JPS53125695A - Exposing method for electron rays - Google Patents

Exposing method for electron rays

Info

Publication number
JPS53125695A
JPS53125695A JP4052377A JP4052377A JPS53125695A JP S53125695 A JPS53125695 A JP S53125695A JP 4052377 A JP4052377 A JP 4052377A JP 4052377 A JP4052377 A JP 4052377A JP S53125695 A JPS53125695 A JP S53125695A
Authority
JP
Japan
Prior art keywords
electron rays
exposing method
quantities
irradiation
outsids
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4052377A
Other languages
Japanese (ja)
Inventor
Yuji Okuto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP4052377A priority Critical patent/JPS53125695A/en
Publication of JPS53125695A publication Critical patent/JPS53125695A/en
Pending legal-status Critical Current

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  • Electron Beam Exposure (AREA)

Abstract

PURPOSE: To preform appropriate irradiation on every kind of surfaces to be exposed, by detecting the quantities of electron rays coming out to the outsids again from an abject to be irradiated, and by controlling the quantities of irradiation in response to the detected results.
COPYRIGHT: (C)1978,JPO&Japio
JP4052377A 1977-04-08 1977-04-08 Exposing method for electron rays Pending JPS53125695A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4052377A JPS53125695A (en) 1977-04-08 1977-04-08 Exposing method for electron rays

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4052377A JPS53125695A (en) 1977-04-08 1977-04-08 Exposing method for electron rays

Publications (1)

Publication Number Publication Date
JPS53125695A true JPS53125695A (en) 1978-11-02

Family

ID=12582852

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4052377A Pending JPS53125695A (en) 1977-04-08 1977-04-08 Exposing method for electron rays

Country Status (1)

Country Link
JP (1) JPS53125695A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111228A (en) * 1980-02-07 1981-09-02 Fujitsu Ltd Electron beam exposuring process
JPS60257517A (en) * 1984-05-30 1985-12-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of correcting proximity effect in electron beam etching

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56111228A (en) * 1980-02-07 1981-09-02 Fujitsu Ltd Electron beam exposuring process
JPS60257517A (en) * 1984-05-30 1985-12-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of correcting proximity effect in electron beam etching

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