JPS57124341A - Formation of micropattern - Google Patents

Formation of micropattern

Info

Publication number
JPS57124341A
JPS57124341A JP967181A JP967181A JPS57124341A JP S57124341 A JPS57124341 A JP S57124341A JP 967181 A JP967181 A JP 967181A JP 967181 A JP967181 A JP 967181A JP S57124341 A JPS57124341 A JP S57124341A
Authority
JP
Japan
Prior art keywords
acid anhydride
resist
alkali
soln
polymer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP967181A
Other languages
Japanese (ja)
Inventor
Akira Miura
Tsukasa Tada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP967181A priority Critical patent/JPS57124341A/en
Publication of JPS57124341A publication Critical patent/JPS57124341A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a resist material with superior sensitivity and dry etching resistance by adding a polymer having the structure of a cyclic acid anhydride to a positive type resist composition consisting of an alkali-soluble resin and an o- quinone diazide compound. CONSTITUTION:To an alkali-soluble resin such as novolak resin, a cellulose deriv. or polyvinyl acetate is added 5-20wt% o-quinone diazide compound or deriv. such as 1,2-benzoquinonediazideo-4-sulfonic acid or 1,2-naphthoquinonediazido-4-sulfonic acid as a photosensitive substance, and they are further blended with 5-30wt% cyclic acid anhydride polymer such as polymethacrylic acid anhydride or polyacrylic acid anhydride. This blend is dissolved in a solvent such as ester or DMF to prepare a resist soln. A resist layer is then formed in 0.3- 2mum thickness using the soln., and it is baked, patterned with electron beams or the like, and developed.
JP967181A 1981-01-27 1981-01-27 Formation of micropattern Pending JPS57124341A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP967181A JPS57124341A (en) 1981-01-27 1981-01-27 Formation of micropattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP967181A JPS57124341A (en) 1981-01-27 1981-01-27 Formation of micropattern

Publications (1)

Publication Number Publication Date
JPS57124341A true JPS57124341A (en) 1982-08-03

Family

ID=11726663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP967181A Pending JPS57124341A (en) 1981-01-27 1981-01-27 Formation of micropattern

Country Status (1)

Country Link
JP (1) JPS57124341A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5811932A (en) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd Photosensitive composition
JP2006011181A (en) * 2004-06-28 2006-01-12 Canon Inc Photosensitive resin composition, method for producing stepped pattern using same, and method for producing ink-jet head

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5811932A (en) * 1981-07-15 1983-01-22 Konishiroku Photo Ind Co Ltd Photosensitive composition
JPH0140338B2 (en) * 1981-07-15 1989-08-28 Konishiroku Photo Ind
JP2006011181A (en) * 2004-06-28 2006-01-12 Canon Inc Photosensitive resin composition, method for producing stepped pattern using same, and method for producing ink-jet head

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