JPS53125695A - Exposing method for electron rays - Google Patents
Exposing method for electron raysInfo
- Publication number
- JPS53125695A JPS53125695A JP4052377A JP4052377A JPS53125695A JP S53125695 A JPS53125695 A JP S53125695A JP 4052377 A JP4052377 A JP 4052377A JP 4052377 A JP4052377 A JP 4052377A JP S53125695 A JPS53125695 A JP S53125695A
- Authority
- JP
- Japan
- Prior art keywords
- electron rays
- exposing method
- quantities
- irradiation
- outsids
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Abstract
PURPOSE: To preform appropriate irradiation on every kind of surfaces to be exposed, by detecting the quantities of electron rays coming out to the outsids again from an abject to be irradiated, and by controlling the quantities of irradiation in response to the detected results.
COPYRIGHT: (C)1978,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052377A JPS53125695A (en) | 1977-04-08 | 1977-04-08 | Exposing method for electron rays |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4052377A JPS53125695A (en) | 1977-04-08 | 1977-04-08 | Exposing method for electron rays |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS53125695A true JPS53125695A (en) | 1978-11-02 |
Family
ID=12582852
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4052377A Pending JPS53125695A (en) | 1977-04-08 | 1977-04-08 | Exposing method for electron rays |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS53125695A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111228A (en) * | 1980-02-07 | 1981-09-02 | Fujitsu Ltd | Electron beam exposuring process |
JPS60257517A (en) * | 1984-05-30 | 1985-12-19 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of correcting proximity effect in electron beam etching |
-
1977
- 1977-04-08 JP JP4052377A patent/JPS53125695A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56111228A (en) * | 1980-02-07 | 1981-09-02 | Fujitsu Ltd | Electron beam exposuring process |
JPS60257517A (en) * | 1984-05-30 | 1985-12-19 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Method of correcting proximity effect in electron beam etching |
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