KR100237123B1 - Process for preparing polyhydroxystyrene derivatives - Google Patents
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- KR100237123B1 KR100237123B1 KR1019970023051A KR19970023051A KR100237123B1 KR 100237123 B1 KR100237123 B1 KR 100237123B1 KR 1019970023051 A KR1019970023051 A KR 1019970023051A KR 19970023051 A KR19970023051 A KR 19970023051A KR 100237123 B1 KR100237123 B1 KR 100237123B1
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- polyhydroxystyrene
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- carbon atoms
- ester
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 30
- 150000002148 esters Chemical class 0.000 claims abstract description 18
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims description 22
- 125000004432 carbon atom Chemical group C* 0.000 claims description 16
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims description 15
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 12
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 11
- 239000000203 mixture Substances 0.000 claims description 10
- 239000003153 chemical reaction reagent Substances 0.000 claims description 9
- 239000003513 alkali Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 8
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 claims description 6
- 150000001339 alkali metal compounds Chemical class 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 6
- 239000002585 base Substances 0.000 claims description 6
- 229910052794 bromium Inorganic materials 0.000 claims description 6
- 229910052801 chlorine Inorganic materials 0.000 claims description 6
- 239000000460 chlorine Substances 0.000 claims description 6
- DYHSDKLCOJIUFX-UHFFFAOYSA-N tert-butoxycarbonyl anhydride Chemical group CC(C)(C)OC(=O)OC(=O)OC(C)(C)C DYHSDKLCOJIUFX-UHFFFAOYSA-N 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 5
- 229910052757 nitrogen Inorganic materials 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 5
- 125000000547 substituted alkyl group Chemical group 0.000 claims description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims description 4
- WQDUMFSSJAZKTM-UHFFFAOYSA-N Sodium methoxide Chemical compound [Na+].[O-]C WQDUMFSSJAZKTM-UHFFFAOYSA-N 0.000 claims description 4
- 239000003112 inhibitor Substances 0.000 claims description 4
- MFRIHAYPQRLWNB-UHFFFAOYSA-N sodium tert-butoxide Chemical compound [Na+].CC(C)(C)[O-] MFRIHAYPQRLWNB-UHFFFAOYSA-N 0.000 claims description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical group CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 claims description 4
- 238000004090 dissolution Methods 0.000 claims description 3
- RIFGWPKJUGCATF-UHFFFAOYSA-N ethyl chloroformate Chemical group CCOC(Cl)=O RIFGWPKJUGCATF-UHFFFAOYSA-N 0.000 claims description 3
- 238000002156 mixing Methods 0.000 claims description 3
- AHWALFGBDFAJAI-UHFFFAOYSA-N phenyl carbonochloridate Chemical compound ClC(=O)OC1=CC=CC=C1 AHWALFGBDFAJAI-UHFFFAOYSA-N 0.000 claims description 3
- LPNYRYFBWFDTMA-UHFFFAOYSA-N potassium tert-butoxide Chemical compound [K+].CC(C)(C)[O-] LPNYRYFBWFDTMA-UHFFFAOYSA-N 0.000 claims description 3
- 229910052783 alkali metal Inorganic materials 0.000 claims description 2
- 150000001340 alkali metals Chemical class 0.000 claims description 2
- 150000004703 alkoxides Chemical class 0.000 claims description 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 2
- 229910052760 oxygen Inorganic materials 0.000 claims description 2
- RPDAUEIUDPHABB-UHFFFAOYSA-N potassium ethoxide Chemical compound [K+].CC[O-] RPDAUEIUDPHABB-UHFFFAOYSA-N 0.000 claims description 2
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 claims description 2
- QDRKDTQENPPHOJ-UHFFFAOYSA-N sodium ethoxide Chemical compound [Na+].CC[O-] QDRKDTQENPPHOJ-UHFFFAOYSA-N 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical group [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims 1
- 150000004679 hydroxides Chemical class 0.000 claims 1
- 229910052698 phosphorus Inorganic materials 0.000 claims 1
- 239000011574 phosphorus Substances 0.000 claims 1
- 229920000642 polymer Polymers 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 6
