JPS57122430A - Positive type resist material with dry etching resistance - Google Patents
Positive type resist material with dry etching resistanceInfo
- Publication number
- JPS57122430A JPS57122430A JP826681A JP826681A JPS57122430A JP S57122430 A JPS57122430 A JP S57122430A JP 826681 A JP826681 A JP 826681A JP 826681 A JP826681 A JP 826681A JP S57122430 A JPS57122430 A JP S57122430A
- Authority
- JP
- Japan
- Prior art keywords
- dry etching
- methacrylic acid
- methacrylate
- etching resistance
- copolymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/10—Homopolymers or copolymers of methacrylic acid esters
Abstract
PURPOSE:To improve the dry etching resistance of a resist by using a copolymer of a methacrylic ester having a benzene ring with methacrylic acid. CONSTITUTION:A soln. of a copolymer of a methacrylic ester having a benzene ring such as phenyl methacrylate, p-fluorophenyl methacrylate, 2,4,6-trichlorophenyl methacrylate or diphenylmethyl methacrylate with methacrylic acid is spin-coated and prebaked. The resulting film is exposed to electron beams or X-rays, developed, and used in dry etching. The preferred methacrylic acid content of the copolymer is 5-15%, and the preferred mol.wt. is about 7X10<3>- 7X10<7>. By copolymerizing methacrylic acid, higher resolution and sensitivity can be provided.
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP826681A JPS57122430A (en) | 1981-01-22 | 1981-01-22 | Positive type resist material with dry etching resistance |
US06/339,414 US4430419A (en) | 1981-01-22 | 1982-01-15 | Positive resist and method for manufacturing a pattern thereof |
GB8201246A GB2093048B (en) | 1981-01-22 | 1982-01-18 | Positive resist copolymer and method for manufacturing a pattern therewith |
CA000394565A CA1211600A (en) | 1981-01-22 | 1982-01-20 | Positive resist and method for manufacturing a pattern thereof |
NLAANVRAGE8200211,A NL186119C (en) | 1981-01-22 | 1982-01-21 | METHOD FOR FORMING A PATTERN FOR A POSITIVE RESIST. |
DE19823201815 DE3201815A1 (en) | 1981-01-22 | 1982-01-21 | POSITIVE RESIST MATERIAL AND METHOD FOR PRODUCING A PATTERN THEREOF |
FR8200936A FR2498198B1 (en) | 1981-01-22 | 1982-01-21 | POSITIVE RESISTANT COATING AND METHOD FOR FORMING A DRAWING OF THIS COATING ON A SUBSTRATE |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP826681A JPS57122430A (en) | 1981-01-22 | 1981-01-22 | Positive type resist material with dry etching resistance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57122430A true JPS57122430A (en) | 1982-07-30 |
JPH0146863B2 JPH0146863B2 (en) | 1989-10-11 |
Family
ID=11688348
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP826681A Granted JPS57122430A (en) | 1981-01-22 | 1981-01-22 | Positive type resist material with dry etching resistance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57122430A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868743A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Radation sensitive organic polymer material |
JPH0398051A (en) * | 1989-09-11 | 1991-04-23 | Agency Of Ind Science & Technol | Visible light recording material |
-
1981
- 1981-01-22 JP JP826681A patent/JPS57122430A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5868743A (en) * | 1981-10-21 | 1983-04-23 | Hitachi Ltd | Radation sensitive organic polymer material |
JPH0398051A (en) * | 1989-09-11 | 1991-04-23 | Agency Of Ind Science & Technol | Visible light recording material |
Also Published As
Publication number | Publication date |
---|---|
JPH0146863B2 (en) | 1989-10-11 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS57196231A (en) | Mixture able to be polymerized by radiation and copying material mainly composed thereof | |
JPS5369284A (en) | Photopolymerizable composition | |
JPS5363310A (en) | Preparation of monomer composition containing pb and preparation of polymerhaving radiation shielding ability | |
JPS56137347A (en) | Photosensitive composition for dry development | |
JPS57122430A (en) | Positive type resist material with dry etching resistance | |
EP0271010A3 (en) | Copolymers with 0-nitrocarbinol ester groups, and their use | |
JPS5359367A (en) | Formation of electron beam resist image | |
JPS5747875A (en) | Resist composition | |
JPS5374533A (en) | Actinic radiation-curable temporary corrosion-resistant coating composition removable by alkali treatment | |
JPS53134787A (en) | Stain-removing agent containing fluoroalkyl radical | |
JPS5614232A (en) | Negative type resist resin | |
JPS53110647A (en) | Improvement of water resistance of polyvinyl alcohol type polymer | |
JPS5552336A (en) | Vinyl chloride-based resin composition | |
JPS55153936A (en) | Storage-stabilized photosensitive resin composition for flexographic plate | |
JPS55133035A (en) | Electron sensitive resin material | |
JPS5290537A (en) | Polymerizable adhesive composition | |
JPS57159804A (en) | Radiation-sensitive organic high-molecular material | |
JPS5367751A (en) | Photosensitive resin composition | |
JPS64563A (en) | Writing retouch solution | |
JPS53120276A (en) | Electron beam exposure method | |
JPS53120430A (en) | Developing liquid for resist sensitive to radioactive ray | |
JPS5394364A (en) | Antistatic polyester composition with good color tone | |
JPS5332718A (en) | Polymer material having positive type image formation ability | |
JPS5558211A (en) | Positive type radiation-sensitive composition and its solution | |
JPS52129797A (en) | Preparation of radically curable compositions |