |
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