CN1977218B - 光敏树脂组合物，使用光敏树脂组合物形成级差图形的方法，和生产喷墨头的方法 - Google Patents

光敏树脂组合物，使用光敏树脂组合物形成级差图形的方法，和生产喷墨头的方法 Download PDF

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Publication number
CN1977218B
CN1977218B CN200580021603.9A CN200580021603A CN1977218B CN 1977218 B CN1977218 B CN 1977218B CN 200580021603 A CN200580021603 A CN 200580021603A CN 1977218 B CN1977218 B CN 1977218B
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CN
China
Prior art keywords
flow path
ink
ink flow
resin composition
photosensitive resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200580021603.9A
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English (en)
Chinese (zh)
Other versions
CN1977218A (zh
Inventor
芝昭二
石仓宏惠
冈野明彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of CN1977218A publication Critical patent/CN1977218A/zh
Application granted granted Critical
Publication of CN1977218B publication Critical patent/CN1977218B/zh
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Expired - Fee Related legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1631—Manufacturing processes photolithography
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1601—Production of bubble jet print heads
    • B41J2/1603—Production of bubble jet print heads of the front shooter type
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01—Ink jet
    • B41J2/135—Nozzles
    • B41J2/16—Production of nozzles
    • B41J2/1621—Manufacturing processes
    • B41J2/1637—Manufacturing processes molding
    • B41J2/1639—Manufacturing processes molding sacrificial molding
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CN200580021603.9A 2004-06-28 2005-06-24 光敏树脂组合物，使用光敏树脂组合物形成级差图形的方法，和生产喷墨头的方法 Expired - Fee Related CN1977218B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP190479/2004 2004-06-28
JP2004190479A JP4761498B2 (ja) 2004-06-28 2004-06-28 感光性樹脂組成物、ならびにこれを用いた段差パターンの製造方法及びインクジェットヘッドの製造方法
PCT/JP2005/012161 WO2006001516A1 (en) 2004-06-28 2005-06-24 Photosensitive resin composition, method of forming level difference pattern using the photosensitive resin composition, and method of producing ink jet head

Publications (2)

Publication Number Publication Date
CN1977218A CN1977218A (zh) 2007-06-06
CN1977218B true CN1977218B (zh) 2010-12-01

Family

ID=34982340

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200580021603.9A Expired - Fee Related CN1977218B (zh) 2004-06-28 2005-06-24 光敏树脂组合物，使用光敏树脂组合物形成级差图形的方法，和生产喷墨头的方法

Country Status (7)

Country Link
US (1) US7670757B2 (enExample)
EP (1) EP1766475B1 (enExample)
JP (1) JP4761498B2 (enExample)
KR (1) KR100895144B1 (enExample)
CN (1) CN1977218B (enExample)
TW (1) TWI300517B (enExample)
WO (1) WO2006001516A1 (enExample)

Cited By (1)

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US20170203569A1 (en) 2016-01-19 2017-07-20 Canon Kabushiki Kaisha Liquid ejection head manufacturing method

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JP5027991B2 (ja) * 2004-12-03 2012-09-19 キヤノン株式会社 インクジェットヘッドおよびその製造方法
DE102006051764A1 (de) * 2006-11-02 2008-05-08 Qimonda Ag Entwickler und Verfahren zum Entwickeln und zum fotolithografischen Strukturieren
US7971964B2 (en) * 2006-12-22 2011-07-05 Canon Kabushiki Kaisha Liquid discharge head and method for manufacturing the same
US20080292993A1 (en) * 2006-12-22 2008-11-27 Canon Kabushiki Kaisha Photo-cationic polymerizable epoxy resin composition, liquid discharge head, and manufacturing method thereof
JP2008290413A (ja) * 2007-05-28 2008-12-04 Canon Inc 液体吐出ヘッドの製造方法
JP2010240868A (ja) * 2009-04-01 2010-10-28 Canon Inc インクジェット記録ヘッド及びその製造方法
JP5279686B2 (ja) * 2009-11-11 2013-09-04 キヤノン株式会社 液体吐出ヘッドの製造方法
JP5653181B2 (ja) * 2010-11-09 2015-01-14 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP5697406B2 (ja) * 2010-11-09 2015-04-08 キヤノン株式会社 親水被膜の形成方法および親水被膜、ならびにインクジェット記録ヘッドの製造方法およびインクジェット記録ヘッド
JP2014219487A (ja) * 2013-05-02 2014-11-20 富士フイルム株式会社 パターン形成方法、電子デバイス及びその製造方法、現像液
JPWO2018061512A1 (ja) * 2016-09-30 2019-06-24 富士フイルム株式会社 パターン形成方法、電子デバイスの製造方法、及び、感活性光線性又は感放射線性組成物
CN108148210B (zh) * 2018-01-15 2020-11-27 上海大学 一种分子内交联聚合物、制备方法及其应用

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EP1251399A2 (en) * 2001-04-19 2002-10-23 Shipley Company LLC Photoresist composition
CN1475350A (zh) * 2002-07-10 2004-02-18 ������������ʽ���� 微细结构体的制造方法、液体喷出头的制造方法和液体喷出头
CN1475352A (zh) * 2002-07-10 2004-02-18 佳能株式会社 微细结构体的制备方法，微细空洞结构体的制备方法和液体喷出头的制备方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170203569A1 (en) 2016-01-19 2017-07-20 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
CN106976316A (zh) * 2016-01-19 2017-07-25 佳能株式会社 液体喷射头制造方法
US10343406B2 (en) 2016-01-19 2019-07-09 Canon Kabushiki Kaisha Liquid ejection head manufacturing method
CN106976316B (zh) * 2016-01-19 2019-11-22 佳能株式会社 液体喷射头制造方法

Also Published As

Publication number Publication date
US20070031756A1 (en) 2007-02-08
JP4761498B2 (ja) 2011-08-31
KR100895144B1 (ko) 2009-05-04
TW200606586A (en) 2006-02-16
EP1766475A1 (en) 2007-03-28
US7670757B2 (en) 2010-03-02
EP1766475B1 (en) 2015-09-16
TWI300517B (en) 2008-09-01
JP2006011181A (ja) 2006-01-12
CN1977218A (zh) 2007-06-06
WO2006001516A1 (en) 2006-01-05
KR20070027745A (ko) 2007-03-09

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C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
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GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
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Granted publication date: 20101201

Termination date: 20180624