- 229920005989 resin Polymers 0.000 abstract description 6
- 238000006243 chemical reaction Methods 0.000 description 17
- 239000000047 product Substances 0.000 description 15
- 150000002430 hydrocarbons Chemical group 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 7
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 6
- 229920001577 copolymer Polymers 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 238000007306 functionalization reaction Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 125000001424 substituent group Chemical group 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 230000001988 toxicity Effects 0.000 description 3
- 231100000419 toxicity Toxicity 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 150000003440 styrenes Chemical class 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- IHKAGESSVVOIIU-UHFFFAOYSA-N (3-ethoxy-3-methoxypropyl) hypofluorite Chemical compound CCOC(OC)CCOF IHKAGESSVVOIIU-UHFFFAOYSA-N 0.000 description 1
- 238000005160 1H NMR spectroscopy Methods 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 150000001344 alkene derivatives Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 125000005520 diaryliodonium group Chemical group 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
- -1 photoacid generators Substances 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- XAEFZNCEHLXOMS-UHFFFAOYSA-M potassium benzoate Chemical compound [K+].[O-]C(=O)C1=CC=CC=C1 XAEFZNCEHLXOMS-UHFFFAOYSA-M 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- 125000005409 triarylsulfonium group Chemical group 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by heteroatoms or groups containing heteroatoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/04—Polymerisation in solution
- C08F2/06—Organic solvent
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/44—Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/14—Esterification
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K3/00—Use of inorganic substances as compounding ingredients
- C08K3/10—Metal compounds
- C08K3/105—Compounds containing metals of Groups 1 to 3 or of Groups 11 to 13 of the Periodic Table
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
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- General Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
Abstract
본 발명은 알칼리성 알코올 용액에 폴리히드록시스티렌을 첨가하여 균일 폴리히드록시스티렌 용액을 형성하고, 이 폴리히드록시스티렌 용액을 에스테르와 반응시켜 폴리히드록시스티렌 유도체를 얻는 것을 포함하는 폴리히드록시스티렌 유도체의 제조 방법을 제공한다. 수득한 폴리히드록시스티렌 유도체는 포토레지스트의 수지 성분으로서 사용하기에 적합하다.The present invention provides a polyhydroxystyrene derivative comprising adding polyhydroxystyrene to an alkaline alcohol solution to form a uniform polyhydroxystyrene solution, and reacting the polyhydroxystyrene solution with an ester to obtain a polyhydroxystyrene derivative. It provides a method for producing. The obtained polyhydroxystyrene derivative is suitable for use as the resin component of the photoresist.
Description
본 발명은 폴리히드록시스티렌 유도체의 제조 방법, 보다 구체적으로는 균일계내에서 폴리히드록시스티렌과 에스테르를 반응시키게 하기 위하여 폴리히드록시스티렌 용해용 용매로서 알칼리성 알코올 용액을 사용하는 폴리히드록시스티렌 유도체의 제조 방법에 관한 것이다.The present invention relates to a method for producing a polyhydroxystyrene derivative, more specifically, to a polyhydroxystyrene derivative using an alkaline alcohol solution as a solvent for dissolving polyhydroxystyrene in order to react polyhydroxystyrene with an ester in a homogeneous system. It relates to a manufacturing method.
대표적인 포토레지스트 조성물은 수지, 광산 발생기, 억제제 및 기타 첨가제를 포함한다. 이상적인 포토레지스트 조성물은 우수한 분해능, 감광성, 내에칭성, 접착성, 열안정성, 필름 균질성 및 가공성 등의 요건을 만족시켜야 한다. 포토레지스트의 주성분은 수지이므로, 수지는 전술한 특성, 특히 내에칭성, 접착성 및 필름 균질성을 향상시키는 데에 핵심적인 요소이다.Representative photoresist compositions include resins, photoacid generators, inhibitors and other additives. An ideal photoresist composition should satisfy the requirements of excellent resolution, photosensitivity, etch resistance, adhesion, thermal stability, film homogeneity and processability. Since the main component of the photoresist is a resin, the resin is a key element in improving the above-described properties, particularly etch resistance, adhesion and film homogeneity.
