JPS5635129A - Positive type photosensitive composition - Google Patents

Positive type photosensitive composition

Info

Publication number
JPS5635129A
JPS5635129A JP11145079A JP11145079A JPS5635129A JP S5635129 A JPS5635129 A JP S5635129A JP 11145079 A JP11145079 A JP 11145079A JP 11145079 A JP11145079 A JP 11145079A JP S5635129 A JPS5635129 A JP S5635129A
Authority
JP
Japan
Prior art keywords
printing
acid ester
photosensitive composition
photosensitive
quinonediazidesulfonic acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11145079A
Other languages
Japanese (ja)
Other versions
JPS6053301B2 (en
Inventor
Takateru Asano
Yoko Matsumoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Yakuhin Kogyo KK
Original Assignee
Fuji Yakuhin Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Yakuhin Kogyo KK filed Critical Fuji Yakuhin Kogyo KK
Priority to JP11145079A priority Critical patent/JPS6053301B2/en
Publication of JPS5635129A publication Critical patent/JPS5635129A/en
Publication of JPS6053301B2 publication Critical patent/JPS6053301B2/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE:To obtain a positive type photosensitive composition superior in sensitivity, and resistance to alcohol, etching, and printing, by using o-quinonediazidesulfonic acid ester of halogenated polyhydroxystyrene. CONSTITUTION:o-Quinonediazidesulfonic acid ester of halogenated polyhydroxystyrene represented by the formula in which X is a halogen atom is used as a photosensitive agent. A photosensitive solution prepared by dissolving said photosensitive agent together with a dye, colorant, plasticizer, and/or the like according to uses, is coated on a substrate, such as an aluminum plate for printing, imagewise exposed, and developed with an aqueous alkaline solution. A printing plate is obtained by rubbing the plate face with absorbent cotton wetted with water containing isopropyl alcohol. This printing plate is not affected by printing using a damping water containing isopropyl alcohol, and it has high printing resistance. o-Quinonediazidesulfonic acid ester of a novolak type phenol resin and an alkali-soluble resin may be added to said photosensitive composition.
JP11145079A 1979-08-31 1979-08-31 Positive photosensitive composition Expired JPS6053301B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11145079A JPS6053301B2 (en) 1979-08-31 1979-08-31 Positive photosensitive composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11145079A JPS6053301B2 (en) 1979-08-31 1979-08-31 Positive photosensitive composition

Publications (2)

Publication Number Publication Date
JPS5635129A true JPS5635129A (en) 1981-04-07
JPS6053301B2 JPS6053301B2 (en) 1985-11-25

Family

ID=14561510

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11145079A Expired JPS6053301B2 (en) 1979-08-31 1979-08-31 Positive photosensitive composition

Country Status (1)

Country Link
JP (1) JPS6053301B2 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0111274A2 (en) * 1982-12-13 1984-06-20 Hoechst Aktiengesellschaft Photosensitive composition, photoprinting material prepared therewith and process for producing a printing plate with that material
JPS60162249A (en) * 1984-02-01 1985-08-24 Japan Synthetic Rubber Co Ltd Positive type resist composition
EP0240843A2 (en) * 1986-03-28 1987-10-14 Kabushiki Kaisha Toshiba Photosensitive composite, method for preparing it and use thereof
JPS63258550A (en) * 1987-04-17 1988-10-26 Tookiyoo Menki:Kk Method for humidifying noodle dough or the like in forming thereof
US5302488A (en) * 1991-02-28 1994-04-12 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
US5326826A (en) * 1991-02-28 1994-07-05 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
KR100237123B1 (en) * 1997-06-04 2000-01-15 존시 리 Process for preparing polyhydroxystyrene derivatives

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0111274A2 (en) * 1982-12-13 1984-06-20 Hoechst Aktiengesellschaft Photosensitive composition, photoprinting material prepared therewith and process for producing a printing plate with that material
JPS60162249A (en) * 1984-02-01 1985-08-24 Japan Synthetic Rubber Co Ltd Positive type resist composition
JPH0345825B2 (en) * 1984-02-01 1991-07-12 Japan Synthetic Rubber Co Ltd
EP0240843A2 (en) * 1986-03-28 1987-10-14 Kabushiki Kaisha Toshiba Photosensitive composite, method for preparing it and use thereof
JPS63258550A (en) * 1987-04-17 1988-10-26 Tookiyoo Menki:Kk Method for humidifying noodle dough or the like in forming thereof
US5302488A (en) * 1991-02-28 1994-04-12 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing naphthoquinone-2-diazide-4-sulfonyl groups and their use in a positive working recording material
US5326826A (en) * 1991-02-28 1994-07-05 Hoechst Aktiengesellschaft Radiation-sensitive polymers containing diazocarbonyl groups and a process for their preparation
KR100237123B1 (en) * 1997-06-04 2000-01-15 존시 리 Process for preparing polyhydroxystyrene derivatives

Also Published As

Publication number Publication date
JPS6053301B2 (en) 1985-11-25

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