JPS6446746A - Positive type photoresist composition - Google Patents
Positive type photoresist compositionInfo
- Publication number
- JPS6446746A JPS6446746A JP20272487A JP20272487A JPS6446746A JP S6446746 A JPS6446746 A JP S6446746A JP 20272487 A JP20272487 A JP 20272487A JP 20272487 A JP20272487 A JP 20272487A JP S6446746 A JPS6446746 A JP S6446746A
- Authority
- JP
- Japan
- Prior art keywords
- formulas
- sulfonic acid
- oxygen plasma
- titled
- siloxane polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
Abstract
PURPOSE:To obtain the titled composition which has a high sensitivity for a UV and a high oxygen plasma durability, by incorporating a specified photosensitive agent, in a specified alkaline soluble siloxane polymer. CONSTITUTION:The titled composition contains one or more kinds of the alkaline soluble siloxane polymer shown by formulas I and II, and at least one kind of the photosensitive agent selected from esters of a compd. contg. at least four active hydrogen atoms. in a molecule and 1,2-naphthoquinone diazido-5-sulfonic acid, and/or 1,2-naphthoquinone diazido-4-sulfonic acid. In formulas I and II, X is for example, carboxyl group, R<1>-R<5> are each hydrogen atom. or alkyl group, (l), (m), (n) and (p) are each 0 or a positive integer. Thus, the titled resist capable of reproducing a positive pattern for the UV with the high accuracy and has the oxygen plasma durability is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20272487A JPS6446746A (en) | 1987-08-14 | 1987-08-14 | Positive type photoresist composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20272487A JPS6446746A (en) | 1987-08-14 | 1987-08-14 | Positive type photoresist composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6446746A true JPS6446746A (en) | 1989-02-21 |
Family
ID=16462110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20272487A Pending JPS6446746A (en) | 1987-08-14 | 1987-08-14 | Positive type photoresist composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6446746A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0229652A (en) * | 1988-07-20 | 1990-01-31 | Fuji Photo Film Co Ltd | Photoresist composition |
JPH0436755A (en) * | 1990-06-01 | 1992-02-06 | Fuji Photo Film Co Ltd | Resist composition |
US6949324B2 (en) | 2001-12-28 | 2005-09-27 | Fujitsu Limited | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same |
WO2010115945A1 (en) * | 2009-04-08 | 2010-10-14 | Pierre Fabre Dermo-Cosmetique | Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof |
CN106120412A (en) * | 2016-08-16 | 2016-11-16 | 江苏凯威新材料科技有限公司 | Steel wire rope and manufacturing process thereof |
-
1987
- 1987-08-14 JP JP20272487A patent/JPS6446746A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0229652A (en) * | 1988-07-20 | 1990-01-31 | Fuji Photo Film Co Ltd | Photoresist composition |
JPH0436755A (en) * | 1990-06-01 | 1992-02-06 | Fuji Photo Film Co Ltd | Resist composition |
US6949324B2 (en) | 2001-12-28 | 2005-09-27 | Fujitsu Limited | Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same |
WO2010115945A1 (en) * | 2009-04-08 | 2010-10-14 | Pierre Fabre Dermo-Cosmetique | Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof |
FR2944281A1 (en) * | 2009-04-08 | 2010-10-15 | Fabre Pierre Dermo Cosmetique | RESORCINOL SULFUR DERIVATIVES, THEIR PREPARATION AND THEIR COSMETIC USES |
CN102421751A (en) * | 2009-04-08 | 2012-04-18 | 皮埃尔·法布尔皮肤化妆品公司 | Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof |
JP2012523391A (en) * | 2009-04-08 | 2012-10-04 | ピエール、ファブレ、デルモ‐コスメティーク | Sulfur derivative of resorcinol, its production and its cosmetic use |
AU2010233687B2 (en) * | 2009-04-08 | 2014-07-24 | Pierre Fabre Dermo-Cosmetique | Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof |
US8859819B2 (en) | 2009-04-08 | 2014-10-14 | Pierre Fabre Dermo-Cosmetique | Sulphurated derivatives of resorcinol, preparation of same and cosmetic uses thereof |
CN106120412A (en) * | 2016-08-16 | 2016-11-16 | 江苏凯威新材料科技有限公司 | Steel wire rope and manufacturing process thereof |
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