일반적으로 폴리히드록시스티렌 공중합체는 248nm의 파장에서 흡수도가 낮고 열안정성이 우수하므로 종종 포토레지스트의 수지 성분으로 사용된다. 통상적으로 폴리히드록시스티렌 공중합체 (또는 유도체)를 제조하는 방법으로는 두가지가 있다. 그 중 하나는 2개의 서로 다른 단량체를 직접 중합하는 것이다. 예컨대, 미국 특허 제4,775,730호에는 스티렌 유도체와 또다른 알켄 유도체를 직접 중합시키고 이로써 생성된 공중합체를 연속적으로 가수분해하여 목적 생성물을 얻는 방법이 기술되어 있다. 이 반응을 도시하면 하기 반응식 1과같다.In general, polyhydroxy styrene copolymer is often used as the resin component of the photoresist because of low absorption and excellent thermal stability at a wavelength of 248nm. Typically, there are two methods for preparing polyhydroxystyrene copolymers (or derivatives). One of them is the direct polymerization of two different monomers. For example, US Pat. No. 4,775,730 describes a method of directly polymerizing a styrene derivative with another alkene derivative and subsequently hydrolyzing the resulting copolymer to obtain the desired product. This reaction is shown in Scheme 1 below.
문헌 [J. Polym. Sci.: Part A; Polym. Chem. Ed. 1986, 24, 2971]에는 2개의 상이한 스티렌 단량체를 중합한 후 관능기를 선택적으로 분해하는 방법이 기술되어 있다. 이 반응을 도시하면 하기 반응식 2와 같다.J. Polym. Sci .: Part A; Polym. Chem. Ed. 1986, 24, 2971 describe a method of polymerizing two different styrene monomers and then selectively decomposing the functional group. This reaction is shown in Scheme 2 below.
폴리히드록시스티렌 공중합체를 제조하는 또다른 방법은 폴리히드록시스티렌을 출발 물질로 사용하여 이것을 에스테르 시약과 반응시키는 것을 포함하는 방법이다. 예컨대, 유럽특허 제0634696호에는 폴리히드록시스티렌을 테트라하이드로푸란(THF)에 용해시킨 후 칼륨 t-부톡시드 [KOC(CH3)3]을 첨가하고, 이 혼합물을 디(t-부틸)디카르보네이트와 반응시켜 폴리히드록시스티렌 유도체를 얻는 방법이 기술되어 있다. 그러나, 상기의 조건에서는 폴리히드록시스티렌의 칼륨염은 THF에 용해되지 않는다. 그러므로, 폴리히드록시스티렌과 디(t-부틸)디카르보네이트의 연속반응은 비균일계에서 수행된다. 전체 반응은 도시하면 하기 반응식 3과 같다.Another method of preparing a polyhydroxystyrene copolymer is a method comprising using polyhydroxystyrene as a starting material and reacting it with an ester reagent. For example, European Patent No. 0634696 dissolves polyhydroxystyrene in tetrahydrofuran (THF) and then adds potassium t-butoxide [KOC (CH 3 ) 3 ] and adds the mixture to di (t-butyl) dica. A method of reacting with carbonate to obtain polyhydroxystyrene derivatives is described. However, under the above conditions, potassium salt of polyhydroxystyrene is not dissolved in THF. Therefore, the continuous reaction of polyhydroxystyrene and di (t-butyl) dicarbonate is carried out in a heterogeneous system. The overall reaction is shown in Scheme 3 below.
요약하건대, 폴리히드록시스티렌 유도체를 제조하는 종래의 방법은 합성 과정이 복잡하거나 시간이 많이 소모되고, 반응이 비균일계에서 수행되므로 각 폴리히드록시스티렌 분자의 관능화도가 크게 상이한 결과, 생성물의 품질이 용이하게조절 되지 않는다.In summary, the conventional methods for preparing polyhydroxystyrene derivatives are complex or time-consuming, and the reactions are carried out in a heterogeneous system, resulting in significantly different functionalities of each polyhydroxystyrene molecule. Quality is not easily adjusted.
따라서, 본 발명은 전술한 문제점을 해결하여 폴리히드록시스티렌 유도체를 용이하게 제조하는 방법을 제공하는 것을 목적으로 한다.Accordingly, an object of the present invention is to provide a method for easily preparing a polyhydroxystyrene derivative by solving the above problems.
