JPS547930A - Development of resist - Google Patents
Development of resistInfo
- Publication number
- JPS547930A JPS547930A JP7288777A JP7288777A JPS547930A JP S547930 A JPS547930 A JP S547930A JP 7288777 A JP7288777 A JP 7288777A JP 7288777 A JP7288777 A JP 7288777A JP S547930 A JPS547930 A JP S547930A
- Authority
- JP
- Japan
- Prior art keywords
- resist
- development
- dioxane
- irradiating
- inter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To prevent a net-shaped resist from being left even if the inter-line space is narrow by irradiating the resist composed of high molecules having an epoxy radical at its side chain with an electron beam or X ray and then by effecting development while using dioxane as a developing liquid.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7288777A JPS547930A (en) | 1977-06-21 | 1977-06-21 | Development of resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7288777A JPS547930A (en) | 1977-06-21 | 1977-06-21 | Development of resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS547930A true JPS547930A (en) | 1979-01-20 |
Family
ID=13502290
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7288777A Pending JPS547930A (en) | 1977-06-21 | 1977-06-21 | Development of resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS547930A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5984519A (en) * | 1982-11-08 | 1984-05-16 | Hitachi Ltd | Developer |
US10427828B2 (en) | 2015-06-03 | 2019-10-01 | Rengo Co., Ltd. | Corrugated paperboard box, perforation forming method for perforating corrugated paperboard sheet, and perforation forming device and perforation forming unit for perforating corrugated paperboard sheet |
US11338535B2 (en) | 2016-11-08 | 2022-05-24 | Mitsubishi Heavy Industries Machinery Systems, Ltd. | Sheet folding device and method, and box-making machine |
-
1977
- 1977-06-21 JP JP7288777A patent/JPS547930A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5984519A (en) * | 1982-11-08 | 1984-05-16 | Hitachi Ltd | Developer |
US10427828B2 (en) | 2015-06-03 | 2019-10-01 | Rengo Co., Ltd. | Corrugated paperboard box, perforation forming method for perforating corrugated paperboard sheet, and perforation forming device and perforation forming unit for perforating corrugated paperboard sheet |
US11338535B2 (en) | 2016-11-08 | 2022-05-24 | Mitsubishi Heavy Industries Machinery Systems, Ltd. | Sheet folding device and method, and box-making machine |
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