KR101022587B1 - 경화성 실리콘 수지 조성물 - Google Patents

경화성 실리콘 수지 조성물 Download PDF

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Publication number
KR101022587B1
KR101022587B1 KR1020040074588A KR20040074588A KR101022587B1 KR 101022587 B1 KR101022587 B1 KR 101022587B1 KR 1020040074588 A KR1020040074588 A KR 1020040074588A KR 20040074588 A KR20040074588 A KR 20040074588A KR 101022587 B1 KR101022587 B1 KR 101022587B1
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South Korea
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group
formula
substituted
silicone resin
unsubstituted
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English (en)
Korean (ko)
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KR20050028843A (ko
Inventor
도모유끼 고또
에이이찌 다베이
아끼라 야마모또
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신에쓰 가가꾸 고교 가부시끼가이샤
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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/075Silicon-containing compounds
    • G03F7/0757Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04Polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/12Polysiloxanes containing silicon bound to hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/14Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/18Polysiloxanes containing silicon bound to oxygen-containing groups to alkoxy or aryloxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70Siloxanes defined by use of the MDTQ nomenclature
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00Specific properties of additives
    • C08K2201/014Additives containing two or more different additives of the same subgroup in C08K
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00Use of organic ingredients
    • C08K5/54Silicon-containing compounds
    • C08K5/5403Silicon-containing compounds containing no other elements than carbon or hydrogen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2205/00Polymer mixtures characterised by other features
    • C08L2205/02Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group

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  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
KR1020040074588A 2003-09-19 2004-09-17 경화성 실리콘 수지 조성물 Expired - Fee Related KR101022587B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00327372 2003-09-19
JP2003327372A JP2005089671A (ja) 2003-09-19 2003-09-19 硬化性シリコーン樹脂組成物

Publications (2)

Publication Number Publication Date
KR20050028843A KR20050028843A (ko) 2005-03-23
KR101022587B1 true KR101022587B1 (ko) 2011-03-16

Family

ID=34308779

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040074588A Expired - Fee Related KR101022587B1 (ko) 2003-09-19 2004-09-17 경화성 실리콘 수지 조성물

Country Status (5)