본 발명은 반응이 균일한 방법으로 수행되도록 특별한 용매계를 사용함으로써, 출발 물질인 폴리히드록시스티렌이 반응계 중에 완전히 용해되고, 각 폴리히드록시스티렌 분자의 관능화도가 서로 크게 다르지 않아서 생성물의 품질을 효과적으로 조절할 수 있게 하는 것이다. 또한, 사용 용매는 독성이 매우 적고, 반응도 실온에서 수행되어서, 가열, 환류 또는 저온 장치가 본 종류의 반응에는 필요하지 않다. 따라서, 본 발명의 반응은 더 간단하고, 시간도 절약되며, 안전성 및 상업적 가치가 높다.The present invention uses a special solvent system so that the reaction is carried out in a uniform manner, so that the starting material polyhydroxystyrene is completely dissolved in the reaction system, and the functionalities of the respective polyhydroxystyrene molecules are not significantly different from each other, thereby improving the quality of the product. To effectively control it. In addition, the solvents used are very low in toxicity and the reaction is also carried out at room temperature, so that no heating, reflux or low temperature equipment is required for this kind of reaction. Thus, the reaction of the present invention is simpler, saves time, and has high safety and commercial value.
전술한 목적을 달성하기 위한 본 발명에 따른 폴리히드록시스티렌 유도체의 제조 방법은Method for producing a polyhydroxy styrene derivative according to the present invention for achieving the above object
(a) 알칼리성 알코올 용액 (이때, 알칼리성 알코올 용액은 알칼리 시약과 알코올을 혼합하여 얻음)에 폴리히드록시스티렌을 첨가하여 균일 폴리히드록시스티렌 용액을 형성하고,(a) polyhydroxystyrene is added to an alkaline alcohol solution, wherein the alkaline alcohol solution is obtained by mixing an alkali reagent and an alcohol to form a homogeneous polyhydroxystyrene solution,
(b) 이 폴리히드록시스티렌 용액을 하기 화학식 1의 에스테르와 반응시켜 폴리히드록시스티렌 유도체를 얻는 것을 포함한다.(b) reacting the polyhydroxystyrene solution with an ester of the formula (1) to obtain a polyhydroxystyrene derivative.
상기 식에서, R1은 F, Cl, Br 및(여기에서, R3은 탄소 원자 수 1 내지 8인 탄화수소기임)으로 이루어진 군으로부터 선택되고, R2는 탄소 원자 수 1 내지 8인 탄화수소기이다.Wherein R 1 is F, Cl, Br and Wherein R 3 is a hydrocarbon group having 1 to 8 carbon atoms, and R 2 is a hydrocarbon group having 1 to 8 carbon atoms.
본 발명에 따라 폴리히드록시스티렌 유도체를 제조하는 데에 사용되는 출발물질은 상업적으로 구입가능한 폴리히드록시스티렌이다. 이 폴리히드록시스티렌을 알칼리성 알코올 용액에 첨가하고 나서 철저히 교반하여 균일한 폴리히드록시스티렌 용액을 만든다. 이른바 알칼리성 알코올 용액은 알칼리 시약과 알코올을 혼합함으로써 얻는다. 폴리히드록시스티렌을 용해시킬 수 있는 모든 알칼리/알코올 혼합물이 본 발명에 사용하기에 적합하다.The starting material used to prepare the polyhydroxystyrene derivatives according to the invention is commercially available polyhydroxystyrene. This polyhydroxy styrene is added to the alkaline alcohol solution and then thoroughly stirred to form a uniform polyhydroxy styrene solution. So-called alkaline alcohol solutions are obtained by mixing alkali reagents with alcohols. All alkali / alcohol mixtures capable of dissolving polyhydroxystyrene are suitable for use in the present invention.
이어서, 상기 폴리히드록시스티렌 용액을 일정한 시간 동안 에스테르와 반응시킨다. 물을 첨가하여 생성물을 침전시킨 후, 여과하고 건조시켜 폴리히드록시스티렌 유도체를 얻는다.The polyhydroxystyrene solution is then reacted with the ester for a period of time. Water is added to precipitate the product, followed by filtration and drying to give a polyhydroxystyrene derivative.
