JPS6417049A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6417049A
JPS6417049A JP17259687A JP17259687A JPS6417049A JP S6417049 A JPS6417049 A JP S6417049A JP 17259687 A JP17259687 A JP 17259687A JP 17259687 A JP17259687 A JP 17259687A JP S6417049 A JPS6417049 A JP S6417049A
Authority
JP
Japan
Prior art keywords
trihydroxy
benzophenone
titled composition
type photosensitive
photosensitive component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17259687A
Other languages
Japanese (ja)
Other versions
JP2558716B2 (en
Inventor
Hiroko Urano
Hitoshi Sugiura
Hideo Kikuchi
Yoji Yamazawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Gosei Co Ltd
Original Assignee
Toyo Gosei Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Gosei Co Ltd filed Critical Toyo Gosei Co Ltd
Priority to JP17259687A priority Critical patent/JP2558716B2/en
Publication of JPS6417049A publication Critical patent/JPS6417049A/en
Application granted granted Critical
Publication of JP2558716B2 publication Critical patent/JP2558716B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To improve the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition by incorporating a 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as a guinone diazide type photosensitive component. CONSTITUTION:The titled composition comprises the 1,2-naphthoquinone diazide sulfonate of 2,3,4-trihydroxy-2'-methyl benzophenone as the quinone diazide type photosensitive component. The trihydroxy benzophenone is necessary to have a methyl group at 2'-position thereof, and said 2,3,4-trihydroxy benzophenone having the methyl group at 3' or 4' position is useless. And, the quinone diazide type photosensitive component is preferably used as a solution by dissolving said component together with an alkaline soluble resin in a suitable solvent. Additionally, the titled composition may compound an additive such as a surfactant, a dyestuff, a stabilizer and a sensitizer, etc. Thus, the stability of application ability, the sensitivity, the film retention ratio and the resolution of the titled composition are improved.
JP17259687A 1987-07-10 1987-07-10 Positive photoresist composition Expired - Lifetime JP2558716B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17259687A JP2558716B2 (en) 1987-07-10 1987-07-10 Positive photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17259687A JP2558716B2 (en) 1987-07-10 1987-07-10 Positive photoresist composition

Publications (2)

Publication Number Publication Date
JPS6417049A true JPS6417049A (en) 1989-01-20
JP2558716B2 JP2558716B2 (en) 1996-11-27

Family

ID=15944780

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17259687A Expired - Lifetime JP2558716B2 (en) 1987-07-10 1987-07-10 Positive photoresist composition

Country Status (1)

Country Link
JP (1) JP2558716B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124228A (en) * 1988-07-20 1992-06-23 Sumitomo Chemical Co., Ltd. Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
US5563018A (en) * 1992-03-23 1996-10-08 Hoechst Aktiengesellschaft (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material
KR100573243B1 (en) * 1998-12-17 2006-04-24 도오꾜오까고오교 가부시끼가이샤 Positive-type photoresist coating liquid for producing liquid-crystal device and substrates using the same
JP2008240998A (en) * 2007-03-28 2008-10-09 Toyo Tire & Rubber Co Ltd Liquid-filling type vibration-proof device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5124228A (en) * 1988-07-20 1992-06-23 Sumitomo Chemical Co., Ltd. Positive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid ester
US5563018A (en) * 1992-03-23 1996-10-08 Hoechst Aktiengesellschaft (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material
KR100272384B1 (en) * 1992-03-23 2000-11-15 카흐홀즈 트라우델 (1,2-naphthoquinone 2-diazide) sulfonic acid esters, radiation-sensitive mixture prepared therewith and radiation-sensitive recording material
KR100573243B1 (en) * 1998-12-17 2006-04-24 도오꾜오까고오교 가부시끼가이샤 Positive-type photoresist coating liquid for producing liquid-crystal device and substrates using the same
JP2008240998A (en) * 2007-03-28 2008-10-09 Toyo Tire & Rubber Co Ltd Liquid-filling type vibration-proof device

Also Published As

Publication number Publication date
JP2558716B2 (en) 1996-11-27

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