JPS5417015A - Radiation sensitive composite - Google Patents

Radiation sensitive composite

Info

Publication number
JPS5417015A
JPS5417015A JP8131977A JP8131977A JPS5417015A JP S5417015 A JPS5417015 A JP S5417015A JP 8131977 A JP8131977 A JP 8131977A JP 8131977 A JP8131977 A JP 8131977A JP S5417015 A JPS5417015 A JP S5417015A
Authority
JP
Japan
Prior art keywords
reaction
radiation sensitive
sensitive composite
contraining
ager
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8131977A
Other languages
Japanese (ja)
Other versions
JPS6113734B2 (en
Inventor
Yoshitake Onishi
Masaki Ito
Kenji Mizuno
Hiroshi Gokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8131977A priority Critical patent/JPS5417015A/en
Publication of JPS5417015A publication Critical patent/JPS5417015A/en
Priority to US06/059,845 priority patent/US4279986A/en
Publication of JPS6113734B2 publication Critical patent/JPS6113734B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To make it possible to prevent the reaction which will continue even ager irradiation of a radioactive ray and to realize the fine working treatment without any high difference from a designed value by contraining a reaction inhibitor in a negative type resist, in which a bridging reaction is initiated by an azido radical.
COPYRIGHT: (C)1979,JPO&Japio
JP8131977A 1977-06-01 1977-07-06 Radiation sensitive composite Granted JPS5417015A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8131977A JPS5417015A (en) 1977-07-06 1977-07-06 Radiation sensitive composite
US06/059,845 US4279986A (en) 1977-06-01 1979-07-23 Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8131977A JPS5417015A (en) 1977-07-06 1977-07-06 Radiation sensitive composite

Publications (2)

Publication Number Publication Date
JPS5417015A true JPS5417015A (en) 1979-02-08
JPS6113734B2 JPS6113734B2 (en) 1986-04-15

Family

ID=13743069

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8131977A Granted JPS5417015A (en) 1977-06-01 1977-07-06 Radiation sensitive composite

Country Status (1)

Country Link
JP (1) JPS5417015A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS5869217A (en) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd Photosensitive silicone resin composition
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist
JPS6024543A (en) * 1983-07-20 1985-02-07 Hitachi Chem Co Ltd Photosensitive silicone resin composition
US5418113A (en) * 1988-11-18 1995-05-23 Canon Kabushiki Kaisha Photosensitive resin composition and method of preparing volume type phase hologram member using same

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5677843A (en) * 1979-11-30 1981-06-26 Fujitsu Ltd Resist pattern forming method
JPS6248211B2 (en) * 1979-11-30 1987-10-13 Fujitsu Ltd
JPS5869217A (en) * 1981-10-22 1983-04-25 Japan Synthetic Rubber Co Ltd Photosensitive silicone resin composition
JPH054421B2 (en) * 1981-10-22 1993-01-20 Japan Synthetic Rubber Co Ltd
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist
JPS6024543A (en) * 1983-07-20 1985-02-07 Hitachi Chem Co Ltd Photosensitive silicone resin composition
US5418113A (en) * 1988-11-18 1995-05-23 Canon Kabushiki Kaisha Photosensitive resin composition and method of preparing volume type phase hologram member using same

Also Published As

Publication number Publication date
JPS6113734B2 (en) 1986-04-15

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