OH기가 특정의 비율로 관능화된 경우, 폴리히드록시스티렌 유도체를 합성하기 위한 상기 알칼리/알코올 용액계를 사용하여 생성물을 침전시킬 수 있다. 따라서, 보다 높은 관능화도 비를 갖는 폴리히드록시스티렌 유도체를 얻기 위하여, 폴리히드록시스티렌 용액을 에스테르와 반응시킨 후에 유기 용매를 첨가하여 생성물을 용해시키고, 에스테르 시약을 재첨가함으로써 적당한 반응물을 제공하여 폴리히드록시스티렌의 미반응된 OH기를 추가로 관능화시킬 수 있다. 그 결과 최종 생성물의 관능화도는 높아질 수 있다. 적합한 유기 용매에는 폴리히드록시스티렌 유도체를 용해할 수 있는 모든 종류의 용매가 포함된다. N,N-디메틸포름아미드(DMF)가 그 대표적인 예이다.If the OH groups are functionalized in a certain proportion, the product can be precipitated using the above alkali / alcohol solution system for synthesizing polyhydroxystyrene derivatives. Therefore, in order to obtain a polyhydroxystyrene derivative having a higher functionalization ratio, the polyhydroxystyrene solution is reacted with an ester, followed by the addition of an organic solvent to dissolve the product, and the addition of an ester reagent to provide a suitable reactant. Unreacted OH groups of polyhydroxystyrene can be further functionalized. As a result, the degree of functionalization of the final product can be increased. Suitable organic solvents include all kinds of solvents capable of dissolving polyhydroxystyrene derivatives. N, N-dimethylformamide (DMF) is a representative example.
본 발명에 사용하기 적합한 알칼리 시약은 알칼리 금속 화합물 또는 질소 원자를 포함하는 염기 화합물이다. 알칼리 금속 화합물은 알칼리 금속의 수산화물 또는 알콕시드일 수 있다. 그 대표적인 예에는 수산화나트륨, 나트륨 메톡시드, 나트륨 에톡시드, 나트륨 t-부톡시드, 수산화칼륨, 칼륨 메톡시드, 칼륨 에톡시드 및 칼륨 t-부톡시드가 포함된다.Suitable alkaline reagents for use in the present invention are alkali metal compounds or base compounds comprising nitrogen atoms. The alkali metal compound may be a hydroxide or alkoxide of alkali metal. Representative examples include sodium hydroxide, sodium methoxide, sodium ethoxide, sodium t-butoxide, potassium hydroxide, potassium methoxide, potassium ethoxide and potassium t-butoxide.
본 발명에 사용하기 적합한 질소 원자를 포함하는 염기 화합물은,및으로 이루어진 군으로부터 선택된다.Base compounds containing nitrogen atoms suitable for use in the present invention , And It is selected from the group consisting of.
식 중, R4, R5, R6은 H 및 탄소 원자 수 1 내지 4인 탄화수소기로 이루어진 군으로부터 선택되고, X는 O 또는 N이다. 이러한 질소 포함 염기 화합물의 대표적인 예에는 트리메틸아민 및 트리에틸아민가 포함된다.Wherein R 4 , R 5 , R 6 are selected from the group consisting of H and a hydrocarbon group having 1 to 4 carbon atoms, and X is O or N. Representative examples of such nitrogen containing base compounds include trimethylamine and triethylamine.
본 발명에 사용하기 적합한 알코올은 탄소 원자 수 1 내지 6인 알코올일 수 있다. 그 대표적인 예로는 메탄올, 에탄올 및 이소프로판올가 포함된다.Alcohols suitable for use in the present invention may be alcohols having 1 to 6 carbon atoms. Representative examples include methanol, ethanol and isopropanol.
본 발명에 사용하기 적합한 에스테르 시약은 하기 화학식 1에 의해 도시된 구조를 갖는다.Suitable ester reagents for use in the present invention have the structure shown by formula (1).
[화학식 1][Formula 1]
식 중, R1은 F, Cl, Br 및(여기서에, R3은 탄소원자 수 1 내지 8인 탄화수소기이고, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기임)으로 이루어진 군으로부터 선택되고, R2는 탄소 원자 수 1 내지 8인 탄화수소기, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐, 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기이다.Wherein R 1 is F, Cl, Br and Wherein R 3 is a hydrocarbon group having 1 to 8 carbon atoms, preferably a hydrocarbon group selected from the group consisting of alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl and substituted benzyl having 1 to 8 carbon atoms. selected from the group consisting of and, R 2 is a carbon atom number of 1 to 8 hydrocarbon group, preferably alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl, and the carbon atom number of 1 to 8, selected from the group consisting of substituted benzyl It is a hydrocarbon group.