Country Link
US (1) US7294682B2 (enExample)
EP (1) EP1524554A3 (enExample)
JP (1) JP2005089671A (enExample)
KR (1) KR101022587B1 (enExample)
TW (1) TW200512256A (enExample)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4520251B2 (ja) * 2003-10-10 2010-08-04 信越化学工業株式会社 硬化性組成物
JP2005272697A (ja) 2004-03-25 2005-10-06 Shin Etsu Chem Co Ltd 硬化性シリコーン樹脂組成物、光半導体用封止材および光半導体装置
ATE442417T1 (de) * 2004-11-19 2009-09-15 Dow Corning Silikonzusammensetzung und gehärtetes silikonharz
JP4844732B2 (ja) * 2005-05-24 2011-12-28 信越化学工業株式会社 発光半導体装置
JP4648099B2 (ja) * 2005-06-07 2011-03-09 信越化学工業株式会社 ダイボンディング用シリコーン樹脂組成物
EP1749861B1 (en) * 2005-08-03 2014-08-20 Shin-Etsu Chemical Co., Ltd. Addition curable silicone resin composition for light emitting diode
JP4648146B2 (ja) * 2005-09-26 2011-03-09 信越化学工業株式会社 耐クラック性に優れた付加硬化型シリコーン組成物
TW200732382A (en) * 2005-12-22 2007-09-01 Rohm & Haas Siloxane encapsulants
DE602007000068D1 (de) * 2006-02-20 2008-09-25 Shinetsu Chemical Co Hitzeerhärtbare Silikonzusammensetzung
US8207442B2 (en) * 2006-04-18 2012-06-26 Itn Energy Systems, Inc. Reinforcing structures for thin-film photovoltaic device substrates, and associated methods
WO2007120905A2 (en) * 2006-04-18 2007-10-25 Dow Corning Corporation Cadmium telluride-based photovoltaic device and method of preparing the same
EP2016625B1 (en) 2006-04-18 2009-09-02 Dow Corning Corporation Copper indium diselenide-based photovoltaic device and method of preparing the same
ATE448569T1 (de) 2006-04-18 2009-11-15 Dow Corning Fotovoltaische anordnung auf kupfer-indium- diselenidbasis und herstellungsverfahren dafür
JP2008069210A (ja) * 2006-09-12 2008-03-27 Shin Etsu Chem Co Ltd 多環式炭化水素基含有シリコーン系硬化性組成物
WO2008036769A2 (en) * 2006-09-19 2008-03-27 Itn Energy Systems, Inc. Semi-transparent dual layer back contact for bifacial and tandem junction thin-film photovolataic devices
JP5279197B2 (ja) * 2007-05-07 2013-09-04 信越化学工業株式会社 硬化性有機ケイ素組成物およびその硬化物
JP2008274184A (ja) * 2007-05-07 2008-11-13 Shin Etsu Chem Co Ltd ケイ素原子に結合した水素原子を有する多環式炭化水素基含有有機ケイ素化合物およびその製造方法
CN101215381B (zh) * 2008-01-14 2011-02-16 杭州师范大学 一种甲基苯基含氢硅油的制备方法
CN101544834B (zh) * 2008-03-25 2011-09-28 广东标美硅氟新材料有限公司 冷缩式电力硅橡胶套管的制备方法及其用途
JP5087752B2 (ja) 2008-12-17 2012-12-05 信越化学工業株式会社 β−ケトエステル基含オルガノポリシロキサン化合物
JP2012046604A (ja) * 2010-08-26 2012-03-08 Shin-Etsu Chemical Co Ltd 多環式炭化水素骨格含有成分を含む硬化性シリコーン系組成物
TWI522423B (zh) * 2010-08-31 2016-02-21 道康寧東麗股份有限公司 聚矽氧烷組合物及其硬化物
JP5522116B2 (ja) * 2011-04-28 2014-06-18 信越化学工業株式会社 付加硬化型シリコーン組成物及びそれを用いた光半導体装置
JP5985981B2 (ja) 2012-12-28 2016-09-06 東レ・ダウコーニング株式会社 硬化性シリコーン組成物、その硬化物、および光半導体装置
WO2016152073A1 (en) * 2015-03-20 2016-09-29 Dow Corning Toray Co., Ltd. Organopolysiloxane, production method thereof, and curable silicone composition
JP6520851B2 (ja) * 2016-07-15 2019-05-29 信越化学工業株式会社 シリコーンゲル組成物

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000231002A (ja) 1999-02-10 2000-08-22 Konica Corp 光学用レンズ
US6509423B1 (en) * 2001-08-21 2003-01-21 Dow Corning Corporation Silicone composition and cured silicone product
US20030171476A1 (en) 2002-03-05 2003-09-11 Zhongtao Li Hydrosilyation cured silicone resin containing colloidal silica and a process for producing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1022849A (ja) 1996-06-28 1998-01-23 Niles Parts Co Ltd Fm文字多重放送受信装置
TW383508B (en) 1996-07-29 2000-03-01 Nichia Kagaku Kogyo Kk Light emitting device and display
US6608332B2 (en) 1996-07-29 2003-08-19 Nichia Kagaku Kogyo Kabushiki Kaisha Light emitting device and display
JP4286935B2 (ja) 1998-10-14 2009-07-01 株式会社朝日ラバー 調色照明装置
US6310146B1 (en) * 1999-07-01 2001-10-30 Dow Corning Corporation Silsesquioxane resin with high strength and fracture toughness and method for the preparation thereof

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000231002A (ja) 1999-02-10 2000-08-22 Konica Corp 光学用レンズ
US6509423B1 (en) * 2001-08-21 2003-01-21 Dow Corning Corporation Silicone composition and cured silicone product
US20030171476A1 (en) 2002-03-05 2003-09-11 Zhongtao Li Hydrosilyation cured silicone resin containing colloidal silica and a process for producing the same

Also Published As

Publication number Publication date
US20050061437A1 (en) 2005-03-24
EP1524554A2 (en) 2005-04-20
TW200512256A (en) 2005-04-01
JP2005089671A (ja) 2005-04-07
US7294682B2 (en) 2007-11-13
TWI330654B (enExample) 2010-09-21
KR20050028843A (ko) 2005-03-23
EP1524554A3 (en) 2008-05-21

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