KR100895144B1 - 감광성 수지 조성물, 이 감광성 수지 조성물을 사용한 단차패턴의 형성 방법 및 잉크젯 헤드의 제조 방법 - Google Patents

감광성 수지 조성물, 이 감광성 수지 조성물을 사용한 단차패턴의 형성 방법 및 잉크젯 헤드의 제조 방법 Download PDF

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Publication number
KR100895144B1
KR100895144B1 KR1020077001944A KR20077001944A KR100895144B1 KR 100895144 B1 KR100895144 B1 KR 100895144B1 KR 1020077001944 A KR1020077001944 A KR 1020077001944A KR 20077001944 A KR20077001944 A KR 20077001944A KR 100895144 B1 KR100895144 B1 KR 100895144B1
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South Korea
Prior art keywords
photosensitive resin
resin composition
flow path
pattern
ink
Prior art date
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Expired - Fee Related
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KR1020077001944A
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English (en)
Korean (ko)
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KR20070027745A (ko
Inventor
쇼지 시바
히로에 이시꾸라
아끼히꼬 오까노
Original Assignee
캐논 가부시끼가이샤
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Publication of KR20070027745A publication Critical patent/KR20070027745A/ko
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1637—Manufacturing processes molding
    • B41J2/1639—Manufacturing processes molding sacrificial molding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
KR1020077001944A 2004-06-28 2005-06-24 감광성 수지 조성물, 이 감광성 수지 조성물을 사용한 단차패턴의 형성 방법 및 잉크젯 헤드의 제조 방법 Expired - Fee Related KR100895144B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2004-00190479 2004-06-28
JP2004190479A JP4761498B2 (ja) 2004-06-28 2004-06-28 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法

Publications (2)

Publication Number Publication Date
KR20070027745A KR20070027745A (ko) 2007-03-09
KR100895144B1 true KR100895144B1 (ko) 2009-05-04

Family

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Application Number Title Priority Date Filing Date
KR1020077001944A Expired - Fee Related KR100895144B1 (ko) 2004-06-28 2005-06-24 감광성 수지 조성물, 이 감광성 수지 조성물을 사용한 단차패턴의 형성 방법 및 잉크젯 헤드의 제조 방법

Country Status (7)

Country Link
US (1) US7670757B2 (enExample)
EP (1) EP1766475B1 (enExample)
JP (1) JP4761498B2 (enExample)
KR (1) KR100895144B1 (enExample)
CN (1) CN1977218B (enExample)
TW (1) TWI300517B (enExample)
WO (1) WO2006001516A1 (enExample)

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JP5027991B2 (ja) * 2004-12-03 2012-09-19 キヤノン株式会社 インクジェットヘッドおよびその製造方法
DE102006051764A1 (de) * 2006-11-02 2008-05-08 Qimonda Ag Entwickler und Verfahren zum Entwickeln und zum fotolithografischen Strukturieren
US7971964B2 (en) * 2006-12-22 2011-07-05 Canon Kabushiki Kaisha Liquid discharge head and method for manufacturing the same
US20080292993A1 (en) * 2006-12-22 2008-11-27 Canon Kabushiki Kaisha Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof
JP2008290413A (ja) * 2007-05-28 2008-12-04 Canon Inc 液体吐出ヘッドの製造方法
JP2010240868A (ja) * 2009-04-01 2010-10-28 Canon Inc インクジェット記録ヘッド及びその製造方法
JP5279686B2 (ja) * 2009-11-11 2013-09-04 キヤノン株式会社 液体吐出ヘッドの製造方法
JP5653181B2 (ja) * 2010-11-09 2015-01-14 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP5697406B2 (ja) * 2010-11-09 2015-04-08 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP2014219487A (ja) * 2013-05-02 2014-11-20 富士フイルム株式会社 パターン形成方法、電子デバイス及びその製造方法、現像液
JP6719911B2 (ja) * 2016-01-19 2020-07-08 キヤノン株式会社 液体吐出ヘッドの製造方法
WO2018061512A1 (ja) * 2016-09-30 2018-04-05 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性組成物
CN108148210B (zh) * 2018-01-15 2020-11-27 上海大学 一种分子内交联聚合物、制备方法及其应用

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KR20020092171A (ko) * 2001-04-19 2002-12-11 쉬플리 캄파니, 엘.엘.씨. 포토레지스트 조성물
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Also Published As

Publication number Publication date
WO2006001516A1 (en) 2006-01-05
JP2006011181A (ja) 2006-01-12
US7670757B2 (en) 2010-03-02
TW200606586A (en) 2006-02-16
US20070031756A1 (en) 2007-02-08
KR20070027745A (ko) 2007-03-09
TWI300517B (en) 2008-09-01
CN1977218B (zh) 2010-12-01
EP1766475A1 (en) 2007-03-28
CN1977218A (zh) 2007-06-06
EP1766475B1 (en) 2015-09-16
JP4761498B2 (ja) 2011-08-31

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