에스테르의 R1이 F, Cl 또는 Br인 경우, 바람직한 에스테르의 예는 에틸클로로포르메이트 또는 페닐클로로포르메이트이다. 에스테르의 R1이인 경우, 바람직한 에스테르의 예는 디(t-부틸)디카르보네이트이다.When R 1 of the ester is F, Cl or Br, examples of preferred esters are ethylchloroformate or phenylchloroformate. R 1 of the ester In the case of, examples of preferred esters are di (t-butyl) dicarbonate.
상기한 본 발명의 방법에 따라 수득되는 폴리히드록시스티렌 유도체는 하기 화학식 2에 도시된 구조를 갖는다.The polyhydroxystyrene derivative obtained according to the method of the present invention described above has a structure shown in the following formula (2).
식 중, R2는 탄소 원자 수 1 내지 8인 탄화수소기, 바람직하게는 알킬, 페닐, 벤질, 치환 알킬, 치환 페닐, 및 탄소 원자 수 1 내지 8인 치환 벤질로 이루어진 군으로부터 선택된 탄화수소기이다.Wherein R 2 is a hydrocarbon group selected from the group consisting of hydrocarbon groups having 1 to 8 carbon atoms, preferably alkyl, phenyl, benzyl, substituted alkyl, substituted phenyl, and substituted benzyl having 1 to 8 carbon atoms.
상기의 치환 페닐은 1 또는 2개의 치환기를 포함할 수 있다. 마찬가지로, 상기의 치환 벤질도 1 또는 2개의 치환기를 포함할 수 있다. 여기서 치환기는 알킬, 알콕시 또는 할로겐, 예를 들면 메틸, 에틸, 프로필, 메톡시, 에톡시, 프로폭시, 불소, 염소 또는 브롬일 수 있다.The substituted phenyl may include one or two substituents. Similarly, the substituted benzyl may also include one or two substituents. The substituents here may be alkyl, alkoxy or halogen, for example methyl, ethyl, propyl, methoxy, ethoxy, propoxy, fluorine, chlorine or bromine.
본 발명의 하기 실시예에 따르면, R2는 에틸, t-부틸 또는 페닐일 수 있다.According to the following examples of the invention, R 2 may be ethyl, t-butyl or phenyl.
화학식 2에서, m/m+n의 비율은 0과 1사이, 바람직하게는 0.05 내지 0.95 사이로서는, 이는 폴리히드록시스티렌의 부분 관능화도가 5% 내지 95% 사이임을 의미한다.In the formula (2), the ratio of m / m + n is between 0 and 1, preferably between 0.05 and 0.95, which means that the partial functionalization degree of polyhydroxystyrene is between 5% and 95%.
본 발명의 일면에 따르면, 반응이 균일 방법으로 수행되게 하는 특별한 용매계를 사용함으로써 결과적으로 예컨대 각 폴리히드록시스티렌 분자들의 관능화도가 서로 크게 다르지 않도록 할 것이다. 또한, 사용 용매는 독성이 매우 적고, 반응도 실온에서 수행되어서, 가열, 환류 또는 저온 장치가 본 종류의 반응에는 필요하지 않다. 따라서, 본 발명의 방법은 더 간단하고, 안전성 및 상업적 가치가 높다.According to one aspect of the present invention, the use of a special solvent system that allows the reaction to be carried out in a uniform manner will result in such that the functionalities of the respective polyhydroxystyrene molecules are not significantly different from one another. In addition, the solvents used are very low in toxicity and the reaction is also carried out at room temperature, so that no heating, reflux or low temperature equipment is required for this kind of reaction. Thus, the process of the present invention is simpler, safer and of high commercial value.
본 발명에 의하여 수득되는 폴리히드록시스티렌 유도체는 248nm의 파장에서 흡수도가 낮고 열안정성이 월등하므로, 248nm 포토레지스트의 수지 성분으로 사용하기에 적합하다. 따라서 본 발명에 따르면, 본 발명의 방법에 의하여 합성된 폴리히드록시스티렌 유도체, 및 폴리히드록시스티렌 유도체의 중량 기준으로, 1-10 중량%의 광산 발생기 및 5-30 중량%의 용해 억제제를 포함하는 포토레지스트 조성물이 제공된다.The polyhydroxystyrene derivatives obtained by the present invention are suitable for use as the resin component of the 248 nm photoresist because of low absorption and superior thermal stability at a wavelength of 248 nm. Thus, according to the present invention, polyhydroxystyrene derivatives synthesized by the method of the present invention, and 1-10% by weight of the photoacid generator and 5-30% by weight of the dissolution inhibitor based on the weight of the polyhydroxystyrene derivative A photoresist composition is provided.
