JPS53120430A - Developing liquid for resist sensitive to radioactive ray - Google Patents

Developing liquid for resist sensitive to radioactive ray

Info

Publication number
JPS53120430A
JPS53120430A JP3399477A JP3399477A JPS53120430A JP S53120430 A JPS53120430 A JP S53120430A JP 3399477 A JP3399477 A JP 3399477A JP 3399477 A JP3399477 A JP 3399477A JP S53120430 A JPS53120430 A JP S53120430A
Authority
JP
Japan
Prior art keywords
radioactive ray
developing liquid
resist sensitive
resist
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3399477A
Other languages
Japanese (ja)
Inventor
Nobuji Tsuchiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP3399477A priority Critical patent/JPS53120430A/en
Publication of JPS53120430A publication Critical patent/JPS53120430A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enhance the sensibility and resolution of an electron beam resist of positive type containing polymethyl methacrylate and copolymer of methacrylic acid by containing a specific amine compound and by restricting the moisture content.
JP3399477A 1977-03-29 1977-03-29 Developing liquid for resist sensitive to radioactive ray Pending JPS53120430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3399477A JPS53120430A (en) 1977-03-29 1977-03-29 Developing liquid for resist sensitive to radioactive ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3399477A JPS53120430A (en) 1977-03-29 1977-03-29 Developing liquid for resist sensitive to radioactive ray

Publications (1)

Publication Number Publication Date
JPS53120430A true JPS53120430A (en) 1978-10-20

Family

ID=12402018

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3399477A Pending JPS53120430A (en) 1977-03-29 1977-03-29 Developing liquid for resist sensitive to radioactive ray

Country Status (1)

Country Link
JP (1) JPS53120430A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100429A (en) * 1980-10-16 1982-06-22 Siemens Ag Manufacture of structural body
JPS5868745A (en) * 1981-10-21 1983-04-23 Hitachi Ltd Production of relief structural body
JP2013011858A (en) * 2011-06-01 2013-01-17 Jsr Corp Developer

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100429A (en) * 1980-10-16 1982-06-22 Siemens Ag Manufacture of structural body
JPH0310089B2 (en) * 1980-10-16 1991-02-12 Siemens Ag
JPS5868745A (en) * 1981-10-21 1983-04-23 Hitachi Ltd Production of relief structural body
JPH0237580B2 (en) * 1981-10-21 1990-08-24 Hitachi Ltd
JP2013011858A (en) * 2011-06-01 2013-01-17 Jsr Corp Developer
US8980539B2 (en) 2011-06-01 2015-03-17 Jsr Corporation Developer

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