JPS5417014A - Radiation sensitive composite - Google Patents

Radiation sensitive composite

Info

Publication number
JPS5417014A
JPS5417014A JP8131877A JP8131877A JPS5417014A JP S5417014 A JPS5417014 A JP S5417014A JP 8131877 A JP8131877 A JP 8131877A JP 8131877 A JP8131877 A JP 8131877A JP S5417014 A JPS5417014 A JP S5417014A
Authority
JP
Japan
Prior art keywords
radiation sensitive
sensitive composite
reaction
nagative
bridging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8131877A
Other languages
Japanese (ja)
Other versions
JPS6113733B2 (en
Inventor
Yoshitake Onishi
Masaki Ito
Kenji Mizuno
Hiroshi Gokan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP8131877A priority Critical patent/JPS5417014A/en
Publication of JPS5417014A publication Critical patent/JPS5417014A/en
Priority to US06/059,845 priority patent/US4279986A/en
Publication of JPS6113733B2 publication Critical patent/JPS6113733B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Abstract

PURPOSE:To make it possible to prevent the reaction which will continue even after irradiation of a radioactive ray and to realize the fine working treatment without any high difference from a designed value by containing a reaction inhibitor in a nagative type resist which has a C=C bond in its molecules while ensuring bridging.
JP8131877A 1977-06-01 1977-07-06 Radiation sensitive composite Granted JPS5417014A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP8131877A JPS5417014A (en) 1977-07-06 1977-07-06 Radiation sensitive composite
US06/059,845 US4279986A (en) 1977-06-01 1979-07-23 Negative resist and radical scavenger composition with capability of preventing post-irradiation polymerization

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8131877A JPS5417014A (en) 1977-07-06 1977-07-06 Radiation sensitive composite

Publications (2)

Publication Number Publication Date
JPS5417014A true JPS5417014A (en) 1979-02-08
JPS6113733B2 JPS6113733B2 (en) 1986-04-15

Family

ID=13743042

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8131877A Granted JPS5417014A (en) 1977-06-01 1977-07-06 Radiation sensitive composite

Country Status (1)

Country Link
JP (1) JPS5417014A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist
JPS6049751A (en) * 1983-08-29 1985-03-19 Ajinomoto Co Inc Food composition
US5780090A (en) * 1995-07-26 1998-07-14 Firmenich Sa Flavored products and a process for their preparation
US5979541A (en) * 1995-11-20 1999-11-09 Seiko Epson Corporation Cooling fan and cooling fan assembly

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58502169A (en) * 1981-12-21 1983-12-15 インステイテユ−ト　ヒミイ　アカデミイ　ナウク　エスエスエスア−ル Photo- and electron beam resist
JPS6049751A (en) * 1983-08-29 1985-03-19 Ajinomoto Co Inc Food composition
JPH0347829B2 (en) * 1983-08-29 1991-07-22 Ajinomoto Kk
US5780090A (en) * 1995-07-26 1998-07-14 Firmenich Sa Flavored products and a process for their preparation
US5979541A (en) * 1995-11-20 1999-11-09 Seiko Epson Corporation Cooling fan and cooling fan assembly

Also Published As

Publication number Publication date
JPS6113733B2 (en) 1986-04-15

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