본 발명에 사용하기 적합한 산 발생기는 디아릴 요오도늄염, 트리아릴 술포늄염, 술포닐히드록시이미드 또는 그의 유도체일 수 있다. 다른 적합한 산 발생기는 유럽특허 제0634696호에서 사용된 것일 수 있다. 용해 억제제는 분자량이 1000이하인 산의 불안정한 관능기를 포함하는 임의 화합물일 수 있다.Acid generators suitable for use in the present invention may be diaryl iodonium salts, triaryl sulfonium salts, sulfonylhydroxyimide or derivatives thereof. Another suitable acid generator may be that used in EP 0634696. The dissolution inhibitor may be any compound comprising an labile functional group of an acid having a molecular weight of 1000 or less.
이에 대한 수많은 변경물과 변형물은 당 분야의 기술자에게는 자명하므로, 본 발명의 범위를 제한하지는 않으면서 보다 충분히 본 발명의 방법 및 잇점을 설명하기 위하여 하기의 실시예가 제공된다.Numerous modifications and variations will be apparent to those skilled in the art, and the following examples are provided to more fully illustrate the methods and advantages of the present invention without limiting the scope thereof.
[실시예 1-5]Example 1-5
[알코올 중의 폴리히드록시스티렌 용액의 제조][Preparation of Polyhydroxystyrene Solution in Alcohol]
수산화칼륨 2.8g을 에탄올 300ml가 담긴 플라스크에 첨가하였다. 이를 완전히 교반한 후, 폴리히드록시스티렌 6.0g을 첨가하고, 용액이 투명하게 될 때까지 추가로 약 1시간 동안 실온에서 교반하였다. 수산화칼륨 및 에탄올 이외에, 다른 알칼리/알코올계도 사용하여 폴리히드록시스티렌을 용해할 수 있다. 표 1에는 폴리히드록시스티렌을 용해할 수 있는 적합한 알칼리/알코올계가 열거되어 있다.2.8 g of potassium hydroxide was added to a flask containing 300 ml of ethanol. After it was stirred thoroughly, 6.0 g of polyhydroxystyrene was added and stirred for an additional about 1 hour at room temperature until the solution became clear. In addition to potassium hydroxide and ethanol, other alkali / alcoholic systems may also be used to dissolve polyhydroxystyrene. Table 1 lists suitable alkali / alcohol systems capable of dissolving polyhydroxystyrene.
[실시예 6-9]Example 6-9
[폴리히드록시스티렌 유도체의 제조][Production of Polyhydroxystyrene Derivatives]
0.4 내지 1.0당량의 디(t-부틸)디카르보네이트, 에틸클로로포르메이트 또는 페닐클로로포르메이트를 실시예 1-5 중 어느 하나로부터 얻어지는 알코올 용액계 중의 폴리히드록시스티렌 용액에 첨가하였다. 6시간 동안 교반한 후, 이 혼합물을 감압하에서 농축하여 일부 용매를 제거하였다. 이렇게 하여 생성된 혼합물에 물 100-50ml을 첨가하고, 이어서 미량의 아세트산으로 산성화시킨 후, 이를 여과, 건조하여 목적 생성물 1-4를 얻었다. 표 2에는 반응 규모, 얻어진 생성물의 중량 및 에스테르 시약의 당량비가 기재되어 있다.0.4-1.0 equivalents of di (t-butyl) dicarbonate, ethylchloroformate or phenylchloroformate were added to the polyhydroxystyrene solution in the alcohol solution system obtained from any one of Examples 1-5. After stirring for 6 hours, the mixture was concentrated under reduced pressure to remove some solvent. 100-50 ml of water was added to the resulting mixture, which was then acidified with a small amount of acetic acid, which was then filtered and dried to afford the desired product 1-4. Table 2 lists the reaction scale, the weight of the product obtained and the equivalence ratio of the ester reagents.
[실시예 10]Example 10
수산화칼륨 5.6g을 에탄올 800ml가 담긴 플라스크에 첨가하였다. 이를 완전히 교반한 후, 폴리히드록시스티렌 12.0g을 첨가하고, 용액이 투명하게 될때까지 약 1시간 동안 실온에서 교반하였다. 이 용액에 디(t-부틸)디카르보네이트 0.8 당량을 첨가하고, 추가로 약 6시간 동안 교반하였다. 이어서, 이렇게 하여 얻어진 혼합물의 용해도를 증가시키기 위하여 N,N-디메틸포름아미드 100ml를 첨가한 후, 디(t-부틸)디카르보네이트 0.4 당량을 첨가하여 적정량의 반응물을 제공하였다. 혼합물을 6시간 동안 교반시키고 나서, 물 100ml를 첨가한 후, 여과하고 진공 건조시켜 생성물 5를 얻었다(20.3g)5.6 g of potassium hydroxide was added to a flask containing 800 ml of ethanol. After complete stirring, 12.0 g of polyhydroxystyrene was added and stirred at room temperature for about 1 hour until the solution became clear. 0.8 equivalents of di (t-butyl) dicarbonate was added to this solution and stirred for about 6 hours. Subsequently, 100 ml of N, N-dimethylformamide was added to increase the solubility of the mixture thus obtained, and then 0.4 equivalent of di (t-butyl) dicarbonate was added to provide an appropriate amount of reactant. The mixture was stirred for 6 hours, then 100 ml of water was added, filtered and dried in vacuo to give the product 5 (20.3 g).
상기 실시예로부터 얻어진 생성물(폴리히드록시스티렌 유도체)은 하기 화학식 2를 갖는다.The product (polyhydroxystyrene derivative) obtained from the above example has the following formula (2).
[화학식 2][Formula 2]
표 3에는 각 생성물의 R2및 m/m+n 비가 기재되어 있다.Table 3 lists the R 2 and m / m + n ratios of each product.
하기에 열거되는 데이터는1H-NMR 분석에 의한 생성물 1-5에 대한 분광 데이터이다:The data listed below are spectral data for product 1-5 by 1 H-NMR analysis:
생성물 1, 2 및 5 :Products 1, 2 and 5:
(CDCl3, 200 MHz): 1.55 (9H, s, 3Me), 6.50 (2H, s, b, Ar), 6.85 (2H, s, b, Ar).(CDCl 3 , 200 MHz): 1.55 (9H, s, 3Me), 6.50 (2H, s, b, Ar), 6.85 (2H, s, b, Ar).
생성물 3 :Product 3:
(CDCl3, 200 MHz): 1.38 (3H, s, b, Me), 4.31 (2H, s, b, CH2), 6.53 (2H, s, b, Ar), 6.88 (2H, s, b, Ar).(CDCl 3 , 200 MHz): 1.38 (3H, s, b, Me), 4.31 (2H, s, b, CH 2 ), 6.53 (2H, s, b, Ar), 6.88 (2H, s, b, Ar).
생성물 4 :Product 4:
(CDCl3, 200 MHz): 6.48 (2H, s, b, Ar), 6.96 (2H, s, b, Ar), 7.15-7.41 (5H, m, Ph).(CDCl 3 , 200 MHz): 6.48 (2H, s, b, Ar), 6.96 (2H, s, b, Ar), 7.15-7.41 (5H, m, Ph).
상기에 기술된 바와 같이, 본 발명은 폴리히드록시스티렌 유도체의 제조 반응이 균일 방법으로 수행되게 하는 특별한 용매계를 사용하여 각 폴리히드록시스티렌 분자의 관능화도가 서로 크게 다르지 않게 하여 생성물의 품질을 효과적으로 조절가능케 하고, 나아가 사용 용매의 독성이 매우 적고, 반응 또한 실온에서 수행되어서 가열, 환류 또는 저온 장치가 본 종류의 반응에 필요하지 않게 한다. 그 결과, 본 발명의 방법은 간단하고, 안전성 및 상업적 가치가 높다.As described above, the present invention uses a special solvent system which allows the production reaction of polyhydroxystyrene derivatives to be carried out in a uniform manner so that the functionalities of the respective polyhydroxystyrene molecules are not significantly different from each other so as to improve the quality of the product. Effectively controllable, furthermore the toxicity of the solvent used is very low and the reaction is also carried out at room temperature so that no heating, reflux or low temperature equipment is required for this kind of reaction. As a result, the method of the present invention is simple, safe and of high commercial value.
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